Patents by Inventor Francis Charles Burns

Francis Charles Burns has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Ablatively photodecomposable compositions
    Patent number: 6156445
    Abstract: The present invention provides an ablatively photodecomposable polymer having a photoabsorber bound to the polymer (the "ablatively photodecomposable polymer") which does not phase separate, nor does it crystallize. The ablatively photodecomposable polymer provides even ablation, high resolution and in preferred embodiments, can withstand potassium permanganate etchant and ferric chloride etchant. The ablatively photodecomposable polymer is strippable, although it can remain on the substrate if desired. The ablatively photodecomposable polymer comprises a polymer to which a photoabsorber is bound, either covalently or ionically. The present invention is also directed to a process for forming a metal pattern on a substrate employing the ablatively photodecomposable polymer.
    Type: Grant
    Filed: February 24, 1998
    Date of Patent: December 5, 2000
    Assignee: International Business Machines Corporation
    Inventors: Francis Charles Burns, William Weathers Fleming, Victor Yee-Way Lee, Randy William Snyder
  • Ablatively photodecomposable compositions
    Patent number: 5919868
    Abstract: The present invention provides an ablatively photodecomposable polymer having a photoabsorber bound to the polymer (the "ablatively photodecomposable polymer") which does not phase separate, nor does it crystallize. The ablatively photodecomposable polymer provides even ablation, high resolution and in preferred embodiments, can withstand potassium permanganate etchant and ferric chloride etchant. The ablatively photodecomposable polymer is strippable, although it can remain on the substrate if desired. The ablatively photodecomposable polymer comprises a polymer to which a photoabsorber is bound, either covalently or ionically. The present invention is also directed to a process for forming a metal pattern on a substrate employing the ablatively photodecomposable polymer.
    Type: Grant
    Filed: July 22, 1997
    Date of Patent: July 6, 1999
    Assignee: International Business Machines Corporation
    Inventors: Francis Charles Burns, William Weathers Fleming, Victor Yee-Way Lee
  • Ablatively photodecomposable compositions
    Patent number: 5902712
    Abstract: The present invention provides an ablatively photodecomposable polymer having a photoabsorber bound to the polymer (the "ablatively photodecomposable polymer") which does not phase separate, nor does it crystallize. The ablatively photodecomposable polymer provides even ablation, high resolution and in preferred embodiments, can withstand potassium permanganate etchant and ferric chloride etchant. The ablatively photodecomposable polymer is strippable, although it can remain on the substrate if desired. The ablatively photodecomposable polymer comprises a polymer to which a photoabsorber is bound, either covalently or ionically. The present invention is also directed to a process for forming a metal pattern on a substrate employing the ablatively photodecomposable polymer.
    Type: Grant
    Filed: January 14, 1997
    Date of Patent: May 11, 1999
    Assignee: International Business Machines Corporation
    Inventors: Francis Charles Burns, William Weathers Fleming, Victor Yee-Way Lee, Randy William Snyder
  • Ablatively photodecomposable compositions
    Patent number: 5756259
    Abstract: The present invention provides an ablatively photodecomposable polymer having a photoabsorber bound to the polymer (the "ablatively photodecomposable polymer") which does not phase separate, nor does it crystallize. The ablatively photodecomposable polymer provides even ablation, high resolution and in preferred embodiments, can withstand potassium permanganate etchant and ferric chloride etchant. The ablatively photodecomposable polymer is strippable, although it can remain on the substrate if desired. The ablatively photodecomposable polymer comprises a polymer to which a photoabsorber is bound, either covalently or ionically. The present invention is also directed to a process for forming a metal pattern on a substrate employing the ablatively photodecomposable polymer.
    Type: Grant
    Filed: April 9, 1996
    Date of Patent: May 26, 1998
    Assignee: International Business Machines Corporation
    Inventors: Francis Charles Burns, William Weathers Fleming, Victor Yee-Way Lee, Randy William Snyder
  • Ablatively photodecomposable compositions
    Patent number: 5705570
    Abstract: The present invention provides an ablatively photodecomposable polymer having a photoabsorber bound to the polymer (the "ablatively photodecomposable polymer") which does not phase separate, nor does it crystallize. The ablatively photodecomposable polymer provides even ablation, high resolution and in preferred embodiments, can withstand potassium permanganate etchant and ferric chloride etchant. The ablatively photodecomposable polymer is strippable, although it can remain on the substrate if desired. The ablatively photodecomposable polymer comprises a polymer to which a photoabsorber is bound, either covalently or ionically. The present invention is also directed to a process for forming a metal pattern on a substrate employing the ablatively photodecomposable polymer.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: January 6, 1998
    Assignee: International Business Machines Corporation
    Inventors: Francis Charles Burns, William Weathers Fleming, Victor Yee-Way Lee, Randy William Snyder
  • Ablatively photodecomposable compositions
    Patent number: 5672760
    Abstract: The present invention provides an ablatively photodecomposable polymer having a photoabsorber bound to the polymer (the "ablatively photodecomposable polymer") which does not phase separate, nor does it crystallize. The ablatively photodecomposable polymer provides even ablation, high resolution and in preferred embodiments, can withstand potassium permanganate etchant and ferric chloride etchant. The ablatively photodecomposable polymer is strippable, although it can remain on the substrate if desired. The ablatively photodecomposable polymer comprises a polymer to which a photoabsorber is bound, either covalently or ionically. The present invention is also directed to a process for forming a metal pattern on a substrate employing the ablatively photodecomposable polymer.
    Type: Grant
    Filed: April 9, 1996
    Date of Patent: September 30, 1997
    Assignee: International Business Machines Corporation
    Inventors: Francis Charles Burns, William Weathers Fleming, Victor Yee-Way Lee, Randy William Snyder