Patents by Inventor Fouad Atrash

Fouad Atrash has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for accurately determining the thickness and/or elemental composition of small features on thin-substrates using micro-XRF
    Patent number: 9632043
    Abstract: A method for X-ray Fluorescence (XRF) analysis includes directing an X-ray beam onto a sample and measuring an XRF signal excited from the sample, in a reference measurement in which the sample includes one or more first layers formed on a substrate, and in a target measurement after one or more second layers are formed on the substrate in addition to the first layers, so as to produce a reference XRF spectrum and a target XRF spectrum, respectively. A contribution of the first layers to the target XRF spectrum is reduced using the reference XRF spectrum. A parameter of at least one of the second layers is estimated using the target XRF spectrum in which the contribution of the first layers has been reduced.
    Type: Grant
    Filed: May 11, 2015
    Date of Patent: April 25, 2017
    Assignee: BRUKER JV ISRAEL LTD.
    Inventors: Isaac Mazor, Fouad Atrash, Alex Tokar, Olga Ostrovsky
  • METHOD FOR ACCURATELY DETERMINING THE THICKNESS AND/OR ELEMENTAL COMPOSITION OF SMALL FEATURES ON THIN-SUBSTRATES USING MICRO-XRF
    Publication number: 20150330921
    Abstract: A method for X-ray Fluorescence (XRF) analysis includes directing an X-ray beam onto a sample and measuring an XRF signal excited from the sample, in a reference measurement in which the sample includes one or more first layers formed on a substrate, and in a target measurement after one or more second layers are formed on the substrate in addition to the first layers, so as to produce a reference XRF spectrum and a target XRF spectrum, respectively. A contribution of the first layers to the target XRF spectrum is reduced using the reference XRF spectrum. A parameter of at least one of the second layers is estimated using the target XRF spectrum in which the contribution of the first layers has been reduced.
    Type: Application
    Filed: May 11, 2015
    Publication date: November 19, 2015
    Inventors: Isaac Mazor, Fouad Atrash, Alex Tokar, Olga Ostrovsky