Patents by Inventor Frances May

Frances May has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Flash memory cells with reduced distances between cell elements
    Patent number: 7580279
    Abstract: An anti-reflective coating (ARC) is formed over the various layers involved in a cell fabrication process. The ARC is selectively etched such that the edges of the etched areas of the ARC slope downward at an angle determined by the thickness of the ARC. The etching process could include CF4 chemistry. The inner edges of the sloped ARC areas reduce the original photo-defined space since the underlying layers are now defined by the sloped edges.
    Type: Grant
    Filed: June 9, 2006
    Date of Patent: August 25, 2009
    Assignee: Micron Technology, Inc.
    Inventors: Roger W. Lindsay, Frances May, Robert Veltrop
  • Flash memory cells with reduced distances between cell elements
    Patent number: 7208407
    Abstract: An anti-reflective coating (ARC) is formed over the various layers involved in a cell fabrication process. The ARC is selectively etched such that the edges of the etched areas of the ARC slope downward at an angle determined by the thickness of the ARC. The etching process could include CF4 chemistry. The inner edges of the sloped ARC areas reduce the original photo-defined space since the underlying layers are now defined by the sloped edges.
    Type: Grant
    Filed: June 30, 2004
    Date of Patent: April 24, 2007
    Assignee: Micron Technology, Inc.
    Inventors: Roger W. Lindsay, Frances May, Robert Veltrop
  • Flash memory cells with reduced distances between cell elements
    Publication number: 20060226471
    Abstract: An anti-reflective coating (ARC) is formed over the various layers involved in a cell fabrication process. The ARC is selectively etched such that the edges of the etched areas of the ARC slope downward at an angle determined by the thickness of the ARC. The etching process could include CF4 chemistry. The inner edges of the sloped ARC areas reduce the original photo-defined space since the underlying layers are now defined by the sloped edges.
    Type: Application
    Filed: June 9, 2006
    Publication date: October 12, 2006
    Inventors: Roger Lindsay, Frances May, Robert Veltrop
  • Flash memory cells with reduced distances between cell elements
    Publication number: 20060003588
    Abstract: An anti-reflective coating (ARC) is formed over the various layers involved in a cell fabrication process. The ARC is selectively etched such that the edges of the etched areas of the ARC slope downward at an angle determined by the thickness of the ARC. The etching process could include CF4 chemistry. The inner edges of the sloped ARC areas reduce the original photo-defined space since the underlying layers are now defined by the sloped edges.
    Type: Application
    Filed: June 30, 2004
    Publication date: January 5, 2006
    Inventors: Roger Lindsay, Frances May, Robert Veltrop