Patents by Inventor Francis O'Sullivan

Francis O'Sullivan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11315015
    Abstract: The present invention provides a system and method of side-stepping the need to retrain neural network model after initially trained using a simulator by comparing real-world data to data predicted by the simulator for the same inputs, and developing a mapping correlation that adjusts real world data toward the simulation data. Thus, the decision logic developed in the simulation-trained model is preserved and continues to operate in an altered reality. A threshold metric of similarity can be initially provided into the mapping algorithm, which automatically adjusts real world data to adjusted data corresponding to the simulation data for operating the neural network model when the metric of similarity between the real world data and the simulation data exceeds the threshold metric. Updated learning can continue as desired, working in the background as conditions are monitored.
    Type: Grant
    Filed: June 8, 2018
    Date of Patent: April 26, 2022
    Assignee: TECHNIP FRANCE
    Inventors: James Francis O'Sullivan, Djoni Eka Sidarta, Ho Joon Lim
  • Publication number: 20190378005
    Abstract: The present invention provides a system and method of side-stepping the need to retrain neural network model after initially trained using a simulator by comparing real-world data to data predicted by the simulator for the same inputs, and developing a mapping correlation that adjusts real world data toward the simulation data. Thus, the decision logic developed in the simulation-trained model is preserved and continues to operate in an altered reality. A threshold metric of similarity can be initially provided into the mapping algorithm, which automatically adjusts real world data to adjusted data corresponding to the simulation data for operating the neural network model when the metric of similarity between the real world data and the simulation data exceeds the threshold metric. Updated learning can continue as desired, working in the background as conditions are monitored.
    Type: Application
    Filed: June 8, 2018
    Publication date: December 12, 2019
    Applicant: TECHNIP FRANCE
    Inventors: James Francis O'SULLIVAN, Djoni Eka SIDARTA, Ho Joon LIM
  • Patent number: 9862468
    Abstract: The present disclosure provides in at least one embodiment a rotatable keel skirt assembly on a rectangular-shaped keel pontoon. The rectangular-shaped keel pontoon reduces the maximum hull width by a significant percentage compared to a circular-shaped keel pontoon while maintaining the same hull motion performance. The rotatable keel skirt assembly allows the size of the pontoon to define the width of the hull during some fabrication phases of the platform, rather than the additional width of the keel skirt assembly. Thus, the outreach of the crane and other equipment can be effectively used as if the keel skirt assembly was not present. After fabrication, the hull can be moved away from the quayside and the keel skirt assembly can be rotated into position for service. Various systems and methods are disclosed for articulating the keel skirt assembly about the hull.
    Type: Grant
    Filed: October 10, 2014
    Date of Patent: January 9, 2018
    Assignee: TECHNIP FRANCE
    Inventors: James Francis O'Sullivan, Johyun Kyoung
  • Patent number: 9671231
    Abstract: The present disclosure provides a system and method of monitoring a mooring system for a floating vessel using the time of the natural period independent of environmental conditions. The natural period can be calculated and/or established experientially over time by measuring movement of the vessel to establish the natural period at given geographical positions of a secure and intact mooring system. The natural period can be monitored based on the time to complete a natural period. A change in a mooring line stiffness, whether by a failure, stretching, a degradation of the mooring line integrity, or a significant displacement of the anchoring point, will be translated into a different natural period with a different time.
    Type: Grant
    Filed: July 20, 2015
    Date of Patent: June 6, 2017
    Assignee: TECHNIP FRANCE
    Inventors: James Francis O'Sullivan, Jr., Nicolas Tcherniguin
  • Publication number: 20170023366
    Abstract: The present disclosure provides a system and method of monitoring a mooring system for a floating vessel using the time of the natural period independent of environmental conditions. The natural period can be calculated and/or established experientially over time by measuring movement of the vessel to establish the natural period at given geographical positions of a secure and intact mooring system. The natural period can be monitored based on the time to complete a natural period. A change in a mooring line stiffness, whether by a failure, stretching, a degradation of the mooring line integrity, or a significant displacement of the anchoring point, will be translated into a different natural period with a different time.
    Type: Application
    Filed: July 20, 2015
    Publication date: January 26, 2017
    Inventors: James Francis O'Sullivan, JR., Nicolas Tcherniguin
  • Publication number: 20160101836
    Abstract: The present disclosure provides in at least one embodiment a rotatable keel skirt assembly on a rectangular-shaped keel pontoon. The rectangular-shaped keel pontoon reduces the maximum hull width by a significant percentage compared to a circular-shaped keel pontoon while maintaining the same hull motion performance. The rotatable keel skirt assembly allows the size of the pontoon to define the width of the hull during some fabrication phases of the platform, rather than the additional width of the keel skirt assembly. Thus, the outreach of the crane and other equipment can be effectively used as if the keel skirt assembly was not present. After fabrication, the hull can be moved away from the quayside and the keel skirt assembly can be rotated into position for service. Various systems and methods are disclosed for articulating the keel skirt assembly about the hull.
