Patents by Inventor Francis Houlihan

Francis Houlihan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of patterning a device
    Patent number: 9335636
    Abstract: A photopolymer layer is formed on an organic device substrate and exposed to patterned radiation. The photopolymer layer includes a photopolymer comprising at least a first repeating unit having an acid-catalyzed, solubility-altering reactive group, wherein the total fluorine content of the photopolymer is less than 30% by weight. The pattern exposed photopolymer is contacted with a developing agent, such as a developing solution, to remove unexposed photopolymer, thereby forming a developed structure having a first pattern of exposed photopolymer covering the substrate and a complementary second pattern of uncovered substrate corresponding to the unexposed photopolymer. The developing agent comprises at least 50% by volume of a hydrofluoroether developing solvent.
    Type: Grant
    Filed: July 24, 2015
    Date of Patent: May 10, 2016
    Assignee: ORTHOGONAL, INC.
    Inventors: John Andrew DeFranco, Francis Houlihan, Charles Warren Wright, Diane Carol Freeman, Frank Xavier Byrne, Douglas Robert Robello, Sandra Rubsam, Terrence Robert O'Toole
  • METHOD OF PATTERNING A DEVICE
    Publication number: 20150331325
    Abstract: A photopolymer layer is formed on an organic device substrate and exposed to patterned radiation. The photopolymer layer includes a photopolymer comprising at least a first repeating unit having an acid-catalyzed, solubility-altering reactive group, wherein the total fluorine content of the photopolymer is less than 30% by weight. The pattern exposed photopolymer is contacted with a developing agent, such as a developing solution, to remove unexposed photopolymer, thereby forming a developed structure having a first pattern of exposed photopolymer covering the substrate and a complementary second pattern of uncovered substrate corresponding to the unexposed photopolymer. The developing agent comprises at least 50% by volume of a hydrofluoroether developing solvent.
    Type: Application
    Filed: July 24, 2015
    Publication date: November 19, 2015
    Inventors: John Andrew DEFRANCO, Francis HOULIHAN, Charles Warren WRIGHT, Diane Carol FREEMAN, Frank Xavier BYRNE, Douglas Robert ROBELLO, Sandra RUBSAM, Terrence Robert O'TOOLE
  • Coating compositions
    Patent number: 9146467
    Abstract: Developable bottom antireflective coating compositions are provided.
    Type: Grant
    Filed: April 26, 2013
    Date of Patent: September 29, 2015
    Assignee: MERCK PATENT GMBH
    Inventors: Francis Houlihan, Lin Zhang, Alberto Dioses, Meng Li
  • Method of patterning a device
    Patent number: 9122167
    Abstract: A photopolymer layer is formed on an organic device substrate and exposed to patterned radiation. The photopolymer layer includes a photopolymer comprising at least a first repeating unit having an acid-catalyzed, solubility-altering reactive group, wherein the total fluorine content of the photopolymer is less than 30% by weight. The pattern exposed photopolymer is contacted with a developing agent, such as a developing solution, to remove unexposed photopolymer, thereby forming a developed structure having a first pattern of exposed photopolymer covering the substrate and a complementary second pattern of uncovered substrate corresponding to the unexposed photopolymer. The developing agent comprises at least 50% by volume of a hydrofluoroether developing solvent.
    Type: Grant
    Filed: May 12, 2014
    Date of Patent: September 1, 2015
    Assignee: Orthogonal, Inc.
    Inventors: John Andrew Defranco, Francis Houlihan, Charles Warren Wright, Diane Carol Freeman, Frank Xavier Byrne, Douglas Robert Robello, Sandra Rubsam, Terrence Robert O'Toole
  • METHOD OF PATTERNING A DEVICE
    Publication number: 20140248565
    Abstract: A photopolymer layer is formed on an organic device substrate and exposed to patterned radiation. The photopolymer layer includes a photopolymer comprising at least a first repeating unit having an acid-catalyzed, solubility-altering reactive group, wherein the total fluorine content of the photopolymer is less than 30% by weight. The pattern exposed photopolymer is contacted with a developing agent, such as a developing solution, to remove unexposed photopolymer, thereby forming a developed structure having a first pattern of exposed photopolymer covering the substrate and a complementary second pattern of uncovered substrate corresponding to the unexposed photopolymer. The developing agent comprises at least 50% by volume of a hydrofluoroether developing solvent.
    Type: Application
    Filed: May 12, 2014
    Publication date: September 4, 2014
    Inventors: John Andrew DEFRANCO, Francis HOULIHAN, Charles Warren WRIGHT, Diane Carol FREEMAN, Frank Xavier BYRNE, Douglas Robert ROBELLO, Sandra RUBSAM, Terrence Robert O'TOOLE
  • COATING COMPOSITIONS
    Publication number: 20130236833
    Abstract: Developable bottom antireflective coating compositions are provided.
    Type: Application
    Filed: April 26, 2013
    Publication date: September 12, 2013
    Applicant: AZ ELECTRONIC MATERIALS USA CORP.
    Inventors: Francis HOULIHAN, Lin ZHANG, Alberto DIOSES, Meng LI
  • Coating composition
    Patent number: 8455176
    Abstract: Developable bottom antireflective coating compositions are provided.
    Type: Grant
    Filed: November 12, 2008
    Date of Patent: June 4, 2013
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Francis Houlihan, Lin Zhang, Alberto Dioses, Meng Li
  • Antireflective coating compositions
    Patent number: 8211621
    Abstract: The present invention discloses novel bottom anti-reflective coating compositions where a coating from the composition has an etch rate that can be regulated by the etch plate temperature.
