Patents by Inventor Frank Eisenkrämer

Frank Eisenkrämer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10890745
    Abstract: A Mirau interference objective includes an objective lens and a splitter element arranged between the objective lens and an object to be examined. The splitter element is configured to split an incident light beam into a sample beam path and a reference beam path. The objective lens is configured to focus the sample beam path on the object to be examined. A mirror element is arranged between the splitter element and the objective lens. The mirror element is configured to reflect the reference beam path. A phase shift compensating element is configured to compensate for a wavelength-dependent phase shift between the reference beam path and the sample beam path which is superposed on the reference beam path.
    Type: Grant
    Filed: October 28, 2016
    Date of Patent: January 12, 2021
    Assignee: LEICA MICROSYSTEMS CMS GMBH
    Inventors: Hans-Martin Heuck, Frank Eisenkraemer
  • Publication number: 20180364465
    Abstract: A Mirau interference objective includes an objective lens and a splitter element arranged between the objective lens and an object to be examined. The splitter element is configured to split an incident light beam into a sample beam path and a reference beam path. The objective lens is configured to focus the sample beam path on the object to be examined. A mirror element is arranged between the splitter element and the objective lens. The mirror element is configured to reflect the reference beam path. A phase shift compensating element is configured to compensate for a wavelength-dependent phase shift between the reference beam path and the sample beam path which is superposed on the reference beam path.
    Type: Application
    Filed: October 28, 2016
    Publication date: December 20, 2018
    Applicant: LEICA MICROSYSTEMS CMS GMBH
    Inventors: Hans-Martin HEUCK, Frank EISENKRAEMER
  • Patent number: 8999269
    Abstract: The present invention relates to a glass plate (2) for use in a device (1) for stretching sample sections having a sectioning knife, the glass plate (2) being arranged at the back (3) of the sectioning knife in such a way that a defined gap (4) for reception of the sectioned sample is formed between the back (3) of the sectioning knife and the plate (2), the glass plate (2) possessing, at least on one of its longitudinal sides (21, 22), edges (211, 212; 221, 222) ground and polished to optical flatness.
    Type: Grant
    Filed: April 18, 2013
    Date of Patent: April 7, 2015
    Assignee: Leica Microsystems CMS GmbH
    Inventors: Ralf Unger, Frank Eisenkrämer
  • Patent number: 8625201
    Abstract: An optical element for distributing light has a predefined spectral energy distribution in a predetermined working wavelength range. The optical element encompasses a transparent body into which the light enters, and a beam splitter layer embodied inside the transparent body, which layer has in the working wavelength range a predefined wavelength-dependent reflectance with which it reflects the light entering the transparent body in order to generate a reflected exit light bundle, and a wavelength-dependent transmittance with which it transmits the light entering the transparent body to generate a transmitted exit light bundle. The optical element encompasses a compensation layer arrangement, embodied on the transparent body separately from the beam splitter layer, whose transmittance with regard to the light passing through the compensation layer arrangement is defined as a function of the reflectance and transmittance of the beam splitter layer.
    Type: Grant
    Filed: November 15, 2011
    Date of Patent: January 7, 2014
    Assignee: Leica Microsystems CMS GmbH
    Inventors: Frank Eisenkraemer, Steffen Guenther, Hans-Martin Heuck
  • Publication number: 20130287649
    Abstract: The present invention relates to a glass plate (2) for use in a device (1) for stretching sample sections having a sectioning knife, the glass plate (2) being arranged at the back (3) of the sectioning knife in such a way that a defined gap (4) for reception of the sectioned sample is formed between the back (3) of the sectioning knife and the plate (2), the glass plate (2) possessing, at least on one of its longitudinal sides (21, 22), edges (211, 212; 221, 222) ground and polished to optical flatness.
    Type: Application
    Filed: April 18, 2013
    Publication date: October 31, 2013
    Applicant: Leica Microsystems CMS GmbH
    Inventors: Ralf Unger, Frank Eisenkrämer
  • Publication number: 20120120500
    Abstract: An optical element (10, 50, 60) encompasses a transparent body (12) and a beam splitter layer (18) embodied inside the transparent body (12), which layer has in a working wavelength range a predefined wavelength-dependent reflectance with which it reflects the light entering the transparent body (12), and a wavelength-dependent transmittance with which it transmits the light entering the transparent body (12). The optical element (10, 50, 60) further encompasses a compensation layer arrangement (28, 30, 52, 54), whose transmittance with regard to the light passing through the compensation layer arrangement (28, 30, 52, 54) is defined in such a way that the reflected exit light bundle and the transmitted exit light bundle have matching spectral energy distributions.
