Patents by Inventor Francois Xavier Debiesme
Francois Xavier Debiesme has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11835106Abstract: The invention relates a method for manufacturing a damper device including a first part and a second part, said method comprising the following steps: a) providing a damping material in a space in between the first part and the second part, such that the damping material is in a compressed state in the space; and b) heating the device to a predetermined temperature in order to adhere the damping material to the first part and the second part.Type: GrantFiled: November 15, 2018Date of Patent: December 5, 2023Assignee: ASML Netherlands B.V.Inventors: Derk Ten Hoopen, Francois-Xavier Debiesme, Eric Pierre-Yves Vennat
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Publication number: 20210079971Abstract: The invention relates a method for manufacturing a damper device including a first part and a second part, said method comprising the following steps: a) providing a damping material in a space in between the first part and the second part, such that the damping material is in a compressed state in the space; and b) heating the device to a predetermined temperature in order to adhere the damping material to the first part and the second part.Type: ApplicationFiled: November 15, 2018Publication date: March 18, 2021Applicant: ASML Netherlands B.V.Inventors: Derk TEN HOOPEN, Francois-Xavier DEBIESME, Eric Pierre-Yves VENNAT
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Patent number: 9715171Abstract: An imprint lithography apparatus includes an actuator configured to displace an imprint template holder relative to a substrate holder to perform an imprint process. The imprint template holder and/or the substrate holder being supported on a support structure, the support structure being mounted to a vibration isolation system that is mounted to a base of the apparatus. The vibration isolation system is configured to provide a vibration isolation of the support structure relative to the base. A control unit is configured to control the actuator during the imprint process. The control unit is arranged to control an adjustable member of the vibration isolation system to adjust a dynamical characteristic of the vibration isolation system during at least part of the imprint process so as to reduce a displacement of the support structure relative to the base due to a force exerted on the support structure during the imprint process.Type: GrantFiled: December 9, 2010Date of Patent: July 25, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Hans Butler, Johannes Petrus Martinus Bernardus Vermeulen, Marc Wilhelmus Maria Van Der Wijst, Jeroen Pieter Starreveld, Cornelius Adrianus Lambertus De Hoon, Francois Xavier Debiesme
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Patent number: 9378722Abstract: A lithographic apparatus is arranged to transfer a pattern from a patterning device onto a substrate. The lithographic apparatus includes an acoustical sensor to measure a first acoustic vibration in a sensor measurement area in the lithographic apparatus. An actuator is provided to generate a second acoustic vibration in at least an area of the lithographic apparatus. Further, a control device is provided having a sensor input to receive a sensor signal of the acoustical sensor and an actuator output to provide an actuator drive signal to the actuator. The control device is arranged to drive the actuator so as to let the second acoustic vibration at least partly compensate in the area the first acoustic vibration.Type: GrantFiled: December 10, 2008Date of Patent: June 28, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Hans Butler, Marc Wilhelmus Maria Van der Wijst, Johan Hendrik Geerke, Peter Paul Hempenius, Youssef Karel Maria De Vos, Joost De Pee, Clementius Andreas Johannes Beijers, Nicolaas Bernardus Roozen, Erwin Antonius Henricus Fransiscus Van den Boogaert, Marco Hendrikus Hermanus Oude Nijhuis, Francois Xavier Debiesme
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Patent number: 8553199Abstract: A vibration damping arrangement for a lithographic apparatus includes a sensor arranged to, in use, detect a vibration of a projection system. An actuator is arranged to, in use, exert a force on a control unit of the projection system to convert an output signal of the sensor to an actuator input signal such that, during operation, the vibration of the projection system is mitigated by controlling the actuator by the input signal to exert the force to the projection system.Type: GrantFiled: November 11, 2008Date of Patent: October 8, 2013Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Marc Wilhelmus Maria Van Der Wijst, Johan Hendrik Geerke, Joost De Pee, Clementius Andreas Johannes Beijers, Marco Hendrikus Hermanus Oude Nijhuis, Francois Xavier Debiesme
