Patents by Inventor Frank Mak

Frank Mak has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and system for eliminating post etch residues
    Patent number: 6647995
    Abstract: A method and system for eliminating post etch residues is disclosed. In one method embodiment, the present invention recites disposing a surface, having post etch residues adhered thereto, proximate to an electron beam source which generates electrons. The present method embodiment then recites bombarding the post etch residues with the electrons such that the post etch residues are removed from the surface to which the post etch residues were adhered.
    Type: Grant
    Filed: June 27, 2001
    Date of Patent: November 18, 2003
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Jiahua Huang, Yue-Song He, Frank Mak