Patents by Inventor Francis O'Sullivan
Francis O'Sullivan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11315015Abstract: The present invention provides a system and method of side-stepping the need to retrain neural network model after initially trained using a simulator by comparing real-world data to data predicted by the simulator for the same inputs, and developing a mapping correlation that adjusts real world data toward the simulation data. Thus, the decision logic developed in the simulation-trained model is preserved and continues to operate in an altered reality. A threshold metric of similarity can be initially provided into the mapping algorithm, which automatically adjusts real world data to adjusted data corresponding to the simulation data for operating the neural network model when the metric of similarity between the real world data and the simulation data exceeds the threshold metric. Updated learning can continue as desired, working in the background as conditions are monitored.Type: GrantFiled: June 8, 2018Date of Patent: April 26, 2022Assignee: TECHNIP FRANCEInventors: James Francis O'Sullivan, Djoni Eka Sidarta, Ho Joon Lim
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Publication number: 20190378005Abstract: The present invention provides a system and method of side-stepping the need to retrain neural network model after initially trained using a simulator by comparing real-world data to data predicted by the simulator for the same inputs, and developing a mapping correlation that adjusts real world data toward the simulation data. Thus, the decision logic developed in the simulation-trained model is preserved and continues to operate in an altered reality. A threshold metric of similarity can be initially provided into the mapping algorithm, which automatically adjusts real world data to adjusted data corresponding to the simulation data for operating the neural network model when the metric of similarity between the real world data and the simulation data exceeds the threshold metric. Updated learning can continue as desired, working in the background as conditions are monitored.Type: ApplicationFiled: June 8, 2018Publication date: December 12, 2019Applicant: TECHNIP FRANCEInventors: James Francis O'SULLIVAN, Djoni Eka SIDARTA, Ho Joon LIM
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Patent number: 9862468Abstract: The present disclosure provides in at least one embodiment a rotatable keel skirt assembly on a rectangular-shaped keel pontoon. The rectangular-shaped keel pontoon reduces the maximum hull width by a significant percentage compared to a circular-shaped keel pontoon while maintaining the same hull motion performance. The rotatable keel skirt assembly allows the size of the pontoon to define the width of the hull during some fabrication phases of the platform, rather than the additional width of the keel skirt assembly. Thus, the outreach of the crane and other equipment can be effectively used as if the keel skirt assembly was not present. After fabrication, the hull can be moved away from the quayside and the keel skirt assembly can be rotated into position for service. Various systems and methods are disclosed for articulating the keel skirt assembly about the hull.Type: GrantFiled: October 10, 2014Date of Patent: January 9, 2018Assignee: TECHNIP FRANCEInventors: James Francis O'Sullivan, Johyun Kyoung
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Patent number: 9671231Abstract: The present disclosure provides a system and method of monitoring a mooring system for a floating vessel using the time of the natural period independent of environmental conditions. The natural period can be calculated and/or established experientially over time by measuring movement of the vessel to establish the natural period at given geographical positions of a secure and intact mooring system. The natural period can be monitored based on the time to complete a natural period. A change in a mooring line stiffness, whether by a failure, stretching, a degradation of the mooring line integrity, or a significant displacement of the anchoring point, will be translated into a different natural period with a different time.Type: GrantFiled: July 20, 2015Date of Patent: June 6, 2017Assignee: TECHNIP FRANCEInventors: James Francis O'Sullivan, Jr., Nicolas Tcherniguin
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Publication number: 20170023366Abstract: The present disclosure provides a system and method of monitoring a mooring system for a floating vessel using the time of the natural period independent of environmental conditions. The natural period can be calculated and/or established experientially over time by measuring movement of the vessel to establish the natural period at given geographical positions of a secure and intact mooring system. The natural period can be monitored based on the time to complete a natural period. A change in a mooring line stiffness, whether by a failure, stretching, a degradation of the mooring line integrity, or a significant displacement of the anchoring point, will be translated into a different natural period with a different time.Type: ApplicationFiled: July 20, 2015Publication date: January 26, 2017Inventors: James Francis O'Sullivan, JR., Nicolas Tcherniguin
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Publication number: 20160101836Abstract: The present disclosure provides in at least one embodiment a rotatable keel skirt assembly on a rectangular-shaped keel pontoon. The rectangular-shaped keel pontoon reduces the maximum hull width by a significant percentage compared to a circular-shaped keel pontoon while maintaining the same hull motion performance. The rotatable keel skirt assembly allows the size of the pontoon to define the width of the hull during some fabrication phases of the platform, rather than the additional width of the keel skirt assembly. Thus, the outreach of the crane and other equipment can be effectively used as if the keel skirt assembly was not present. After fabrication, the hull can be moved away from the quayside and the keel skirt assembly can be rotated into position for service. Various systems and methods are disclosed for articulating the keel skirt assembly about the hull.Type: ApplicationFiled: October 10, 2014Publication date: April 14, 2016Inventors: James Francis O'Sullivan, Johyun Kyoung
