Patents by Inventor Francis Fahrni
Francis Fahrni has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11762304Abstract: A lithographic apparatus has: a conduit through which a gas can flow; a gas mover configured to cause the gas to flow in the conduit; a wall in contact with the gas in the conduit and defining a membrane aperture therein; and an acoustic filter including a flexible membrane fixed in the membrane aperture. The acoustic filter reduces transmission of acoustic disturbances without adding any flow resistance.Type: GrantFiled: March 29, 2016Date of Patent: September 19, 2023Assignee: ASML Netherlands B.V.Inventors: Güneş Nak{dot over (i)}boğlu, Maarten Holtrust, Martinus Van Duijnhoven, Francis Fahrni, Frank Johannes Jacobus Van Boxtel, Anne Willemijn Bertine Quist, Bart Dinand Paarhuis, Daan Daniel Johannes Antonius Van Sommeren
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Patent number: 10916453Abstract: A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler.Type: GrantFiled: September 9, 2019Date of Patent: February 9, 2021Assignee: ASML Netherlands B.V.Inventors: Aart Adrianus Van Beuzekom, Jozef Augustinus Maria Alberti, Hubert Marie Segers, Ronald Van Der Ham, Francis Fahrni, Ruud Olieslagers, Gerben Pieterse, Cornelius Maria Rops, Pepijn Van Den Eijnden, Paul Van Dongen, Bas Willems
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Publication number: 20190391499Abstract: A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler.Type: ApplicationFiled: September 9, 2019Publication date: December 26, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Aart Adrianus VAN BEUZEKOM, Jozef Augustinus Maria Alberti, Hubert Marie Segers, Ronald Van Der Ham, Francis Fahrni, Ruud Olieslagers, Gerben Pieterse, Cornelius Maria Rops, Pepijn Van Den Eijnden, Paul Van Dongen, Bas Willems
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Patent number: 10409174Abstract: A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler.Type: GrantFiled: May 12, 2015Date of Patent: September 10, 2019Assignee: ASML NETHERLANDS B.V.Inventors: Aart Adrianus Van Beuzekom, Jozef Augustinus Maria Alberti, Hubert Marie Segers, Ronald Van Der Ham, Francis Fahrni, Ruud Olieslagers, Gerben Pieterse, Cornelius Maria Rops, Pepijn Van Den Eijnden, Paul Van Dongen, Bas Willems
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Publication number: 20180299796Abstract: A lithographic apparatus has: a conduit through which a gas can flow; a gas mover configured to cause the gas to flow in the conduit; a wall in contact with the gas in the conduit and defining a membrane aperture therein; and an acoustic filter including a flexible membrane fixed in the membrane aperture. The acoustic filter reduces transmission of acoustic disturbances without adding any flow resistance.Type: ApplicationFiled: March 29, 2016Publication date: October 18, 2018Applicant: ASML Netherlands B.V.Inventors: Günes NAKIBOGLU, Maarten HOLTRUST, Martinus VAN DUIJNHOVEN, Francis FAHRNI, Frank Johannes Jacobus VAN BOXTEL, Anne Willemijn Bertine QUIST, Bart Dinand PAARHUIS, Daan Daniel Johannes VAN SOMMEREN
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Publication number: 20170108781Abstract: A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler.Type: ApplicationFiled: May 12, 2015Publication date: April 20, 2017Applicant: ASML NETHERLANDS B.V.Inventors: Aart Adrianus VAN BEUZEKOM, Jozef Augustinus Maria ALBERTI, Hubert Marie SEGERS, Ronald VAN DER HAM, Francis FAHRNI, Ruud OLIESLAGERS, Gerben PIETERSE, Cornelius Maria ROPS, Pepijn VAN DEN EIJNDEN, Paul VAN DONGEN, Bas WILLEMS
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Patent number: 8610878Abstract: A lithographic apparatus includes an illumination system configured to provide a first beam of radiation, which forms a first mask illumination region, and configured to substantially simultaneously provide a second beam of radiation, which forms a second mask illumination region. The first and second illumination regions being configured to substantially simultaneously illuminate a same mask. The lithographic apparatus also includes a projection system configured to project the first radiation beam such that it forms a first substrate illumination region and configured to simultaneously project the second radiation beam such that it forms a second substrate illumination region.Type: GrantFiled: December 13, 2010Date of Patent: December 17, 2013Assignee: ASML Netherlands B.V.Inventors: Johannes Jacobus Matheus Baselmans, Francis Fahrni, Gerardus Johannes Joseph Keijsers, Heine Melle Mulder, Willem Richard Pongers, Joost Cyrillus Lambert Hageman, Mattheus Johannes Van Bruggen, Johannes Franciscus Roosekrans, David James Butler, Patrick Marcel Maria Thomassen, Gabriela Vesselinova Paeva
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Publication number: 20110216297Abstract: A lithographic apparatus includes an illumination system configured to provide a first beam of radiation, which forms a first mask illumination region, and configured to substantially simultaneously provide a second beam of radiation, which forms a second mask illumination region. The first and second illumination regions being configured to substantially simultaneously illuminate a same mask. The lithographic apparatus also includes a projection system configured to project the first radiation beam such that it forms a first substrate illumination region and configured to simultaneously project the second radiation beam such that it forms a second substrate illumination region.Type: ApplicationFiled: December 13, 2010Publication date: September 8, 2011Applicant: ASML Netherlands B.V.Inventors: Johannes Jacobus Matheus BASELMANS, Francis Fahrni, Gerardus Johannes Joseph Keijsers, Heine Melle Mulder, Willem Richard Pongers, Joost Cyrillus Lambert Hageman, Mattheus Johannes Van Bruggen, Johannes Franciscus Roosekrans, David James Butler, Patrick Marcel Maria Thomassen, Gabriela Vesselinova Paeva
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Publication number: 20100212762Abstract: The present invention provides a microfluidic system comprising a plurality of ciliary actuator elements (10) located at an inner surface (14) of a wall (15) of a microchannel (16) of the microfluidic system at a first location. The microfluidic system furthermore comprises a magnetic field generator formed by at least one current wire (17) integrated in the wall (15) of the micro channel (16) at a second location substantially opposite to the first location with respect to a centre line of the microchannel (16). The present invention also provides a method for the manufacturing of such microfluidic systems and to a method for controlling a fluid flow through a microchannel (16) of such a microfluidic system.Type: ApplicationFiled: March 10, 2008Publication date: August 26, 2010Applicant: Stitching Dutch Polymer InstituteInventors: Jacob M. J. Den Toonder, Menno W.J. Prins, Francis Fahrni, Leonardus J. Van Dzendoorn