Abstract: A lithographic apparatus includes an illumination system that conditions a radiation beam, a patterning support holding a patterning device that patterns the radiation beam, a substrate support to hold a substrate, a projection system to project the patterned radiation beam onto the substrate, an additional support, and a flexible line assembly to transfer at least one of a current, a signal or a fluid. A first part of the line assembly extends between a base and the additional support, and a second part extends between the additional support and the patterning support or the substrate support. A first motor assembly generates a force in at least one direction, and is coupled to the one of either the patterning support or the substrate support. A second motor assembly generates a force in the at least one direction, and is coupled to the additional support. The first motor assembly includes a planar motor.

Abstract: A positioning device configured to position a first and a second movable object in a substantially common operation area is presented. The positioning device includes a first coil assembly arranged next to the operation area, a second coil assembly arranged at an opposite side of the operation area, one or more first magnets arranged on the first movable object and configured to cooperate with the first coil assembly, and one or more second magnets arranged on the second movable object and configured to cooperate with the second coil assembly.

Abstract: A stage system for a lithographic apparatus is presented and includes a movable stage, and a stationary motor coil assembly including coils to interact with a magnet of the movable stage to thereby form a moving magnet motor to drive the stage. The stage system also includes a position measurement system to measure a position of the stage in a working area, the position measurement system to transfer a measurement beam along a measurement beam path which extends over a part of the motor coil assembly towards the stage. The coil assembly includes a coil assembly path between the motor coils to drive the motor, the coil assembly path extending below the measurement beam path. The stage may include a substrate stage or a reticle stage.

Abstract: A method of actuating a movable object in a first degree of freedom includes a) providing a first motor assembly including one or more motors of a first type and a second motor assembly including one or more motors of a second type, each of the first and second motor assembles being configured to move the movable object in the first degree of freedom, b) feeding the first motor assembly with a feed-forward signal of a feed-forward unit on the basis of a feed-forward reference signal, and c) feeding the second motor assembly with a control signal of a position control unit on the basis of a position control reference signal.

Abstract: A stage system for a lithographic apparatus is presented and includes a movable stage, and a stationary motor coil assembly including coils to interact with a magnet of the movable stage to thereby form a moving magnet motor to drive the stage. The stage system also includes a position measurement system to measure a position of the stage in a working area, the position measurement system to transfer a measurement beam along a measurement beam path which extends over a part of the motor coil assembly towards the stage. The coil assembly includes a coil assembly path between the motor coils to drive the motor, the coil assembly path extending below the measurement beam path. The stage may include a substrate stage or a reticle stage.

Abstract: A method of actuating a movable object in a first degree of freedom includes a) providing a first motor assembly including one or more motors of a first type and a second motor assembly including one or more motors of a second type, each of the first and second motor assembles being configured to move the movable object in the first degree of freedom, b) feeding the first motor assembly with a feed-forward signal of a feed-forward unit on the basis of a feed-forward reference signal, and c) feeding the second motor assembly with a control signal of a position control unit on the basis of a position control reference signal.

Abstract: A lithographic apparatus includes an illumination system that conditions a radiation beam, a patterning support holding a patterning device that patterns the radiation beam, a substrate support to hold a substrate, a projection system to project the patterned radiation beam onto the substrate, an additional support, and a flexible line assembly to transfer at least one of a current, a signal or a fluid. A first part of the line assembly extends between a base and the additional support, and a second part extends between the additional support and the patterning support or the substrate support. A first motor assembly generates a force in at least one direction, and is coupled to the one of either the patterning support or the substrate support. A second motor assembly generates a force in the at least one direction, and is coupled to the additional support. The first motor assembly includes a planar motor.