Abstract: The instant disclosure is generally related to compositions and methods for obtaining and constructing Bacillus licheniformis host cells (e.g., protein production host cells, cell factories) having increased protein production capabilities. Certain embodiments of the disclosure are directed to efficient genetic modifications of B. licheniformis cells and the subsequent selection of such B. licheniformis cells having increased protein production capabilities. Certain other embodiments of the disclosure are generally related to methods and compositions for producing/obtaining auxotrophic B. licheniformis cells, wherein certain other embodiments of the disclosure are directed to methods and compositions for restoring prototrophy in auxotrophic B. licheniformis cells, and expressing genes of interest (GOIs) in such restored prototrophy B. licheniformis cells.

Abstract: Disclosed in some examples is a method, the method including detecting that an RDMS is recovering from a failure; sending a request for a last committed transaction on a replication component to the replication component; receiving, from the replication component, the last committed transaction which identifies a transaction that was the last committed transaction at a replication component at a time of RDMS failure; determining that a transaction log on the RDMS includes a transaction that had not yet been replicated at the time of RDMS failure which was committed on the transaction log subsequent to the last committed transaction received from the replication component; and based on that determination rolling back the transaction that had not yet been replicated at the time of RDMS failure.

Abstract: A lithographic apparatus comprising a support structure configured to be moved by a first scan distance during a single scanning operation when supporting a patterning device having a first extent in the scanning direction and to be moved by a second scan distance during a single scanning operation when supporting a patterning device having a second extent in the scanning N direction, and a substrate table configured to be moved by a third scan distance during a single scanning operation when the support structure supports a patterning device having the first extent in the scanning direction and to be moved by a fourth scan distance during a single scanning operation when the support structure supports a patterning device having the second extent in the scanning direction.

Abstract: A lithographic apparatus comprising a support structure configured to be moved by a first scan distance during a single scanning operation when supporting a patterning device having a first extent in the scanning direction and to be moved by a second scan distance during a single scanning operation when supporting a patterning device having a second extent in the scanning N direction, and a substrate table configured to be moved by a third scan distance during a single scanning operation when the support structure supports a patterning device having the first extent in the scanning direction and to be moved by a fourth scan distance during a single scanning operation when the support structure supports a patterning device having the second extent in the scanning direction.

Abstract: Disclosed in some examples is a method, the method including detecting that an RDMS is recovering from a failure; sending a request for a last committed transaction on a replication component to the replication component; receiving, from the replication component, the last committed transaction which identifies a transaction that was the last committed transaction at a replication component at a time of RDMS failure; determining that a transaction log on the RDMS includes a transaction that had not yet been replicated at the time of RDMS failure which was committed on the transaction log subsequent to the last committed transaction received from the replication component; and based on that determination rolling back the transaction that had not yet been replicated at the time of RDMS failure.

Abstract: Disclosed in some examples is a method, the method including detecting that an RDMS is recovering from a failure; sending a request for a last committed transaction on a replication component to the replication component; receiving, from the replication component, the last committed transaction which identifies a transaction that was the last committed transaction at a replication component at a time of RDMS failure; determining that a transaction log on the RDMS includes a transaction that had not yet been replicated at the time of RDMS failure which was committed on the transaction log subsequent to the last committed transaction received from the replication component; and based on that determination rolling back the transaction that had not yet been replicated at the time of RDMS failure.

Abstract: Disclosed in some examples is a method, the method including detecting that an RDMS is recovering from a failure; sending a request for a last committed transaction on a replication component to the replication component; receiving, from the replication component, the last committed transaction which identifies a transaction that was the last committed transaction at a replication component at a time of RDMS failure; determining that a transaction log on the RDMS includes a transaction that had not yet been replicated at the time of RDMS failure which was committed on the transaction log subsequent to the last committed transaction received from the replication component; and based on that determination rolling back the transaction that had not yet been replicated at the time of RDMS failure.

Abstract: A lithographic apparatus includes a first support to support a first patterning device; a second support to support a second patterning device, each of the first and the second patterning device capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system to project the patterned radiation beam onto a target portion of the substrate; a controller to drive the first support and the second support and arranged to: drive the first support to perform a scanning movement; drive the second support to accelerate during at least part of the scanning movement of the first support; and drive the second support to perform a scanning movement upon completion of the scanning movement of the first support, so as to scan a die adjacent a die previously scanned during the scanning movement of the first support.