Patents by Inventor Francois Xavier Debiesme

Francois Xavier Debiesme has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11835106
    Abstract: The invention relates a method for manufacturing a damper device including a first part and a second part, said method comprising the following steps: a) providing a damping material in a space in between the first part and the second part, such that the damping material is in a compressed state in the space; and b) heating the device to a predetermined temperature in order to adhere the damping material to the first part and the second part.
    Type: Grant
    Filed: November 15, 2018
    Date of Patent: December 5, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Derk Ten Hoopen, Francois-Xavier Debiesme, Eric Pierre-Yves Vennat
  • Publication number: 20210079971
    Abstract: The invention relates a method for manufacturing a damper device including a first part and a second part, said method comprising the following steps: a) providing a damping material in a space in between the first part and the second part, such that the damping material is in a compressed state in the space; and b) heating the device to a predetermined temperature in order to adhere the damping material to the first part and the second part.
    Type: Application
    Filed: November 15, 2018
    Publication date: March 18, 2021
    Applicant: ASML Netherlands B.V.
    Inventors: Derk TEN HOOPEN, Francois-Xavier DEBIESME, Eric Pierre-Yves VENNAT
  • Patent number: 9715171
    Abstract: An imprint lithography apparatus includes an actuator configured to displace an imprint template holder relative to a substrate holder to perform an imprint process. The imprint template holder and/or the substrate holder being supported on a support structure, the support structure being mounted to a vibration isolation system that is mounted to a base of the apparatus. The vibration isolation system is configured to provide a vibration isolation of the support structure relative to the base. A control unit is configured to control the actuator during the imprint process. The control unit is arranged to control an adjustable member of the vibration isolation system to adjust a dynamical characteristic of the vibration isolation system during at least part of the imprint process so as to reduce a displacement of the support structure relative to the base due to a force exerted on the support structure during the imprint process.
    Type: Grant
    Filed: December 9, 2010
    Date of Patent: July 25, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Hans Butler, Johannes Petrus Martinus Bernardus Vermeulen, Marc Wilhelmus Maria Van Der Wijst, Jeroen Pieter Starreveld, Cornelius Adrianus Lambertus De Hoon, Francois Xavier Debiesme
  • Patent number: 9378722
    Abstract: A lithographic apparatus is arranged to transfer a pattern from a patterning device onto a substrate. The lithographic apparatus includes an acoustical sensor to measure a first acoustic vibration in a sensor measurement area in the lithographic apparatus. An actuator is provided to generate a second acoustic vibration in at least an area of the lithographic apparatus. Further, a control device is provided having a sensor input to receive a sensor signal of the acoustical sensor and an actuator output to provide an actuator drive signal to the actuator. The control device is arranged to drive the actuator so as to let the second acoustic vibration at least partly compensate in the area the first acoustic vibration.
    Type: Grant
    Filed: December 10, 2008
    Date of Patent: June 28, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Hans Butler, Marc Wilhelmus Maria Van der Wijst, Johan Hendrik Geerke, Peter Paul Hempenius, Youssef Karel Maria De Vos, Joost De Pee, Clementius Andreas Johannes Beijers, Nicolaas Bernardus Roozen, Erwin Antonius Henricus Fransiscus Van den Boogaert, Marco Hendrikus Hermanus Oude Nijhuis, Francois Xavier Debiesme
  • Patent number: 8553199
    Abstract: A vibration damping arrangement for a lithographic apparatus includes a sensor arranged to, in use, detect a vibration of a projection system. An actuator is arranged to, in use, exert a force on a control unit of the projection system to convert an output signal of the sensor to an actuator input signal such that, during operation, the vibration of the projection system is mitigated by controlling the actuator by the input signal to exert the force to the projection system.
    Type: Grant
    Filed: November 11, 2008
    Date of Patent: October 8, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Hans Butler, Marc Wilhelmus Maria Van Der Wijst, Johan Hendrik Geerke, Joost De Pee, Clementius Andreas Johannes Beijers, Marco Hendrikus Hermanus Oude Nijhuis, Francois Xavier Debiesme
  • Patent number: 8243258
    Abstract: A lithographic apparatus may be provided with an acoustic resonator to dampen an acoustic vibration in the lithographic apparatus. The acoustic resonator may include a Helmholtz resonator. The helmholz resonator may be provided with an active element to provide active damping and/or altering a spring characteristic of the mass spring assembly formed by the resonator. The resonator may be provided at a slit in a shield between the patterning device stage and the projection system to suppress transfer of acoustical vibrations, caused by e.g. a movement of the patterning device stage, to the projection system.
