Patents by Inventor Franciscus Van De Mast
Franciscus Van De Mast has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10620553Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.Type: GrantFiled: February 25, 2019Date of Patent: April 14, 2020Assignee: ASML Netherlands B.V.Inventors: Jan Steven Christiaan Westerlaken, Gerardus Arnoldus Hendricus Franciscus Janssen, Peter Paul Steijaert, Engelbertus Antonius Fransiscus Van Der Pasch, Franciscus Van De Mast
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Publication number: 20190235398Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.Type: ApplicationFiled: February 25, 2019Publication date: August 1, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Jan Steven Christiaan WESTERLAKEN, Gerardus Arnoldus Hendricus Franciscus JANSSEN, Peter Paul STEIJAERT, Engelbertus Antonius Fransiscus VAN DER PASCH, Franciscus VAN DE MAST
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Publication number: 20190214318Abstract: A substrate, including a substrate layer; and an etchable layer on the substrate layer, the etchable layer including a patterned region thereon or therein and including a blank region of sufficient size to enable a bulk etch rate of an etch tool for etching the blank region to be determined.Type: ApplicationFiled: August 14, 2017Publication date: July 11, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Mark John MASLOW, Johannes Catharinus Hubertus MULKENS, Peter TEN BERGE, Franciscus VAN DE MAST, Jan-Willem GEMMINK, Liesbeth REIJNEN
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Patent number: 10216102Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.Type: GrantFiled: February 12, 2018Date of Patent: February 26, 2019Assignee: ASML Netherlands B.V.Inventors: Jan Steven Christiaan Westerlaken, Gerardus Arnoldus Hendricus Franciscus Janssen, Peter Paul Steijaert, Engelbertus Antonius Fransiscus Van Der Pasch, Franciscus Van De Mast
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Publication number: 20180164705Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet,Type: ApplicationFiled: February 12, 2018Publication date: June 14, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Jan Steven Christiaan WESTERLAKEN, Gerardus Arnoldus Hendricus Franciscus JANSSEN, Peter Paul STEIJAERT, Engelbertus Antonius Fransiscus VAN DER PASCH, Franciscus VAN DE MAST
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Patent number: 9891542Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.Type: GrantFiled: December 21, 2016Date of Patent: February 13, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Jan Steven Christiaan Westerlaken, Gerardus Arnoldus Hendricus Franciscus Janssen, Peter Paul Steijaert, Engelbertus Antonius Fransiscus Van Der Pasch, Franciscus Van De Mast
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Publication number: 20170242349Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.Type: ApplicationFiled: December 21, 2016Publication date: August 24, 2017Inventors: Jan Steven Christiaan Westerlaken, Gerardus Arnoldus Hendricus Franciscus Janssen, Peter Paul Steijaert, Engelbertus Antonius Fransiscus Van Der Pasch, Franciscus Van De Mast
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Patent number: 9529277Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.Type: GrantFiled: March 13, 2015Date of Patent: December 27, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Jan Steven Christiaan Westerlaken, Gerardus Arnoldus Hendricus Franciscus Janssen, Peter Paul Steijaert, Engelbertus Antonius Fransiscus Van Der Pasch, Franciscus Van De Mast
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Publication number: 20150185624Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.Type: ApplicationFiled: March 13, 2015Publication date: July 2, 2015Inventors: Jan Steven Christiaan WESTERLAKEN, Gerardus Arnoldus Hendricus Franciscus JANSSEN, Peter Paul STEIJAERT, Engelbertus Antonius Fransiscus VAN DER PASCH, Franciscus VAN DE MAST
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Patent number: 8988650Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.Type: GrantFiled: August 22, 2011Date of Patent: March 24, 2015Assignee: ASML Netherlands B.V.Inventors: Jan Steven Christiaan Westerlaken, Engelbertus Antonius Fransiscus Van Der Pasch, Peter Paul Steijaert, Franciscus Van De Mast, Gerardus Arnoldus Hendricus Franciscus Janssen
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Patent number: 8903156Abstract: A method of updating calibration data of a first position detection system adapted to determine the position of an object, is presented. The first position detection system includes a target and a plurality of sensors one of which is mounted on an object and the calibration data including coefficients relating an apparent measured position to an actual position and which can be used to convert an apparent measured position to an actual position thereby to correct for physical imperfections in the first position detection system and enable determination of the actual position from the apparent measured position.Type: GrantFiled: December 16, 2011Date of Patent: December 2, 2014Assignee: ASML Netherlands B.V.Inventors: Franciscus Van De Mast, Engelbertus Antonius Fransiscus Van Der Pasch
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Publication number: 20120156807Abstract: A method of updating calibration data of a first position detection system adapted to determine the position of an object, is presented. The first position detection system includes a target and a plurality of sensors one of which is mounted on an object and the calibration data including coefficients relating an apparent measured position to an actual position and which can be used to convert an apparent measured position to an actual position thereby to correct for physical imperfections in the first position detection system and enable determination of the actual position from the apparent measured position.Type: ApplicationFiled: December 16, 2011Publication date: June 21, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Franciscus VAN DE MAST, Engelbertus Antonius Fransiscus Van Der Pasch
