Abstract: The invention relates to a plasma activated fluid processing system, comprising: an alternating current, AC, source (10), one reaction chamber (14), wherein the one reaction chamber comprises a plurality of reaction electrodes (11) and a corresponding ground electrode (12), each reaction electrode and corresponding ground electrode separated by a gap; or a plurality of reaction chambers (14), wherein each reaction chamber comprises at least one reaction electrode (11) and a corresponding ground electrode, the reaction electrode and corresponding ground electrode separated by a gap; wherein the AC source is electrically connected on one side to each ground electrode in parallel and on another side to each reaction electrode in parallel, wherein each reaction electrode is connected to ground (13) via a capacitor (21), and wherein an inductor (20) is provided between each reaction electrode and the AC source.