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Patent number: 7251402Abstract: Light transmission is maximized through the pass band of a photonic bandgap (PBG) crystal (having alternating high- and low-index material) while preserving high reflection for stop band. An anti-reflective coating (ARC) is used to coat the PBG crystal wherein the ARC material has a refractive index of n=(nairĂ—nhigh index material)1/2 and thickness around ?c/8 where ?c is center wavelength.Type: GrantFiled: August 23, 2005Date of Patent: July 31, 2007Assignee: Massachusetts Institute of TechnologyInventors: Shoji Akiyama, Ivan Celanovic, Natalija Z. Jovanovic, Francis O'Sullivan, Kazumi Wada
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Publication number: 20070053651Abstract: Light transmission is maximized through the pass band of a photonic bandgap (PBG) crystal (having alternating high- and low-index material) while preserving high reflection for stop band. An anti-reflective coating (ARC) is used to coat the PBG crystal wherein the ARC material has a refractive index of n=(nairĂ—nhigh index material)1/2 and thickness around ?c/8 where ?c is center wavelength.Type: ApplicationFiled: August 23, 2005Publication date: March 8, 2007Inventors: Shoji Akiyama, Ivan Celanovic, Natalija Jovanovic, Francis O'Sullivan, Kazumi Wada
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Patent number: 6933099Abstract: A method of forming a patterned layer on a substrate including depositing a notched or undercut resist pattern to define at least one recess in the photoresist, with the notch or undercut circumjacent the base of the recess, sputtering a material into the recess and removing the resist and the material deposited on the resist characterised in that the aspect ratio of the recess and height of the mouth of the notch or undercut are such that the notch or undercut lies substantially in the shadow beneath the resist, the layer deposited upon it and the layer at the base of the recess in respect of any sputtered particle travelling in a straight line through the mouth of the recess such that material deposited on the walls of the recesses is not continuous with material deposited on the base of the recess.Type: GrantFiled: November 8, 2002Date of Patent: August 23, 2005Assignee: Trikon Holdings LimitedInventors: James Francis O'Sullivan, Stephen Robert Burgess
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Publication number: 20030091937Abstract: A method of forming a patterned layer on a substrate including depositing a notched or undercut resist pattern to define at least one recess in the photoresist, with the notch or undercut circumjacent the base of the recess, sputtering a material into the recess and removing the resist and the material deposited on the resist characterised in that the aspect ratio of the recess and height of the mouth of the notch or undercut are such that the notch or undercut lies substantially in the shadow beneath the resist, the layer deposited upon it and the layer at the base of the recess in respect of any sputtered particle travelling in a straight line through the mouth of the recess such that material deposited on the walls of the recesses is not continuous with material deposited on the base of the recess.Type: ApplicationFiled: November 8, 2002Publication date: May 15, 2003Inventors: James Francis O'Sullivan, Stephen Robert Burgess
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Patent number: 5763443Abstract: The invention concerns the new use of riminophenazines in the treatment of a patient who has built up, or could build up, resistance to a therapeutically active substance, such as a patient requiring treatment for cancer. The riminophenazine conveniently may be of the general formula (I). ##STR1## R.sup.1 is a hydrogen atom, a halogen atom or a (C.sub.1 -C.sub.3) alkyl, (C.sub.1 -C.sub.3) alkoxy, fluoromethoxy or trifluoromethyl radical, R.sup.2 is a hydrogen or halogen atom, R.sup.3 is selected from hydrogen, (C.sub.1 -C.sub.4) alkyl, N,N-dialkylamino alkyl, (C.sub.3 -C.sub.12) cycloalkyl, methylcyclohexyl, hydroxycyclohexyl, cycloalkylmethyl, piperidyl, alkyl substituted piperidyl or N-benzyl-substituted pipperidyl, R.sup.4 is a hydrogen or halogen atom or a (C.sub.1 -C.sub.3) alkyl, (C.sub.1 -C.sub.3) alkoxy, fluoromethoxy or trifluoromethyl radical, and n is 1, 2 or 3. The invention also provides novel riminophenazines of general formula (I), their preparation, and compositions containing them.Type: GrantFiled: October 28, 1996Date of Patent: June 9, 1998Assignee: Universiteit Van PretoriaInventors: Constance Elizabeth Medlen, Ronald Anderson, John Francis O'Sullivan
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Patent number: 4980683Abstract: An aircraft collision avoidance instrument system has a display located in the aircraft glareshield in the peripheral field of view of the pilot when the pilot is looking forwardly through the aircraft window. The display has a matrix array of LCD elements which is controlled to provide a continually changing image that is visible in the peripheral field of view of the pilot when a possible collision with another aircraft is likely. The changing image may be arrows moving up or down the display to indicate climb or decend, or a flashing horizontal line to indicate that present height must be maintained. An alphanumeric legend indicative of the collision avoidance action to be taken is also provided by the display. When no collision is likely, the display is used to present other information to the pilot.Type: GrantFiled: November 3, 1989Date of Patent: December 25, 1990Assignee: Smiths Industries Public Limited CompanyInventors: Peter-Francis O'Sullivan, Keith G. Dougan