Abstract: An optical assembly may include an optical element comprising a first surface. An optical assembly may include a mount comprising a first surface. An optical assembly may include a first transmissive layer. An optical assembly may include a first adhesive layer disposed between a first surface of the first transmissive layer and the first surface of the optical element. An optical assembly may include a second adhesive layer disposed between a second surface of the first transmissive layer and the first surface of the mount, wherein the first transmissive layer is configured to transmit illumination to the first adhesive layer and the second adhesive layer to cure the first adhesive layer and the second adhesive layer.

Abstract: A vacuum system includes a wall of a vacuum chamber, a flange of the vacuum chamber, an outer seal disposed between the wall and the flange, and an inner seal disposed between the wall and the flange. The outer seal includes a first material; the inner seal includes a second material distinct from the first material. The inner seal is closer to the interior of the vacuum chamber than the outer seal and is separated from the outer seal by a gap. The outer seal may be capable of providing tighter vacuum sealing between the wall and the flange than the inner seal. The inner seal may be more resistant than the outer seal to a gas to be used to clean the interior of the vacuum chamber. The vacuum system also includes a path to couple the gap to a first vacuum pump, to evacuate the gap.

Abstract: A vacuum system includes a wall of a vacuum chamber, a flange of the vacuum chamber, an outer seal disposed between the wall and the flange, and an inner seal disposed between the wall and the flange. The outer seal includes a first material; the inner seal includes a second material distinct from the first material. The inner seal is closer to the interior of the vacuum chamber than the outer seal and is separated from the outer seal by a gap. The outer seal may be capable of providing tighter vacuum sealing between the wall and the flange than the inner seal. The inner seal may be more resistant than the outer seal to a gas to be used to clean the interior of the vacuum chamber. The vacuum system also includes a path to couple the gap to a first vacuum pump, to evacuate the gap.

Abstract: The present invention provides a local clean microenvironment near optical surfaces of an extreme ultraviolet (EUV) optical assembly maintained in a vacuum process chamber and configured for EUV lithography, metrology, or inspection. The system includes one or more EUV optical assemblies including at least one optical element with an optical surface, a supply of cleaning gas stored remotely from the one or more optical assemblies and a gas delivery unit comprising: a plenum chamber, one or more gas delivery lines connecting the supply of gas to the plenum chamber, one or more delivery nozzles configured to direct cleaning gas from the plenum chamber to a portion of the EUV assembly, and one or more collection nozzles for removing gas from the EUV optical assembly and the vacuum process chamber.

Abstract: The generation of EUV light includes rotating a cylinder at least partially coated with a plasma-forming target material, directing pulsed illumination to a first set of helically-arranged spots traversing a material-coated portion of the rotating cylinder in a first direction and directing pulsed illumination to a second set of helically-arranged spots traversing the material-coated portion of the rotating cylinder in a second direction, the pulsed illumination being suitable for exciting the plasma-forming target material.

Abstract: The generation of EUV light includes rotating a cylinder at least partially coated with a plasma-forming target material, directing pulsed illumination to a first set of helically-arranged spots traversing a material-coated portion of the rotating cylinder in a first direction and directing pulsed illumination to a second set of helically-arranged spots traversing the material-coated portion of the rotating cylinder in a second direction, the pulsed illumination being suitable for exciting the plasma-forming target material.

Abstract: The present invention provides a local clean microenvironment near optical surfaces of an extreme ultraviolet (EUV) optical assembly maintained in a vacuum process chamber and configured for EUV lithography, metrology, or inspection. The system includes one or more EUV optical assemblies including at least one optical element with an optical surface, a supply of cleaning gas stored remotely from the one or more optical assemblies and a gas delivery unit comprising: a plenum chamber, one or more gas delivery lines connecting the supply of gas to the plenum chamber, one or more delivery nozzles configured to direct cleaning gas from the plenum chamber to a portion of the EUV assembly, and one or more collection nozzles for removing gas from the EUV optical assembly and the vacuum process chamber.