    Type: Grant
    Filed: November 21, 2008
    Date of Patent: August 14, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Hans Butler, Marc Wilhelmus Maria Van Der Wijst, Johan Hendrik Geerke, Joost De Pee, Clementius Andreas Johannes Beijers, Marco Hendrikus Hermanus Oude Nijhuis, Francois Xavier Debiesme
  • Publication number: 20110163477
    Abstract: An imprint lithography apparatus includes an actuator configured to displace an imprint template holder relative to a substrate holder to perform an imprint process. The imprint template holder and/or the substrate holder being supported on a support structure, the support structure being mounted to a vibration isolation system that is mounted to a base of the apparatus. The vibration isolation system is configured to provide a vibration isolation of the support structure relative to the base. A control unit is configured to control the actuator during the imprint process. The control unit is arranged to control an adjustable member of the vibration isolation system to adjust a dynamical characteristic of the vibration isolation system during at least part of the imprint process so as to reduce a displacement of the support structure relative to the base due to a force exerted on the support structure during the imprint process.
    Type: Application
    Filed: December 9, 2010
    Publication date: July 7, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Hans Butler, Johannes Petrus Martinus Bernardus Vermeulen, Marc Wilhelmus Maria Van Der Wijst, Jeroen Pieter Starreveld, Cornelius Adrianus Lambertus De Hoon, Francois Xavier Debiesme
  • Publication number: 20090195763
    Abstract: A lithographic apparatus is arranged to transfer a pattern from a patterning device onto a substrate. The lithographic apparatus includes an acoustical sensor to measure a first acoustic vibration in a sensor measurement area in the lithographic apparatus. An actuator is provided to generate a second acoustic vibration in at least an area of the lithographic apparatus. Further, a control device is provided having a sensor input to receive a sensor signal of the acoustical sensor and an actuator output to provide an actuator drive signal to the actuator. The control device is arranged to drive the actuator so as to let the second acoustic vibration at least partly compensate in the area the first acoustic vibration.
    Type: Application
    Filed: December 10, 2008
    Publication date: August 6, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Hans Butler, Marc Wilhelmus Maria Van Der Wijst, Johan Hendrik Geerke, Peter Paul Hempenius, Youssef Karel Maria De Vos, Joost De Pee, Clementius Andreas Johannes Beijers, Nicolaas Bernardus Roozen, Erwin Antonius Henricus Fransiscus Van Den Boogaert, Marco Hendrikus Hermanus Oude Nijhuis, Francois Xavier Debiesme
  • Publication number: 20090161085
    Abstract: A lithographic apparatus may be provided with an acoustic resonator to dampen an acoustic vibration in the lithographic apparatus. The acoustic resonator may include a Helmholtz resonator. The helmholz resonator may be provided with an active element to provide active damping and/or altering a spring characteristic of the mass spring assembly formed by the resonator. The resonator may be provided at a slit in a shield between the patterning device stage and the projection system to suppress transfer of acoustical vibrations, caused by e.g. a movement of the patterning device stage, to the projection system.
    Type: Application
    Filed: November 21, 2008
    Publication date: June 25, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Hans Butler, Marc Wilhelmus Maria Van Der Wijst, Johan Hendrik Geerke, Joost De Pee, Clementius Andreas Johannes Beijers, Marco Hendrikus Hermanus Oude Nijhuis, Francois Xavier Debiesme
  • Publication number: 20090147230
    Abstract: A vibration damping arrangement for a lithographic apparatus includes a sensor arranged to, in use, detect a vibration of a projection system. An actuator is arranged to, in use, exert a force on a control unit of the projection system to convert an output signal of the sensor to an actuator input signal such that, during operation, the vibration of the projection system is mitigated by controlling the actuator by the input signal to exert the force to the projection system.
    Type: Application
    Filed: November 11, 2008
    Publication date: June 11, 2009
    Applicant: ASML Netherlands B.V.
    Inventors: Hans Butler, Marc Wilhelmus Maria Van Der Wijst, Johan Hendrik Geerke, Joost De Pee, Clementius Andreas Johannes Beijers, Marco Hendrikus Hermanus Oude Nijhuis, Francois Xavier Debiesme