Patents by Inventor Francois Arnaud D'Avitaya

Francois Arnaud D'Avitaya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9468920
    Abstract: The present invention relates to a method for manufacturing ultra-porous photocatalytic materials, to the ultra-porous photocatalytic materials obtained by such a method, as well as to the uses thereof for producing hydrogen, treating wastewater and polluted water, treating polluted air, or furthermore to the use of same as catalytic membranes in fuel cells. Finally, a last aim of the invention relates to articles chosen among hydrogen production devices, self-cleaning glass panes and antipollution walls.
    Type: Grant
    Filed: September 22, 2010
    Date of Patent: October 18, 2016
    Assignees: Aix-Marseille Universite, Faldes
    Inventors: François Arnaud D'Avitaya, Viatcheslav Safarov, Nadzeya Alexandrovna Zalatarevich
  • Patent number: 9165722
    Abstract: A method for producing a capacitor including an array of nanocapacitors, in which the following operations are performed using a mold having a sealed surface, as a lower surface, and a top surface through which a network of pores extend: (a) filling the pores of the mold and covering a top surface of the mold with an electrically conductive material, to form a structure including an array of nanoscale objects connected by a single substrate; (b) removing the mold; (c) depositing, on an outline of the structure obtained at the end of (b), at least one bilayer including a first layer of an electrically insulating material and a second layer of an electrically conductive material; and then (d) locally removing the at least one bilayer deposited in (c) from the substrate to form the electrical contact.
    Type: Grant
    Filed: July 28, 2011
    Date of Patent: October 20, 2015
    Assignee: CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE
    Inventors: Margrit Hanbuecken, Eric Moyen, Lionel Santinacci, Francois Arnaud D'Avitaya
  • Publication number: 20130224394
    Abstract: A method for producing a capacitor including an array of nanocapacitors, in which the following operations are performed using a mold having a sealed surface, as a lower surface, and a top surface through which a network of pores extend: (a) filling the pores of the mold and covering a top surface of the mold with an electrically conductive material, to form a structure including an array of nanoscale objects connected by a single substrate; (b) removing the mold; (c) depositing, on an outline of the structure obtained at the end of (b), at least one bilayer including a first layer of an electrically insulating material and a second layer of an electrically conductive material; and then (d) locally removing the at least one bilayer deposited in (c) from the substrate to form the electrical contact.
    Type: Application
    Filed: July 28, 2011
    Publication date: August 29, 2013
    Applicant: CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE
    Inventors: Margrit Hanbuecken, Eric Moyen, Lionel Santinacci, Francois Arnaud D' Avitaya
  • Publication number: 20120270722
    Abstract: The present invention relates to a method for manufacturing ultra-porous photocatalytic materials, to the ultra-porous photocatalytic materials obtained by such a method, as well as to the uses thereof for producing hydrogen, treating wastewater and polluted water, treating polluted air, or furthermore to the use of same as catalytic membranes in fuel cells. Finally, a last aim of the invention relates to articles chosen among hydrogen production devices, self-cleaning glass panes and antipollution walls.
    Type: Application
    Filed: September 22, 2010
    Publication date: October 25, 2012
    Applicants: FALDES, AIX-MARSEILLE UNIVERSITE
    Inventors: François Arnaud D'Avitaya, Viatcheslav Safarov, Nadzeya Alexandrovna Zalatarevich
  • Patent number: 4643914
    Abstract: Process and apparatus for the growth of films of silicides of refractory metals and films obtained by this process.According to the invention, in order to grow a silicide film of a refractory metal on a silicon substrate, the latter is cleaned, then thermally degassed under an ultra-high vacuum by bringing the substrate to a given temperature between approximately 600.degree. C. and approximately 800.degree. C. A refractory metal is then evaporated on to the substrate at said temperature, after which the temperature is progressively lowered.Application to the production of electronic microcomponents.
    Type: Grant
    Filed: August 6, 1985
    Date of Patent: February 17, 1987
    Inventors: Francois Arnaud D'Avitaya, Yves Campidelli, Roland Pantel