Patents by Inventor Francisco Kole

Francisco Kole has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220254829
    Abstract: Back-illuminated DUV/VUV/EUV radiation or charged particle image sensors are fabricated using a method that utilizes a plasma atomic layer deposition (plasma ALD) process to generate a thin pinhole-free pure boron layer over active sensor areas. Circuit elements are formed on a semiconductor membrane's frontside surface, and then an optional preliminary hydrogen plasma cleaning process is performed on the membrane's backside surface. The plasma ALD process includes performing multiple plasma ALD cycles, with each cycle including forming an adsorbed boron precursor layer during a first cycle phase, and then generating a hydrogen plasma to convert the precursor layer into an associated boron nanolayer during a second cycle phase. Gasses are purged from the plasma ALD process chamber after each cycle phase. The plasma ALD cycles are repeated until the resulting stack of boron nanolayers has a cumulative stack height (thickness) that is equal to a selected target thickness.
    Type: Application
    Filed: December 7, 2021
    Publication date: August 11, 2022
    Inventors: Sisir Yalamanchili, John Fielden, Francisco Kole, Yung-Ho Alex Chuang
  • Patent number: 9562846
    Abstract: In certain embodiments, a method for validating the human visual inspection process or an optical analysis instrument for use with biological particles may include inspecting a standard particle solution using the optical analysis instrument. The standard particle solution may include a known concentration of standard particles suspended in solution with the standard particles having a defined size and shape distribution. The standard particles may have a refractive index that is substantially similar to a refractive index of the biological particles. The method may include assessing a concentration of standard particles in the standard particle solution from the inspection. The method may include assessing a difference between the assessed concentration of standard particles and the known concentration of standard particles. The method may include modifying one or more parameters of the optical analysis instrument based on the assessed difference between the concentrations.
    Type: Grant
    Filed: July 7, 2014
    Date of Patent: February 7, 2017
    Assignee: KLA-Tencor Corporation
    Inventors: Francisco Kole, Johannes G. M. Christiaanse, Greg Kirk, Winfred Tee Chow
  • Publication number: 20150015872
    Abstract: In certain embodiments, a method for validating the human visual inspection process or an optical analysis instrument for use with biological particles may include inspecting a standard particle solution using the optical analysis instrument. The standard particle solution may include a known concentration of standard particles suspended in solution with the standard particles having a defined size and shape distribution. The standard particles may have a refractive index that is substantially similar to a refractive index of the biological particles. The method may include assessing a concentration of standard particles in the standard particle solution from the inspection. The method may include assessing a difference between the assessed concentration of standard particles and the known concentration of standard particles. The method may include modifying one or more parameters of the optical analysis instrument based on the assessed difference between the concentrations.
    Type: Application
    Filed: July 7, 2014
    Publication date: January 15, 2015
    Inventors: Francisco Kole, Johannes G. M. Christiaanse, Greg Kirk, Winfred Tee Chow
  • Publication number: 20140308456
    Abstract: An apparatus for the controlled deposition of particles onto a film or a substrate, including: a frame arranged to support a film or a substrate having first and second surfaces facing in first and second opposite directions, respectively; a nozzle arranged to emit a stream of particles charged with a first polarity toward the first surface; and an electrode: charged with a second polarity, opposite the first polarity, and located adjacent the second surface; and arranged to attract the stream of particles to a region of the first surface. A line orthogonal to the first surface passes through the region and the electrode.
    Type: Application
    Filed: April 7, 2014
    Publication date: October 16, 2014
    Inventors: Yu Guan, Francisco Kole