Patents by Inventor Frank Johannes
Frank Johannes has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20170307986Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.Type: ApplicationFiled: July 13, 2017Publication date: October 26, 2017Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Earl William EBERT, Johannes ONVLEE, Samir A. NAYFEH, Mark Josef SCHUSTER, Peter A. DELMASTRO, Christopher Charles WARD, Frank Johannes Jacobus VAN BOXTEL, Abdullah ALIKHAN, Daniel Nathan BURBANK, Daniel Nicholas GALBURT, Justin Matthew VERDIRAME
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Patent number: 9766557Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.Type: GrantFiled: February 21, 2017Date of Patent: September 19, 2017Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Earl William Ebert, Johannes Onvlee, Samir A. Nayfeh, Mark Josef Schuster, Peter A. Delmastro, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Abdullah Alikhan, Daniel Nathan Burbank, Daniel Nicholas Galburt, Justin Matthew Verdirame
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Publication number: 20170261864Abstract: A lithographic apparatus including: a projection system to project radiation onto a substrate supported on a substrate stage, during an exposure phase; a sensing system to sense a property of the substrate on the stage during a sensing phase; and a positioning system to determine a position of the stage relative to a reference system via a radiation path between the stage and the reference system, wherein the apparatus is configured to control stage movement relative to the reference system in the sensing phase and to control other movement relative to the reference system during the exposure phase; the stage or reference system having an outlet to provide a gas curtain to reduce ingress of ambient gas into the path; and the apparatus is operative such that a characteristic of the gas curtain is different in at least part of the sensing phase compared to in the exposure phase.Type: ApplicationFiled: October 13, 2015Publication date: September 14, 2017Applicant: ASML Netherlands B.V.Inventors: Gunes NAKIBOGLU, Jan Steven Christiaan WESTERLAKEN, Frank Johannes Jacobus VAN BOXTEL, Maria del Carmen MERCADO CARMONA, Thibault Simon Mathieu LAURENT
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Publication number: 20170219930Abstract: A lithographic apparatus includes an optical sensor, a movable body, a support, a deflector system, a first drive system and a second drive system. The movable body is moveable relative to the sensor. The support is for holding the sensor. The first drive system is arranged to move the movable body relative to the sensor. The second drive system is arranged to move the first drive system relative to the sensor. The second drive system is arranged to move the deflector system relative to the sensor. A disturbance is induced by a movement of the movable body. The deflector system is arranged to create a deflecting area for reflecting the disturbance away from the support.Type: ApplicationFiled: June 25, 2015Publication date: August 3, 2017Applicant: ASML Netherlands B.V.Inventors: Günes NAKIBOGLU, Suzanne Johanna Antonetta Geertruda GOSIJNS, Anne Willemijn Bertine QUIST, Lukasz SOSNIAK, Frank Johannes Jacobus VAN BOXTEL, Engelbertus Antonius Fransiscu VAN DER PASCH
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Publication number: 20170160653Abstract: A lithographic apparatus including: a projection system with an optical axis; an enclosure with an ambient gas; and a physical component accommodated in the enclosure, wherein: the lithographic apparatus is configured to cause the physical component to undergo movement relative to the enclosure, in a predetermined direction and in a plane perpendicular to the optical axis; the lithographic apparatus is configured to let the physical component maintain a predetermined orientation with respect to the enclosure during the movement; the movement induces a flow of the ambient gas relative to the component; the physical component has a surface oriented perpendicularly to the optical axis; the component includes a flow direction system configured to direct the flow of ambient gas away from the surface.Type: ApplicationFiled: June 8, 2015Publication date: June 8, 2017Applicant: ASML Netherlands B.V.Inventors: Günes NAKIBOGLU, Frank Johannes Jacobus VAN BOXTEL, Thomas Petrus Hendricus WARMERDAM, Jan Steven Christiaan WESTERLAKEN, Johannes Pieter KROES
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Publication number: 20170160652Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.Type: ApplicationFiled: February 21, 2017Publication date: June 8, 2017Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Earl William EBERT, Johannes ONVLEE, Samir A. NAYFEH, Mark Josef SCHUSTER, Peter A. DELMASTRO, Christopher Charles WARD, Frank Johannes Jacobus VAN BOXTEL, Abdullah ALIKHAN, Daniel Nathan BURBANK, Daniel Nicholas GALBURT, Justin Matthew VERDIRAME
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Patent number: 9632434Abstract: A system for controlling temperature of a patterning device in a lithographic apparatus is discussed. The system includes a patterning device support configured to support a patterning device and a reticle cooling system configured to provide substantially uniform temperature distribution across the patterning device. The reticle cooling system includes a first and second array of gas inlets configured to provide a first and second gas flow along a first and second direction across a surface of the patterning device, respectively, where first and second directions are opposite to each other. The reticle cooling system further includes a switching control system configured to control operation of the first and second arrays of gas inlets.Type: GrantFiled: April 29, 2015Date of Patent: April 25, 2017Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Earl William Ebert, Jr., Johannes Onvlee, Samir A. Nayfeh, Mark Josef Schuster, Peter A. Delmastro, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Abdullah Alikhan, Daniel Nathan Burbank, Daniel Nicholas Galburt, Justin Matthew Verdirame, Thomas Venturino