    Type: Application
    Filed: October 10, 2014
    Publication date: April 14, 2016
    Inventors: James Francis O'Sullivan, Johyun Kyoung
  • Patent number: 7251402
    Abstract: Light transmission is maximized through the pass band of a photonic bandgap (PBG) crystal (having alternating high- and low-index material) while preserving high reflection for stop band. An anti-reflective coating (ARC) is used to coat the PBG crystal wherein the ARC material has a refractive index of n=(nairĂ—nhigh index material)1/2 and thickness around ?c/8 where ?c is center wavelength.
    Type: Grant
    Filed: August 23, 2005
    Date of Patent: July 31, 2007
    Assignee: Massachusetts Institute of Technology
    Inventors: Shoji Akiyama, Ivan Celanovic, Natalija Z. Jovanovic, Francis O'Sullivan, Kazumi Wada
  • Publication number: 20070053651
    Abstract: Light transmission is maximized through the pass band of a photonic bandgap (PBG) crystal (having alternating high- and low-index material) while preserving high reflection for stop band. An anti-reflective coating (ARC) is used to coat the PBG crystal wherein the ARC material has a refractive index of n=(nairĂ—nhigh index material)1/2 and thickness around ?c/8 where ?c is center wavelength.
    Type: Application
    Filed: August 23, 2005
    Publication date: March 8, 2007
    Inventors: Shoji Akiyama, Ivan Celanovic, Natalija Jovanovic, Francis O'Sullivan, Kazumi Wada
  • Patent number: 6933099
    Abstract: A method of forming a patterned layer on a substrate including depositing a notched or undercut resist pattern to define at least one recess in the photoresist, with the notch or undercut circumjacent the base of the recess, sputtering a material into the recess and removing the resist and the material deposited on the resist characterised in that the aspect ratio of the recess and height of the mouth of the notch or undercut are such that the notch or undercut lies substantially in the shadow beneath the resist, the layer deposited upon it and the layer at the base of the recess in respect of any sputtered particle travelling in a straight line through the mouth of the recess such that material deposited on the walls of the recesses is not continuous with material deposited on the base of the recess.
    Type: Grant
    Filed: November 8, 2002
    Date of Patent: August 23, 2005
    Assignee: Trikon Holdings Limited
    Inventors: James Francis O'Sullivan, Stephen Robert Burgess
  • Publication number: 20030091937
    Abstract: A method of forming a patterned layer on a substrate including depositing a notched or undercut resist pattern to define at least one recess in the photoresist, with the notch or undercut circumjacent the base of the recess, sputtering a material into the recess and removing the resist and the material deposited on the resist characterised in that the aspect ratio of the recess and height of the mouth of the notch or undercut are such that the notch or undercut lies substantially in the shadow beneath the resist, the layer deposited upon it and the layer at the base of the recess in respect of any sputtered particle travelling in a straight line through the mouth of the recess such that material deposited on the walls of the recesses is not continuous with material deposited on the base of the recess.
    Type: Application
    Filed: November 8, 2002
    Publication date: May 15, 2003
    Inventors: James Francis O'Sullivan, Stephen Robert Burgess
  • Patent number: 5763443
    Abstract: The invention concerns the new use of riminophenazines in the treatment of a patient who has built up, or could build up, resistance to a therapeutically active substance, such as a patient requiring treatment for cancer. The riminophenazine conveniently may be of the general formula (I). ##STR1## R.sup.1 is a hydrogen atom, a halogen atom or a (C.sub.1 -C.sub.3) alkyl, (C.sub.1 -C.sub.3) alkoxy, fluoromethoxy or trifluoromethyl radical, R.sup.2 is a hydrogen or halogen atom, R.sup.3 is selected from hydrogen, (C.sub.1 -C.sub.4) alkyl, N,N-dialkylamino alkyl, (C.sub.3 -C.sub.12) cycloalkyl, methylcyclohexyl, hydroxycyclohexyl, cycloalkylmethyl, piperidyl, alkyl substituted piperidyl or N-benzyl-substituted pipperidyl, R.sup.4 is a hydrogen or halogen atom or a (C.sub.1 -C.sub.3) alkyl, (C.sub.1 -C.sub.3) alkoxy, fluoromethoxy or trifluoromethyl radical, and n is 1, 2 or 3. The invention also provides novel riminophenazines of general formula (I), their preparation, and compositions containing them.
    Type: Grant
    Filed: October 28, 1996
    Date of Patent: June 9, 1998
    Assignee: Universiteit Van Pretoria
    Inventors: Constance Elizabeth Medlen, Ronald Anderson, John Francis O'Sullivan
  • Patent number: 4980683
    Abstract: An aircraft collision avoidance instrument system has a display located in the aircraft glareshield in the peripheral field of view of the pilot when the pilot is looking forwardly through the aircraft window. The display has a matrix array of LCD elements which is controlled to provide a continually changing image that is visible in the peripheral field of view of the pilot when a possible collision with another aircraft is likely. The changing image may be arrows moving up or down the display to indicate climb or decend, or a flashing horizontal line to indicate that present height must be maintained. An alphanumeric legend indicative of the collision avoidance action to be taken is also provided by the display. When no collision is likely, the display is used to present other information to the pilot.
    Type: Grant
    Filed: November 3, 1989
    Date of Patent: December 25, 1990
    Assignee: Smiths Industries Public Limited Company
    Inventors: Peter-Francis O'Sullivan, Keith G. Dougan