Patents by Inventor Franciscus H. A. G. Fey

Franciscus H. A. G. Fey has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithography apparatus with filters for optimizing uniformity of an image
    Patent number: 6404499
    Abstract: A lithographic projection apparatus has a correction device for lithographic projection. The lithographic projection apparatus has a projection system that projects a beam of radiation onto a mask. The correction device has a filter unit placed in the path of the beam for varying the spatial intensity of the beam along at least one direction of its cross-section so that the integrated intensity of radiation of mask level is substantially uniform across the entire length or the cross-section.
    Type: Grant
    Filed: April 16, 1999
    Date of Patent: June 11, 2002
    Assignee: ASML Netherlands B.V.
    Inventors: Judocus M. D. Stoeldraijer, Jan W. R. Ten Cate, Franciscus H. A. G. Fey, Joost Sytsma