Abstract: Renewable energy desalination plant for the treatment of a fluid includes: a treatment unit equipped with first and second reverse osmosis filtration devices for desalinating of a flow of fluid to be treated, the first and second devices being connected in parallel; first pump positioned upstream of the treatment unit; means for generating electrical energy from renewable energy to supply electricity to the first pump, a supply duct which is fluidically and separately connected with the inlet of the first device and with the inlet of the second device the treatment unit, to supply the two devices with the fluid to be treated, a shut-off/regulating valve which is positioned at the fluidic connection of said supply duct with the first device, an electronic control unit electronically connected to the shut-off/regulation valve; electronic sensors connected to the electronic control unit configured to detect irradiation and/or the intensity of electric current generated.

Abstract: An apparatus for the treatment of wastewater, particularly wastewater originating from a process for the production of photovoltaic cells, comprising: a first line for the treatment of wastewater originating from the process, with a high level of acidity, a second line for the treatment of wastewater with a low level of acidity, a third line for the treatment of wastewater with a very low level of acidity, a fourth line for the treatment of alkaline wastewater, the wastewater that exits from the second line and the third line being adapted to be sent to a purification line designed for filtering, obtaining pure water and ultrapure water, ready to be reused in the same production process.

Abstract: A machine for removing surfaces of semiconductors with integrated circuits, comprising laser emitters, at least one beam of which strikes at least one semiconductor wafer or at least one fragment thereof, for ablation of a surface layer of preset thickness, supports for the at least one wafer or fragment thereof, and movers for the relative movement of the emitters with respect to the at least one wafer or fragment thereof, the movers being adapted to make the emitters follow a path such that the at least one beam emitted thereby travels over the entire surface to be removed of the at least one wafer or fragment thereof.