    Type: Grant
    Filed: June 10, 2010
    Date of Patent: July 3, 2012
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: David Abdallah, Francis Houlihan, Mark Neisser
  • Base soluble polymers for photoresist compositions
    Patent number: 8088564
    Abstract: Base soluble polymer comprising at least one sulfonyl group where at least one carbon atom at ?-position and/or ?-position and/or ?-position with respect to the sulfonyl group has a hydroxyl group, where the hydroxyl group is protected or unprotected are described.
    Type: Grant
    Filed: November 3, 2008
    Date of Patent: January 3, 2012
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: David Abdallah, Francis Houlihan
  • Antireflective coating composition comprising fused aromatic rings
    Patent number: 8017296
    Abstract: The present invention relates to an organic spin coatable antireflective coating composition comprising a polymer comprising at least one unit with 3 or more fused aromatic rings in the backbone of the polymer and at least one unit with an aliphatic moeity in the backbone of the polymer. The invention further relates to a process for imaging the present composition.
    Type: Grant
    Filed: October 16, 2007
    Date of Patent: September 13, 2011
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Francis Houlihan, David Abdallah, M. Dalil Rahman, Douglas McKenzie, Ruzhi Zhang, Allen G. Timko, WooKyu Kim, Ping-Hung Lu
  • Antireflective Coating Compositons
    Publication number: 20100248137
    Abstract: The present invention discloses novel bottom anti-reflective coating compositions where a coating from the composition has an etch rate that can be regulated by the etch plate temperature.
    Type: Application
    Filed: June 10, 2010
    Publication date: September 30, 2010
    Inventors: David Abdallah, Francis Houlihan, Mark Neisser
  • Antireflective coating compositions
    Patent number: 7759046
    Abstract: The present invention discloses novel bottom anti-reflective coating compositions where a coating from the composition has an etch rate that can be regulated by the etch plate temperature.
    Type: Grant
    Filed: December 20, 2006
    Date of Patent: July 20, 2010
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: David Abdallah, Francis Houlihan, Mark Neisser
  • COATING COMPOSITION
    Publication number: 20100119972
    Abstract: Developable bottom antireflective coating compositions are provided.
    Type: Application
    Filed: November 12, 2008
    Publication date: May 13, 2010
    Inventors: Francis Houlihan, Lin Zhang, Alberto Dioses, Meng Li
  • Base soluble polymers for photoresist compositions
    Patent number: 7550249
    Abstract: Base soluble polymer comprising at least one sulfonyl group where at least one carbon atom at ?-position and/or ?-position and/or ?-position with respect to the sulfonyl group has a hydroxyl group, where the hydroxyl group is protected or unprotected are described.
    Type: Grant
    Filed: March 10, 2006
    Date of Patent: June 23, 2009
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: David Abdallah, Francis Houlihan
  • BASE SOLUBLE POLYMERS FOR PHOTORESIST COMPOSITIONS
    Publication number: 20090061347
    Abstract: Base soluble polymer comprising at least one sulfonyl group where at least one carbon atom at ?-position and/or ?-position and/or ?-position with respect to the sulfonyl group has a hydroxyl group, where the hydroxyl group is protected or unprotected are described.
    Type: Application
    Filed: November 3, 2008
    Publication date: March 5, 2009
    Inventors: David Abdallah, Francis Houlihan
  • Antireflective Coating Composition Comprising Fused Aromatic Rings
    Publication number: 20080292987
    Abstract: The present invention relates to an organic spin coatable antireflective coating composition comprising a polymer comprising at least one unit with 3 or more fused aromatic rings in the backbone of the polymer and at least one unit with an aliphatic moeity in the backbone of the polymer. The invention further relates to a process for imaging the present composition.
    Type: Application
    Filed: May 22, 2007
    Publication date: November 27, 2008
    Inventors: Francis Houlihan, David Abdallah, M. Dalil Rahman, Douglas McKenzie, Ruzhi Zhang
  • Antireflective Coating Composition Comprising Fused Aromatic Rings
    Publication number: 20080292995
    Abstract: The present invention relates to an organic spin coatable antireflective coating composition comprising a polymer comprising at least one unit with 3 or more fused aromatic rings in the backbone of the polymer and at least one unit with an aliphatic moeity in the backbone of the polymer. The invention further relates to a process for imaging the present composition.
    Type: Application
    Filed: October 16, 2007
    Publication date: November 27, 2008
    Inventors: Francis Houlihan, David Abdallah, M. Dalil Rahman, Douglas McKenzie, Ruzhi Zhang, Allen G. Timko, Wookyu Kim, Ping-Hung Lu
  • Antireflective Coating Compositions
    Publication number: 20080153035
    Abstract: The present invention discloses novel bottom anti-reflective coating compositions where a coating from the composition has an etch rate that can be regulated by the etch plate temperature.
    Type: Application
    Filed: December 20, 2006
    Publication date: June 26, 2008
    Inventors: David Abdallah, Francis Houlihan, Mark Neisser
  • Photoactive Compounds
    Publication number: 20080096127
    Abstract: The present invention relates to novel photoactive compounds that can be used in formulating photoresist compositions.
    Type: Application
    Filed: October 18, 2007
    Publication date: April 24, 2008
    Inventors: M. Dalil Rahman, Francis Houlihan
  • Photoactive Compounds
    Publication number: 20080058542
    Abstract: The present invention relates to a novel photoactive compounds that can be used in formulating photoresist compositions.
    Type: Application
    Filed: October 18, 2007
    Publication date: March 6, 2008
    Inventors: M. Rahman, Francis Houlihan