Patents by Inventor Frank Hipler

Frank Hipler has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9248433
    Abstract: A composition that comprises a titanium compound, an iron compound, and a tungsten compound, wherein the titanium compound has a microcrystalline anatase structure and/or is obtained in the production of TiO2 according to the sulphate process, during hydrolysis of a solution which contains titanyl sulphate, and also in that the composition has a vanadium content, calculated as V, of less than 0.15 wt. % in relation to the solids content of the composition.
    Type: Grant
    Filed: March 30, 2012
    Date of Patent: February 2, 2016
    Assignee: Sachtleben Pigment GmbH
    Inventors: Ralf Becker, Gerhard Auer, Frank Hipler, Nicole Galbarczyk, Kai-Sven Lange, Horst Günnel, Uwe Dörschug
  • Patent number: 9211526
    Abstract: A composition includes titanium dioxide-containing digestion residue from titanium dioxide production, and at least one further component which is catalytically active. Dimensionally stable, catalytically active solids which are obtained from this composition can be used as catalyst, for example for minimizing nitrogen oxides.
    Type: Grant
    Filed: August 26, 2011
    Date of Patent: December 15, 2015
    Assignee: SACHTLEBEN PIGMENT GMBH
    Inventors: Gerhard Auer, Frank Hipler
  • Publication number: 20140155256
    Abstract: A composition that comprises a titanium compound, an iron compound, and a tungsten compound, wherein the titanium compound has a microcrystalline anatase structure and/or is obtained in the production of TiO2 according to the sulphate process, during hydrolysis of a solution which contains titanyl sulphate, and also in that the composition has a vanadium content, calculated as V, of less than 0.15 wt. % in relation to the solids content of the composition.
    Type: Application
    Filed: March 30, 2012
    Publication date: June 5, 2014
    Applicant: SACHTLEBEN PIGMENT GMBH
    Inventors: Ralf Becker, Gerhard Auer, Frank Hipler, Nicole Galbarczyk, Kai-Sven Lange, Horst Günnel, Uwe Dörschug
  • Publication number: 20130244869
    Abstract: A composition includes titanium dioxide-containing digestion residue from titanium dioxide production, and at least one further component which is catalytically active. Dimensionally stable, catalytically active solids which are obtained from this composition can be used as catalyst, for example for minimizing nitrogen oxides.
    Type: Application
    Filed: August 26, 2011
    Publication date: September 19, 2013
    Applicant: SACHTLEBEN PIGMENT GMBH
    Inventors: Gerhard Auer, Frank Hipler
  • Patent number: 8080230
    Abstract: The invention relates to fine-particulate zirconium titanates or lead zirconium titanates and a method for production thereof by reaction of titanium dioxide particles with a zirconium compound or a lead and zirconium compound. The titanium dioxide particles have a BET surface of more than 50 m2/g. The lead zirconium titanates can be used for the production of microelectronic components.
    Type: Grant
    Filed: December 13, 2005
    Date of Patent: December 20, 2011
    Assignee: Tronox Pigments GmbH
    Inventors: Gerhard Auer, Horst Günnel, Frank Hipler, Michael J. Hoffman, Susanne Wagner, Hans Kungl
  • Publication number: 20090060831
    Abstract: The invention relates to fine-particulate zirconium titanates or lead zirconium titanates and a method for production thereof by reaction of titanium dioxide particles with a zirconium compound or a lead and zirconium compound. The titanium dioxide particles have a BET surface of more than 50 m2/g. The lead zirconium titanates can be used for the production of microelectronic components.
    Type: Application
    Filed: December 13, 2005
    Publication date: March 5, 2009
    Applicant: Tronox Pigments GmbH
    Inventors: Gerhard Auer, Horst Gunnel, Frank Hipler, Michael J. Hoffman, Susanne Wagner, Hans Kungl
  • Publication number: 20080020578
    Abstract: A material which has a high removal rate with a simultaneously gentle polishing behavior is to be made available with a composition in the form of a dispersion or a slurry for the chemical-mechanical polishing (CMP) in the production of electronic or microelectronic components, in particular, semiconductor elements, and/or a mechanical component, in particular, a microelectromechanical component or semiconductor element (MEMS). This is attained in that the composition contains titanium oxide hydrate particles with the approximation formula TiO2*xH2O*yH2SO4, wherein the H2O content of the titanium oxide hydrate particles is 4-25 wt %, preferably 2-10 wt %, and the H2SO4 content is 0-15 wt %, preferably 0.1-10 wt %.
    Type: Application
    Filed: April 12, 2005
    Publication date: January 24, 2008
    Inventors: Gerhard Auer, Frank Hipler, Gerfried Zwicker