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Patent number: 9632433Abstract: A patterning device support (1100) for controlling a temperature of a patterning device (1102) can include a movable component (1104). The movable component can include a gas inlet (1108) for supplying a gas flow across a surface of the patterning device and a gas outlet (1110) for extracting the gas flow. The patterning device support can also include a gas flow generator (1118) coupled to a duct (1114, 1116) for recirculating the gas flow from the gas outlet to the gas inlet.Type: GrantFiled: October 21, 2013Date of Patent: April 25, 2017Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Earl William Ebert, Jr., Johannes Onvlee, Samir A. Nayfeh, Mark Josef Schuster, Peter A. Delmastro, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Abdullah Alikhan, Daniel Nathan Burbank, Daniel Nicholas Galburt, Justin Matthew Verdirame
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Publication number: 20170090296Abstract: A lithographic apparatus has a compartment which accommodates a movable object. Movements of the movable object cause acoustic disturbances in the compartment. An acoustic damper is arranged to damp the acoustic disturbances in the compartment and comprises a chamber (100) in communication with the compartment and a perforated plate (101), having a plurality of Cthrough-holes (102), between the chamber and the compartment.Type: ApplicationFiled: May 7, 2015Publication date: March 30, 2017Applicant: ASML Netherlands B.V.Inventors: Günes NAKIBOGLU, Mark Constant Johannes BAGGEN, Gerard Johannes BOOGAARD, Nicolaas Rudolf KEMPER, Sander KERSSEMAKERS, Robertus Mathijs Gerardus RIJS, Frank Johannes Jacobus VAN BOXTEL, Erwin Antonius Henricus Franciscus VAN DEN BOOGAERT, Marc Wilhelmus Maria VAN DER WIJST, Martinus VAN DUIJNHOVEN, Jessica Henrica Anna VERDONSCHOT, Hendrikus Herman Marie COX
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Publication number: 20170071220Abstract: The invention relates to a method of extruding sleeves extruded of collagen for encasing sausages, wherein a collagen fluid is fed to an extrusion head; the collagen fluid is guided through the extrusion head; and the collagen fluid is discharged from the extrusion head. The invention also relates to an extrusion head for performing such a process as well as a co-extrusion sausage line. Finally also the sleeve extruded with this method or devices is part of the invention.Type: ApplicationFiled: September 4, 2014Publication date: March 16, 2017Inventors: Albertus DUNNEWIND, Patricia Rosa Maria HOEKSTRA-SUURS, Wilhelmus Johannes Everardus Maria VAN DEN DUNGEN, Johannes Martinus MEULENDIJKS, Frank Johannes Antonius VAN DEN HEUIJ, Henk Robert HOOGENKAMP
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Publication number: 20170068175Abstract: A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.Type: ApplicationFiled: November 17, 2016Publication date: March 9, 2017Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Jan Steven Christiaan WESTERLAKEN, Ruud Hendrikus Martinus Johannes BLOKS, Peter A. DELMASTRO, Thibault Simon Mathieu LAURENT, Martinus Hendrikus Antonius LEENDERS, Mark Josef SCHUSTER, Christopher Charles WARD, Frank Johannes Jacobus VAN BOXTEL, Justin Matthew VERDIRAME, Samir A. NAYFEH
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Patent number: 9575406Abstract: An extraction system, including a pump to pump gas along a conduit to a check valve configured to open at an upstream pressure over a certain magnitude, a pressure sensor to generate a signal indicative of a pressure of gas between the pump and the check valve, and a controller configured to generate a stop signal if a signal from the pressure sensor indicates that the pressure of gas between the pump and the check valve is below a certain magnitude.Type: GrantFiled: December 13, 2012Date of Patent: February 21, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Marc Léon Van Der Gaag, Leonarda Hendrika Van Den Heuvel, Arjan Hubrecht Josef Anna Martens, Frank Johannes Jacobus Van Boxtel
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Publication number: 20170027607Abstract: An assembly includes at least one steerable invasive instrument and an access device for introducing the instrument into an object via an access port of the object. The steerable instrument includes an elongated tubular body having a proximal end part including at least one flexible zone, a distal end part including at least one flexible zone, and a rigid intermediate part. The instrument further includes a steering arrangement for translating a deflection of at least a part of the proximal end part relative to the rigid intermediate part into a related deflection of at least a part of the distal end part. The access device includes a deflection setting arrangement for setting at least one angle between at least a part of the proximal end part and the rigid intermediate part of the instrument.Type: ApplicationFiled: December 4, 2014Publication date: February 2, 2017Inventors: Maurice Theodoor Ivonne VERBEEK, Marcel Antonius Elisabeth VERBEEK, Simon Jozef Arnold PLEIJERS, Frank Johannes Hendrikus NIJSTEN, Mattheus Hendrik Louis THISSEN
