Patents by Inventor Frank Frost

Frank Frost has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate for the micro-lithography and process of manufacturing thereof
    Patent number: 7279252
    Abstract: The invention relates to the manufacture of a substrate which is particularly suitable for EUV micro-lithography and comprises a base layer of low coefficient of thermal expansion (CTE) onto which at least one cover layer made of a semiconductor material is applied. Preferably, the cover layer is a silicon layer, preferably applied by ion beam sputtering. By an additional ion beam figuring treatment substrates of extremely accurate shape and extremely low roughness can be prepared.
    Type: Grant
    Filed: January 7, 2004
    Date of Patent: October 9, 2007
    Assignee: Schott AG
    Inventors: Lutz Aschke, Markus Schweizer, Jochen Alkemper, Axel Schindler, Frank Frost, Thomas Haensel, Renate Fechner
  • Substrate for the micro-lithography and process of manufacturing thereof
    Publication number: 20040166420
    Abstract: The invention relates to the manufacture of a substrate which is particularly suitable for EUV micro-lithography and comprises a base layer of low coefficient of thermal expansion (CTE) onto which at least one cover layer made of a semiconductor material is applied. Preferably, the cover layer is a silicon layer, preferably applied by ion beam sputtering. By an additional ion beam figuring treatment substrates of extremely accurate shape and extremely low roughness can be prepared.
    Type: Application
    Filed: January 7, 2004
    Publication date: August 26, 2004
    Inventors: Lutz Aschke, Markus Schweizer, Jochen Alkemper, Axel Schindler, Frank Frost, Thomas Haensel, Renate Fechner