Patents by Inventor Francois Doniat

Francois Doniat has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Vapor deposition methods of SiCOH low-k films
    Patent number: 8932674
    Abstract: Disclosed are precursors that are adapted to deposit SiCOH films with dielectric constant and Young's Modulus suitable for future generation dielectric films.
    Type: Grant
    Filed: February 17, 2011
    Date of Patent: January 13, 2015
    Assignee: American Air Liquide, Inc.
    Inventors: Christian Dussarrat, François Doniat, Curtis Anderson, James J. F. McAndrew
  • VAPOR DEPOSITION METHODS OF SiCOH LOW-K FILMS
    Publication number: 20130042790
    Abstract: Disclosed are precursors that are adapted to deposit SiCOH films with dielectric constant and Young's Modulus suitable for future generation dielectric films.
    Type: Application
    Filed: February 17, 2011
    Publication date: February 21, 2013
    Applicant: L'Air Liquide, Société Anonyme pour I'Etude et I'Exploitation des Procédés Georges Claude
    Inventors: Christian Dussarrat, François Doniat, Curtis Anderson, James J.F. McAndrew
  • Volatile precursors for deposition of C-linked SiCOH dielectrics
    Patent number: 8298965
    Abstract: Disclosed herein are precursors and methods for their use in the manufacture of semiconductor, photovoltaic, TFT-LCD, or flat panel type devices.
    Type: Grant
    Filed: September 3, 2009
    Date of Patent: October 30, 2012
    Assignee: American Air Liquide, Inc.
    Inventors: James J. F. McAndrew, Francois Doniat
  • Methods for checking and calibrating concentration sensors in a semiconductor processing chamber
    Patent number: 8191397
    Abstract: The present invention provides methods for checking and calibrating one or more concentration sensors in an open or closed system. More specifically, in one embodiment of the present invention, the disclosed method allows for the checking and calibration of one or more concentration sensors in which removal of the liquid from the system is required. In two additional embodiments, the disclosed methods allow for the checking and calibration of one or more concentration sensors without having to remove the liquid from the closed system thereby minimizing contamination of the system while at the same time greatly reducing or eliminating contact of the user with the liquid.
    Type: Grant
    Filed: December 11, 2008
    Date of Patent: June 5, 2012
    Assignees: Air Liquide Electronics U.S. LP, American Air Liquide, Inc.
    Inventors: Francois Doniat, Ronald S. Inman, Nathan Stafford, Axel Soulet, Jean-Louis Marc
  • Volatile Precursors for Deposition of C-Linked SiCOH Dielectrics
    Publication number: 20100052115
    Abstract: Disclosed herein are precursors and methods for their use in the manufacture of semiconductor, photovoltaic, TFT-LCD, or flat panel type devices.
    Type: Application
    Filed: September 3, 2009
    Publication date: March 4, 2010
    Applicant: AMERICAN AIR LIQUIDE, INC.
    Inventors: James J.F. McANDREW, Francois DONIAT
  • Methods For Checking And Calibrating Concentration Sensors In A Semiconductor Processing Chamber
    Publication number: 20090151419
    Abstract: The present invention provides methods for checking and calibrating one or more concentration sensors in an open or closed system. More specifically, in one embodiment of the present invention, the disclosed method allows for the checking and calibration of one or more concentration sensors in which removal of the liquid from the system is required. In two additional embodiments, the disclosed methods allow for the checking and calibration of one or more concentration sensors without having to remove the liquid from the closed system thereby minimizing contamination of the system while at the same time greatly reducing or eliminating contact of the user with the liquid.
    Type: Application
    Filed: December 11, 2008
    Publication date: June 18, 2009
    Applicants: Air Liquide Electronics U.S. LP, American Air Liquide, Inc.
    Inventors: Francois Doniat, Ronald S. Inman, Nathan Stafford, Axel Soulet, Jean-Louis Marc
  • ELECTROLYTE FORMULATION FOR ELECTROCHEMICAL MECHANICAL PLANARIZATION
    Publication number: 20080142375
    Abstract: Compositions and methods suitable for the electrochemical mechanical planarization of a conductive material layer on a semiconductor workpiece. Compositions contain a phosphonic acid based electrolyte, a corrosion inhibitor, a chelating agent, a pH adjusting agent, and a solvent as the remainder.
    Type: Application
    Filed: September 28, 2007
    Publication date: June 19, 2008
    Inventors: Francois Doniat, Matthew L. Fisher, Alan D. Zdunek, Alexandro A. Barajas, Ian Suni, Xiangfeng Chu, Abhinav Tripathi, Yuzhuo Li