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Patent number: 9513568Abstract: A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.Type: GrantFiled: June 5, 2013Date of Patent: December 6, 2016Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Jan Steven Christiaan Westerlaken, Ruud Hendrikus Martinus Johannes Bloks, Peter A. Delmastro, Thibault Simon Mathieu Laurent, Martinus Hendrikus Antonius Leenders, Mark Josef Schuster, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Justin Matthew Verdirame, Samir A. Nayfeh
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Publication number: 20160349631Abstract: A lithographic apparatus including a barrier system and a device manufacturing method using such a lithographic apparatus. The barrier system is used to maintain a protected volume of gas within a barrier. The protected volume may be maintained when different components of the lithographic apparatus move relative to each other. The barrier system may be used in different locations within the lithographic apparatus. The geometry of the barrier affects how efficiently the protected volume is maintained, especially at high speeds. The geometry reduces the amount of ambient gas entering the protected volume from outside the barrier.Type: ApplicationFiled: January 20, 2015Publication date: December 1, 2016Applicant: ASML Netherlands B.V.Inventors: Günes NAKIBOGLU, Martijn VAN BAREN, Frank Johannes Jacobs VAN BOXTEL, Koen CUYPERS, Jeroen Gerard GOSEN, Laurentius Johannes Adrianus VAN BOKHOVEN
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Patent number: 9504263Abstract: The invention relates to a device (2) for transferring longitudinally supplied elongate food products (4), such as for instance sausages. The sausages are placed here in a recess (10) of a rotatable holder body (9) and subsequently set down in lateral direction. The invention further relates to an assembly (1) of such a transfer device and a feed conveyor (3) for sausages connecting to the transfer device. The invention moreover relates to a method for transferring elongate food products such as sausages.Type: GrantFiled: March 27, 2012Date of Patent: November 29, 2016Assignee: MAREL TOWNSEND FURTHER PROCESSING B.V.Inventors: Sigebertus Johannes Jacobus Jozef Meggelaars, Marcus Bernhard Hubert Bontjer, Mathias Marcellus Kuijpers, Frank Johannes Antonius Van Den Heuij
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Publication number: 20160227793Abstract: The invention relates to a method of extruding sleeves extruded of collagen for encasing sausages, wherein a collagen fluid is fed to an extrusion head; the collagen fluid is guided through the extrusion head; and the collagen fluid is discharged from the extrusion head. The invention also relates to an extrusion head for performing such a process as well as a co-extrusion sausage line. Finally also the sleeve extruded with this method or devices is part of the invention.Type: ApplicationFiled: September 4, 2014Publication date: August 11, 2016Inventors: Albertus DUNNEWIND, Patricia Rosa Maria HOEKSTRA-SUURS, Wilhelmus Johannes Everardus Maria VAN DEN DUNGEN, Johannes Martinus MEULENDIJKS, Frank Johannes Antonius VAN DEN HEUIJ, Henk Robert HOOGENKAMP
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Publication number: 20160179015Abstract: A lithographic apparatus having: a substrate table constructed to hold a substrate; a projection system configured to project a patterned radiation beam onto a target portion of the substrate; a substrate surface actuator including a fluid opening for fluid flow therethrough from/onto a facing surface facing the substrate surface actuator to generate a force between the substrate surface actuator and the facing surface, the facing surface being a top surface of the substrate or a surface substantially co-planar with the substrate; and a position controller to control the position and/or orientation of a part of the facing surface by varying fluid flow through the fluid opening to displace the part of the facing surface relative to the projection system.Type: ApplicationFiled: February 25, 2016Publication date: June 23, 2016Applicant: ASML NETHERLANDS B.V.Inventors: Theodorus Wilhelmus POLET, Henrikus Herman Marie COX, Ronald VAN DER HAM, Wilhelmus Franciscus Johannes SIMONS, Jimmy Matheus Wilhelmus VAN DE WINKEL, Gregory Martin Mason CORCORAN, Frank Johannes Jacobus VAN BOXTEL
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Patent number: 9280063Abstract: A substrate table assembly, an immersion lithographic apparatus and a device manufacturing method are disclosed. The substrate table assembly includes a substrate table to support a substrate; and a gas handling system to provide a gas to a region between the substrate table and a substrate mounted on the substrate table, wherein the gas provided by the gas handling system has a thermal conductivity greater than or equal to 100 mW/(m·K) at 298 K.Type: GrantFiled: August 8, 2012Date of Patent: March 8, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Johan Gertrudis Cornelis Kunnen, Sjoerd Nicolaas Lambertus Donders, Johannes Henricus Wilhelmus Jacobs, Martijn Houben, Thibault Simon Mathieu Laurent, Frank Johannes Jacobus Van Boxtel, Sander Catharina Reinier Derks
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Patent number: D796672Type: GrantFiled: October 13, 2015Date of Patent: September 5, 2017Assignee: FORTIMEDIX SURGICAL B.V.Inventor: Frank Johannes Hendrikus Nijsten