Patents by Inventor Frank Ludwig HOLSTEYNS

Frank Ludwig HOLSTEYNS has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Ultrasonic cleaning method and apparatus
    Patent number: 9662686
    Abstract: A device and method for treating the surface of a semiconductor wafer provides a treatment fluid in the form of a dispersion of gas bubbles in a treatment liquid generated at acoustic pressures less than those required to induce cavitation in the treatment liquid. A resonator supplies ultrasonic or megasonic energy to the treatment fluid and is configured to create an interference pattern in the treatment fluid comprising regions of pressure amplitude minima and maxima at an interface of the treatment fluid and the semiconductor wafer.
    Type: Grant
    Filed: September 24, 2010
    Date of Patent: May 30, 2017
    Assignee: LAM RESEARCH AG
    Inventors: Frank Ludwig Holsteyns, Alexander Lippert
  • Ultrasonic cleaning fluid, method and apparatus
    Patent number: 9044794
    Abstract: A cleaning fluid including dispersed gas avoids using ultrasonic energy to induce cavitation by subjecting a liquid containing dissolved gas to a pressure reduction in a bubble machine, to generate a gas/liquid dispersion. The cleaning fluid can be used to clean articles such as semiconductor wafers using a device that includes a holder and a vibrator for supplying ultrasonic or megasonic energy to the article.
    Type: Grant
    Filed: December 31, 2009
    Date of Patent: June 2, 2015
    Assignee: LAM Research AG
    Inventors: Frank Ludwig Holsteyns, Alexander Lippert, Thomas Wirnsberger
  • ULTRASONIC CLEANING METHOD AND APPARATUS
    Publication number: 20120073596
    Abstract: A device and method for treating the surface of a semiconductor wafer provides a treatment fluid in the form of a dispersion of gas bubbles in a treatment liquid generated at acoustic pressures less than those required to induce cavitation in the treatment liquid. A resonator supplies ultrasonic or megasonic energy to the treatment fluid and is configured to create an interference pattern in the treatment fluid comprising regions of pressure amplitude minima and maxima at an interface of the treatment fluid and the semiconductor wafer.
    Type: Application
    Filed: September 24, 2010
    Publication date: March 29, 2012
    Applicant: LAM RESEARCH AG
    Inventors: Frank Ludwig HOLSTEYNS, Alexander LIPPERT
  • ULTRASONIC CLEANING FLUID, METHOD AND APPARATUS
    Publication number: 20110155169
    Abstract: A cleaning fluid including dispersed gas avoids using ultrasonic energy to induce cavitation by subjecting a liquid containing dissolved gas to a pressure reduction in a bubble machine, to generate a gas/liquid dispersion. The cleaning fluid can be used to clean articles such as semiconductor wafers using a device that includes a holder and a vibrator for supplying ultrasonic or megasonic energy to the article.
    Type: Application
    Filed: December 31, 2009
    Publication date: June 30, 2011
    Applicant: LAM RESEARCH AG
    Inventors: Frank Ludwig HOLSTEYNS, Alexander LIPPERT, Thomas WIRNSBERGER