Patents by Inventor Franciscus Martinus Henricus Maria van Laarhoven

Franciscus Martinus Henricus Maria van Laarhoven has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Charged particle microscope with special aperture plate
    Patent number: 9934936
    Abstract: A Charged Particle Microscope includes A specimen holder, for holding a specimen; A source, for producing a beam of charged particles; An illuminator, for directing said beam so as to irradiate the specimen; and A detector, for detecting a flux of radiation emanating from the specimen in response to said irradiation. The illuminator includes: An aperture plate comprising an aperture region in a path of said beam, for defining a geometry of the beam prior to its impingement upon said specimen. The aperture region includes a distribution of multiple holes, each of which is smaller than a diameter of the beam incident on the aperture plate.
    Type: Grant
    Filed: October 15, 2015
    Date of Patent: April 3, 2018
    Assignee: FEI Company
    Inventors: Pavel Potocek, Franciscus Martinus Henricus Maria van Laarhoven, Faysal Boughorbel, Remco Schoenmakers, Peter Christiaan Tiemeijer
  • CHARGED PARTICLE MICROSCOPE WITH SPECIAL APERTURE PLATE
    Publication number: 20160111247
    Abstract: A Charged Particle Microscope, comprising: includes A specimen holder, for holding a specimen; A source, for producing a beam of charged particles; An illuminator, for directing said beam so as to irradiate the specimen; and A detector, for detecting a flux of radiation emanating from the specimen in response to said irradiation. The illuminator includes: An aperture plate comprising an aperture region in a path of said beam, for defining a geometry of the beam prior to its impingement upon said specimen. The aperture region includes a distribution of multiple holes, each of which is smaller than a diameter of the beam incident on the aperture plate.
    Type: Application
    Filed: October 15, 2015
    Publication date: April 21, 2016
    Applicant: FEI Company
    Inventors: Pavel Potocek, Franciscus Martinus Henricus Maria van Laarhoven, Faysal Boughorbel, Remco Schoenmakers, Peter Christiaan Tiemeijer