Abstract: A method for depositing a non-oxide ceramic-type coating based on chrome carbides, nitrides or carbonitrides, by DLI-CVD at low temperature and atmospheric pressure on a metallic substrate, includes: a) a solution is prepared, containing a molecular compound which is a precursor of the metal to be deposited, belongs to the bis(arene) family, and has a decomposition temperature of 300° C.-550° C., the compound being dissolved in an oxygen atom depleted solvent; b) the solution is introduced as aerosol into a heated evaporator at a temperature between the solvent boiling temperature and the precursor decomposition temperature; and c) the precursor and the vaporized solvent are driven from the evaporator towards a CVD reactor having cold walls, with a susceptor carrying the substrate to be covered and heated to a temperature higher than the decomposition temperature of the precursor, to a maximum of 550° C., the evaporator and the CVD reactor being at atmospheric pressure.

Abstract: A method for depositing a hard metallic chrome coating or similar metal by chemical vapor deposition on a metallic substrate, includes: a) preparing a solution containing, in an oxygen atom depleted solvent, i) a molecular compound of the bis(arene) family that's a precursor of the deposited metal with a decomposition temperature 300° C.-550° C., and ii) a chlorinated additive; b) introducing the solution as aerosol into a heated evaporator at a temperature between the solvent boiling temperature and the precursor decomposition temperature (PDT); and c) driving the vaporized aerosol from the evaporator towards a CVD reactor including a susceptor carrying the substrate, heated above the PDT, up to 550° C., the evaporator and CVD reactor being subjected to atmospheric pressure. This DLI-CVD method performed at low temperature and atmospheric pressure enables continuous industrial treatment of large metallic plates, producing hard, monolayer or nanostructured multilayer metallic coatings.

Abstract: The object of the present invention is a deposition process of a coating of the ceramic type based on carbides, nitrides, or carbonitrides of metallic elements such as Cr, V, Zr, W, Mo, Co, Mn, Ni, Hf, Ta, Ti, Nb and Fe in which the coating of the ceramic type is deposited at low temperature in the vapour phase on a metallic substrate from organo-metallic precursors wherein, prior to this deposition in the vapour phase and without subsequent placing in contact with an oxidizing and/or polluting atmosphere, a reactive ionic pickling is carried out in a reducing atmosphere.

Abstract: The object of the invention is a one-step deposition process of a coating of the ceramic type based on nitrides or carbonitrides of at least one metallic element selected from Cr, V, Zr, W, Mo, Co, Mn, Ni, Hf and Ta on a metallic or ceramic substrate, massive or obtained from fibres, by deposition in the vapor phase wherein a coating is deposited on the substrate by a chemical means at a pressure lower than 10 kPa at a temperature lower than 600.degree. C. and by using a system of precursors constituted simultaneously of:an organo-metallic precursor of the said metallic element selected from the organo-metallic compounds of the sandwich type of general formula:[Ar.sup.1 M Ar.sup.2.sub.n ]L.sub.x L'.sub.ya nitrogen precursor selected from ammonia and hydrazine.