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Publication number: 20120052447Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.Type: ApplicationFiled: August 22, 2011Publication date: March 1, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Jan Steven Christiaan WESTERLAKEN, Engelbertus Antonius Fransiscus VAN DER PASCH, Peter Paul STEIJAERT, Franciscus VAN DE MAST, Gerardus Arnoldus Hendricus Franciscus JANSSEN
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Patent number: 7804582Abstract: A lithographic apparatus includes a system to compensate for the effect of thermal distortion of the substrate table on position measurements of the substrate table using lateral mirrors in the substrate table. Methods of calibrating a lithographic apparatus using various substrate table scan trajectories and measurements of the localized position and rotation of lateral mirrors in the substrate table are presented. A dual stage lithographic apparatus with alignment marks defining the geometry of a lateral mirror used only at the exposure station to measure the geometry of the lateral mirror when the substrate table is at the measurement station.Type: GrantFiled: July 28, 2006Date of Patent: September 28, 2010Assignee: ASML Netherlands B.V.Inventors: Koen Jacobus Johannes Maria Zaal, Joost Jeroen Ottens, Judocus Marie Dominicus Stoeldraijer, Antonius Johannes De Kort, Franciscus Van De Mast, Marteijn De Jong
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Patent number: 7511797Abstract: A lithography system in which a performance criterion of the lithography system is predicted, based on one or more operating conditions of the lithography system, and compared to measurements of that performance criterion. The lithography system may determine from a difference between the measured and predicted performance criterion which, if any, sub-system of the lithography system is not performing as expected.Type: GrantFiled: February 5, 2008Date of Patent: March 31, 2009Assignee: ASML Netherlands B.V.Inventors: Franciscus Van De Mast, Johan Christiaan Gerard Hoefnagels, Johannes Onvlee, Reinder Teun Plug
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Publication number: 20080143985Abstract: A lithography system in which a performance criterion of the lithography system is predicted, based on one or more operating conditions of the lithography system, and compared to measurements of that performance criterion. The lithography system may determine from a difference between the measured and predicted performance criterion which, if any, sub-system of the lithography system is not performing as expected.Type: ApplicationFiled: February 5, 2008Publication date: June 19, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Franciscus Van De Mast, Johan Christiaan Gerard Hoefnagels, Johannes Onvlee, Reinder Teun Plug
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Patent number: 7352439Abstract: A lithography system in which a performance criterion of the lithography system is predicted, based on one or more operating conditions of the lithography system, and compared to measurements of that performance criterion. The lithography system may determine from a difference between the measured and predicted performance criterion which, if any, sub-system of the lithography system is not performing as expected.Type: GrantFiled: August 2, 2006Date of Patent: April 1, 2008Assignee: ASML Netherlands B.V.Inventors: Franciscus Van De Mast, Johan Christiaan Gerard Hoefnagels, Johannes Onvlee, Reinder Teun Plug
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Publication number: 20080036983Abstract: A lithography system in which a performance criterion of the lithography system is predicted, based on one or more operating conditions of the lithography system, and compared to measurements of that performance criterion. The lithography system may determine from a difference between the measured and predicted performance criterion which, if any, sub-system of the lithography system is not performing as expected.Type: ApplicationFiled: August 2, 2006Publication date: February 14, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Franciscus Van De Mast, Johan Christiaan Gerard Hoefnagels, Johannes Onvlee, Reinder Teun Plug
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Publication number: 20080024748Abstract: A lithographic apparatus includes a system to compensate for the effect of thermal distortion of the substrate table on position measurements of the substrate table using lateral mirrors in the substrate table. Methods of calibrating a lithographic apparatus using various substrate table scan trajectories and measurements of the localized position and rotation of lateral mirrors in the substrate table are presented. A dual stage lithographic apparatus with alignment marks defining the geometry of a lateral mirror used only at the exposure station to measure the geometry of the lateral mirror when the substrate table is at the measurement station.Type: ApplicationFiled: July 28, 2006Publication date: January 31, 2008Applicant: ASML Netherlands B.V.Inventors: Koen Jacobus Johannes Maria Zaal, Joost Jeroen Ottens, Judocus Marie Dominicus Stoeldraijer, Antonius Johannes De Kort, Franciscus Van De Mast, Marteijn De Jong