Abstract: A method for chemical vapor deposition of a polymer film onto a substrate (6), includes the following two separate, consecutive steps:—a step for the photon activation of the gas phase wherein photon activation energy (42, 43) is provided to at least one gaseous polymer precursor that is present in a mainly gaseous composition, and—a chemical vapor deposition step wherein the activated gaseous polymer precursor, from the photon activation step, is deposited onto a substrate (6) so as to form a polymer film on the substrate, the total gas phase pressure ranging from 102 to 105 Pa. A device (1) for using such a method is also described.

Abstract: The present invention relates to a device for providing vapors of at least one solid precursor intended to supply a physico-chemical processing device, comprising an enclosure capable of containing particles of the solid precursor and comprising an inlet and an outlet, the outlet being intended to be connected to the physico-chemical processing device; and means for circulating a gas between the inlet and the outlet to put the particles of the solid precursor in the form of a fluidized bed, and to convey to the outlet vapors of the solid precursor.