Patents by Inventor Frank Daniel Egitto

Frank Daniel Egitto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6613184
    Abstract: The electrical properties of the bond formed between a metal substrate and an electrically conductive adhesive is improved, especially in high humidity conditions, by applying to the metal substrate an organic coupling agent prior to application of the electrically-conductive adhesive thereto.
    Type: Grant
    Filed: May 12, 1997
    Date of Patent: September 2, 2003
    Assignee: International Business Machines Corporation
    Inventors: Frank Daniel Egitto, Paul Eugene Logan, Luis Jesus Matienzo
  • Patent number: 6337004
    Abstract: The adhesion of chromium-copper layer to polyimide has been greatly improved by a method which provides controlled reduction, rather than total elimination, of water content in the polyimide. The electronic packaging device which incorporates the flexible circuit prepared by the method exhibits greatly improved reliability. It is believed that the invention can be used to improve the adhesion between other organic materials having moisture affinity and materials comprising in-organics or between two organic materials.
    Type: Grant
    Filed: April 28, 1995
    Date of Patent: January 8, 2002
    Assignee: International Business Machines Corporation
    Inventors: Kim Joseph Blackwell, Pei Cheh Chen, Frank Daniel Egitto, Allan Robert Knoll, George Joseph Matarese, Luis Jesus Matienzo
  • Patent number: 6265462
    Abstract: A method of forming a diffusion barrier on an article of a polymer blend of (i) a high surface energy polymer and (ii) a low surface energy polymer. Most commonly the low surface energy polymer is an organosilicon polymer, as a polysilane or a polysiloxane. The surface of the article is exposed to ozone and ultraviolet radiation to form a diffusion barrier.
    Type: Grant
    Filed: January 28, 2000
    Date of Patent: July 24, 2001
    Assignee: International Business Machines Corporation
    Inventors: Frank Daniel Egitto, Luis Jesus Matienzo, Bruce Otho Morrison, Jr.
  • Patent number: 6252012
    Abstract: A method of forming a diffusion barrier on an article of a polymer blend of (i) a high surface energy polymer and (ii) a low surface energy polymer. Most commonly the low surface energy polymer is an organosilicon polymer, as a polysilane or a polysiloxane. The surface of the article is exposed to ozone and ultraviolet radiation to form a diffusion barrier.
    Type: Grant
    Filed: August 30, 1999
    Date of Patent: June 26, 2001
    Assignee: International Business Machines Corporation
    Inventors: Frank Daniel Egitto, Luis Jesus Matienzo, Bruce Otho Morrison, Jr.
  • Patent number: 6232363
    Abstract: A method of forming a diffusion barrier on an article of a polymer blend of (i) a high surface energy polymer and (ii) a low surface energy polymer. Most commonly the low surface energy polymer is an organosilicon polymer, as a polysilane or a polysiloxane. The surface of the article is exposed to ozone and ultraviolet radiation to form a diffusion barrier.
    Type: Grant
    Filed: April 25, 2000
    Date of Patent: May 15, 2001
    Assignee: International Business Machines Corporation
    Inventors: Frank Daniel Egitto, Luis Jesus Matienzo, Bruce Otho Morrison, Jr.
  • Patent number: 6204305
    Abstract: A method of forming a diffusion barrier on an article of a polymer blend of (i) a high surface energy polymer and (ii) a low surface energy polymer. Most commonly the low surface energy polymer is an organosilicon polymer, as a polysilane or a polysiloxane. The surface of the article is exposed to ozone and ultraviolet radiation to form a diffusion barrier.
    Type: Grant
    Filed: August 30, 1999
    Date of Patent: March 20, 2001
    Assignee: International Business Machines Corporation
    Inventors: Frank Daniel Egitto, Luis Jesus Matienzo, Bruce Otho Morrison, Jr.
  • Patent number: 6156484
    Abstract: Disclosed is a sculpted probe pad and a gray scale etching process for making arrays of such probe pads on a thin flexible interposer for testing the electrical integrity of microelectronic devices at terminal metallurgy. Also used in the etching process is a novel fixture for holding the substrate and a novel mask for 1-step photolithographic exposure. The result of the invention is an array of test probes of preselected uniform topography, which make ohmic contact at all points to be tested simultaneously and nondestructively.