    Type: Application
    Filed: November 15, 2011
    Publication date: May 17, 2012
    Applicant: LEICA MICROSYSTEMS CMS GMBH
    Inventors: Frank Eisenkraemer, Steffen Guenther, Hans-Martin Heuck
  • Publication number: 20100055296
    Abstract: A deposition apparatus and methods for controlling an actuator and a heating system in a deposition apparatus are proposed. The deposition apparatus comprises a deposition chamber and at least one substrate holder movably arranged within the deposition chamber for holding substrates to be coated. The deposition apparatus shall further comprise radio equipment having at least a first radio device which is connected to the substrate holder and a second radio device which is arranged at least partially outside the deposition chamber. Between the first radio device and the second radio device a radio link is to be established at least temporarily for transferring information.
    Type: Application
    Filed: November 26, 2007
    Publication date: March 4, 2010
    Applicant: LEICA MICROSYSTEMS CMS GMBH
    Inventors: Joachim Bankmann, Frank Eisenkrämer
  • Patent number: 7450302
    Abstract: A microscope (10) is disclosed, having a revolving nosepiece (12) on which are mounted multiple objectives. The objectives (11) comprise multiple components 211, . . . 21n). A light-intensity-reducing layer (40) is applied onto at least one component of an objective. The light-intensity-reducing layer (40) is configured in such a way that for each objective introduced into the illumination beam path, the brightness behind it is of the same magnitude.
    Type: Grant
    Filed: July 8, 2005
    Date of Patent: November 11, 2008
    Assignee: Leica Microsystems CMS GmbH
    Inventors: Frank Eisenkraemer, Ralf Krueger, Christian Schulz
  • Patent number: 7274505
    Abstract: An inspection microscope for several wavelength ranges with at least one illuminating beam path and at least one imaging beam path. Those optical elements in the illuminating beam path and in the imaging beam path, through which beams of all wavelengths pass, are provided with a reflection-reducing layer, by means of which the wavelength ranges with reduced reflection are the visible VIS-wavelength range up to 650 nm, the i-lines at ?=365 nm and the ultraviolet DUV-wavelength range from 240 nm to 270 nm. The reflection-reducing layer is a sandwich structure, comprising various material combinations, such as for example, M2/MgF2 or M2/MgF2/SiO2 or M2/MgF2/Al2O3, where M2 is a mixed substance from the company Merck, comprising Al2O3. The optical components with reduced reflectance preferably comprise quartz glass or CaF2.
    Type: Grant
    Filed: March 22, 2002
    Date of Patent: September 25, 2007
    Assignee: Leica Microsystems CMS GmbH
    Inventor: Frank Eisenkrämer
  • Publication number: 20060012857
    Abstract: A microscope (10) is disclosed, having a revolving nosepiece (12) on which are mounted multiple objectives. The objectives (11) comprise multiple components 211, . . . 21n). A light-intensity-reducing layer (40) is applied onto at least one component of an objective. The light-intensity-reducing layer (40) is configured in such a way that for each objective introduced into the illumination beam path, the brightness behind it is of the same magnitude.
    Type: Application
    Filed: July 8, 2005
    Publication date: January 19, 2006
    Applicant: LEICA MICROSYSTEMS CMS GMBH
    Inventors: Frank Eisenkraemer, Ralf Krueger, Christian Schulz
  • Patent number: 6627304
    Abstract: The invention relates to an absorbent thin-film system made up of alternate metal and dielectric layers. With this system, color-neutral absorption results in the visual spectral region are obtained, as are a defined phase shift and a defined transmission. This film system is used for contrasting methods or contrasting systems in microscopy.
    Type: Grant
    Filed: October 12, 1999
    Date of Patent: September 30, 2003
    Assignee: Leica Microsystems Wetzlar GmbH
    Inventor: Frank Eisenkrämer
  • Patent number: 6624930
    Abstract: An illumination device for a DUV microscope has an illumination beam path, proceeding from a DUV light source in which are arranged a condenser and a reflection filter system which generates a DUV wavelength band and comprises four reflection filters. At these, the illumination beam is reflected in each case at the same reflection angle &agr;, the illumination beam path extending coaxially in front of and behind the reflection filter system. According to the present invention, the reflection angle &agr;=30° and the DUV wavelength band &lgr;DUV+&Dgr;&lgr; has a half-value width of max. 20 nm and a peak with a maximum value S of more than 90% of the incoming light intensity. The resulting very narrow half-value width of the DUV wavelength band makes it possible for the DUV objectives of the DUV microscope to be very well-corrected.
    Type: Grant
    Filed: June 8, 2000
    Date of Patent: September 23, 2003
    Assignee: Leica Microsystems Wetzlar GmbH
    Inventors: Lambert Danner, Frank Eisenkrämer, Michael Veith, Wolfgang Vollrath, Martin Osterfeld