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Patent number: 8243258Abstract: A lithographic apparatus may be provided with an acoustic resonator to dampen an acoustic vibration in the lithographic apparatus. The acoustic resonator may include a Helmholtz resonator. The helmholz resonator may be provided with an active element to provide active damping and/or altering a spring characteristic of the mass spring assembly formed by the resonator. The resonator may be provided at a slit in a shield between the patterning device stage and the projection system to suppress transfer of acoustical vibrations, caused by e.g. a movement of the patterning device stage, to the projection system.Type: GrantFiled: November 21, 2008Date of Patent: August 14, 2012Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Marc Wilhelmus Maria Van Der Wijst, Johan Hendrik Geerke, Joost De Pee, Clementius Andreas Johannes Beijers, Marco Hendrikus Hermanus Oude Nijhuis, Francois Xavier Debiesme
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Publication number: 20110163477Abstract: An imprint lithography apparatus includes an actuator configured to displace an imprint template holder relative to a substrate holder to perform an imprint process. The imprint template holder and/or the substrate holder being supported on a support structure, the support structure being mounted to a vibration isolation system that is mounted to a base of the apparatus. The vibration isolation system is configured to provide a vibration isolation of the support structure relative to the base. A control unit is configured to control the actuator during the imprint process. The control unit is arranged to control an adjustable member of the vibration isolation system to adjust a dynamical characteristic of the vibration isolation system during at least part of the imprint process so as to reduce a displacement of the support structure relative to the base due to a force exerted on the support structure during the imprint process.Type: ApplicationFiled: December 9, 2010Publication date: July 7, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Hans Butler, Johannes Petrus Martinus Bernardus Vermeulen, Marc Wilhelmus Maria Van Der Wijst, Jeroen Pieter Starreveld, Cornelius Adrianus Lambertus De Hoon, Francois Xavier Debiesme
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Publication number: 20090195763Abstract: A lithographic apparatus is arranged to transfer a pattern from a patterning device onto a substrate. The lithographic apparatus includes an acoustical sensor to measure a first acoustic vibration in a sensor measurement area in the lithographic apparatus. An actuator is provided to generate a second acoustic vibration in at least an area of the lithographic apparatus. Further, a control device is provided having a sensor input to receive a sensor signal of the acoustical sensor and an actuator output to provide an actuator drive signal to the actuator. The control device is arranged to drive the actuator so as to let the second acoustic vibration at least partly compensate in the area the first acoustic vibration.Type: ApplicationFiled: December 10, 2008Publication date: August 6, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Hans Butler, Marc Wilhelmus Maria Van Der Wijst, Johan Hendrik Geerke, Peter Paul Hempenius, Youssef Karel Maria De Vos, Joost De Pee, Clementius Andreas Johannes Beijers, Nicolaas Bernardus Roozen, Erwin Antonius Henricus Fransiscus Van Den Boogaert, Marco Hendrikus Hermanus Oude Nijhuis, Francois Xavier Debiesme
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Publication number: 20090161085Abstract: A lithographic apparatus may be provided with an acoustic resonator to dampen an acoustic vibration in the lithographic apparatus. The acoustic resonator may include a Helmholtz resonator. The helmholz resonator may be provided with an active element to provide active damping and/or altering a spring characteristic of the mass spring assembly formed by the resonator. The resonator may be provided at a slit in a shield between the patterning device stage and the projection system to suppress transfer of acoustical vibrations, caused by e.g. a movement of the patterning device stage, to the projection system.Type: ApplicationFiled: November 21, 2008Publication date: June 25, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Hans Butler, Marc Wilhelmus Maria Van Der Wijst, Johan Hendrik Geerke, Joost De Pee, Clementius Andreas Johannes Beijers, Marco Hendrikus Hermanus Oude Nijhuis, Francois Xavier Debiesme
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Publication number: 20090147230Abstract: A vibration damping arrangement for a lithographic apparatus includes a sensor arranged to, in use, detect a vibration of a projection system. An actuator is arranged to, in use, exert a force on a control unit of the projection system to convert an output signal of the sensor to an actuator input signal such that, during operation, the vibration of the projection system is mitigated by controlling the actuator by the input signal to exert the force to the projection system.Type: ApplicationFiled: November 11, 2008Publication date: June 11, 2009Applicant: ASML Netherlands B.V.Inventors: Hans Butler, Marc Wilhelmus Maria Van Der Wijst, Johan Hendrik Geerke, Joost De Pee, Clementius Andreas Johannes Beijers, Marco Hendrikus Hermanus Oude Nijhuis, Francois Xavier Debiesme