    Type: Grant
    Filed: February 11, 1998
    Date of Patent: December 5, 2000
    Assignee: International Business Machines Corporation
    Inventors: Ernest Bassous, Gobinda Das, Frank Daniel Egitto, Natalie Barbara Feilchenfeld, Elizabeth F. Foster, Stephen Joseph Fuerniss, James Steven Kamperman, Donald Joseph Mikalsen, Michael Roy Scheuermann, David Brian Stone
  • Patent number: 6000130
    Abstract: A self-supporting redistribution structure for directly mounting a semi-conductor chip to a multilayer electronic substrate is separately fabricated and then laminated to the multilayer substrate. The redistribution structure comprises a dielectric layer having plated vias communicating between its two major surfaces, redistribution lines and input/output pads on its upper major surface and joining patterns on its lower margin surface for electrical connection with the multilayer substrate. The metal plating in the plated vias of the redistribution device connects respective input/output pads on the upper surface of the redistribution structures with the joining patterns on its lower major surface. Input/output pads define an even (planar) topography with the redistribution lines to facilitate flip chip joining.
    Type: Grant
    Filed: April 20, 1998
    Date of Patent: December 14, 1999
    Assignee: International Business Machines Corporation
    Inventors: Chi Shih Chang, Frank Daniel Egitto
  • Patent number: 5958996
    Abstract: A method of forming a diffusion barrier on an article of a polymer blend of (i) a high surface energy polymer and (ii) a low surface energy polymer. Most commonly the low surface energy polymer is an organosilicon polymer, as a polysilane or a polysiloxane. The surface of the article is exposed to ozone and ultraviolet radiation to form a diffusion barrier.
    Type: Grant
    Filed: February 28, 1997
    Date of Patent: September 28, 1999
    Assignee: International Business Machines Corporation
    Inventors: Frank Daniel Egitto, Luis Jesus Matienzo, Bruce Otho Morrison, Jr.
  • Patent number: 5789121
    Abstract: The present invention provides a method of ablative photodecomposition and forming metal pattern which attains high resolution, is convenient, and employs non-halogenated solvents. The present invention is directed to a process for forming a metal pattern, preferably circuitization on an organic substrate, preferably on a circuit board or component thereof, which comprises coating the substrate with an ablatively-removable coating comprising a polymer resin preferably an acrylate polymer resin and preferably an ultraviolet absorber. A pattern is formed in the polymer coating corresponding to the desired metal pattern by irradiating at least a portion of the polymer coating with a sufficient amount of ultraviolet radiation to thereby ablatively remove the irradiated portion of the polymer coating. Next the patterned substrate is coated with a conductive metal paste to define the metal pattern, and the conductive metal paste is cured.
    Type: Grant
    Filed: June 20, 1997
    Date of Patent: August 4, 1998
    Assignee: International Business Machines Corporation
    Inventors: Douglas Adam Cywar, Charles Robert Davis, Thomas Patrick Duffy, Frank Daniel Egitto, Paul Joseph Hart, Gerald Walter Jones, Edward McLeskey
  • Patent number: 5774340
    Abstract: A self-supporting redistribution structure for directly mounting a semi-conductor chip to a multilayer electronic substrate is separately fabricated and then laminated to the multilayer substrate. The redistribution structure comprises a dielectric layer having plated vias communicating between its two major surfaces, redistribution lines and input/output pads on its upper major surface and joining patterns on its lower margin surface for electrical connection with the multilayer substrate. The metal plating in the plated vias of the redistribution device connects respective input/output pads on the upper surface of the redistribution structures with the joining patterns on its lower major surface. Input/output pads define an even (planar) topography with the redistribution lines to facilitate flip chip joining.
    Type: Grant
    Filed: August 28, 1996
    Date of Patent: June 30, 1998
    Assignee: International Business Machines Corporation
    Inventors: Chi Shih Chang, Frank Daniel Egitto
  • Patent number: 5693928
    Abstract: A method of forming a diffusion barrier on an article of a polymer blend of (i) a high surface energy polymer and (ii) a low surface energy polymer. Most commonly the low surface energy polymer is an organosilicon polymer, as a polysilane or a polysiloxane. The surface of the article is exposed to ozone and ultraviolet radiation to form a diffusion barrier.
    Type: Grant
    Filed: June 27, 1996
    Date of Patent: December 2, 1997
    Assignee: International Business Machines Corporation
    Inventors: Frank Daniel Egitto, Luis Jesus Matienzo, Bruce Otho Morrison, Jr.