Patents by Inventor Franciscus B. Van Bilsen

Franciscus B. Van Bilsen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Cleaning of semiconductor processing chambers
    Patent number: 6708700
    Abstract: A method of removing deposits from selected areas of a substrate-processing chamber comprising applying RF energy to a coil located around selected areas of the chamber is provided. Also provided is a substrate-processing chamber with improved cleaning properties having a coil capable of being coupled with an RF field disposed at selected areas of the chamber.
    Type: Grant
    Filed: April 14, 2003
    Date of Patent: March 23, 2004
    Assignee: ASM America
    Inventors: Ivo Raaijmakers, Franciscus B. Van Bilsen
  • Reaction chamber with decreased wall deposition
    Patent number: 6666924
    Abstract: An apparatus for processing substrates comprising a process chamber having walls, wherein one or more selected regions of the walls are different temperatures than other regions of said walls during processing of substrates, whereby the chamber has reduced deposition of byproducts from processing is provided. Methods of minimizing deposition on a reaction chamber having walls comprising altering the temperature of selected regions of the walls are also provided.
    Type: Grant
    Filed: March 28, 2000
    Date of Patent: December 23, 2003
    Assignee: ASM America
    Inventor: Franciscus B. van Bilsen
  • Cleaning of semiconductor processing chambers
    Publication number: 20030205251
    Abstract: A method of removing deposits from selected areas of a substrate-processing chamber comprising applying RF energy to a coil located around selected areas of the chamber is provided. Also provided is a substrate-processing chamber with improved cleaning properties having a coil capable of being coupled with an RF field disposed at selected areas of the chamber.
    Type: Application
    Filed: April 14, 2003
    Publication date: November 6, 2003
    Inventors: Ivo Raaijmakers, Franciscus B. Van Bilsen
  • Cleaning of semiconductor processing chambers
    Patent number: 6564810
    Abstract: A method of removing deposits from selected areas of a substrate-processing chamber comprising applying RF energy to a coil located around selected areas of the chamber is provided. Also provided is a substrate-processing chamber with improved cleaning properties having a coil capable of being coupled with an RF field disposed at selected areas of the chamber.
    Type: Grant
    Filed: March 28, 2000
    Date of Patent: May 20, 2003
    Assignee: ASM America
    Inventors: Ivo Raaijmakers, Franciscus B. Van Bilsen