Patents by Inventor Franciscus Antonius Commissaris

Franciscus Antonius Commissaris has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic projection apparatus and a device manufacturing method using such lithographic projection apparatus
    Publication number: 20060008716
    Abstract: A manufacturing method is utilized in lithographic projection apparatus in order to enable all aberrations to be compensated for but with those aberrations that are of most significance to the particular application (the particular pattern, illumination mode, etc.) being given precedence over aberrations that are of lesser significance in relation to that particular application. The method uses a substrate having a target portion for receiving an image, a mask for applying a pattern in accordance with a required patterning application, and a projection system to project a selected beam of radiation onto the mask to produce a specific required patterned beam providing an image of the pattern on the target portion.
    Type: Application
    Filed: July 8, 2004
    Publication date: January 12, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Andre Jeunink, M'Hamed Akhssay, Johannes Baselmans, Franciscus Antonius Commissaris, Simon De Groot, Wim Tel, Alexander Hendrikus Van Der Hoff, Arnout Van De Stadt, Remco Van Dijk