Abstract: In spacious areas or building complexes, it is customary to use monitoring systems that comprise monitoring cameras and other monitoring sensors that record monitoring data and forward said monitoring data to a monitoring control centre or the like for the purpose of evaluation. Depending on the size of the monitored area, the complexity of the monitoring system can increase to a great extent. Upwards of a certain size of monitoring area, it is necessary for several monitoring persons also to be employed in parallel in order to inspect the monitoring data.

Abstract: A monitoring system for monitoring a monitoring area, having an input interface for accepting monitoring images of the monitoring area, having a localization module for locating at least one moving monitoring object in the monitoring area, wherein the localization module is designed to locate a position of the monitoring object, having a definition module for defining a position-dependent protected area in the monitoring area, and having a monitoring module for monitoring the protected area, wherein the definition module is designed to define the position-dependent protected area on the basis of the position of the moving monitoring object.

Abstract: In spacious areas or building complexes, it is customary to use monitoring systems that comprise monitoring cameras and other monitoring sensors that record monitoring data and forward said monitoring data to a monitoring control centre or the like for the purpose of evaluation. Depending on the size of the monitored area, the complexity of the monitoring system can increase to a great extent. Upwards of a certain size of monitoring area, it is necessary for several monitoring persons also to be employed in parallel in order to inspect the monitoring data.

Abstract: The practice of monitoring public places, buildings, production halls etc. using monitoring cameras is frequently used nowadays. The invention proposes a monitoring system (1) for monitoring a monitoring area (2), having an input interface (5) for accepting monitoring images of the monitoring area (2), having a localization module (9) for locating at least one moving monitoring object (7) in the monitoring area (2), wherein the localization module (9) is designed to locate a position of the monitoring object (7), having a definition module (10) for defining a position-dependent protected area (6a, b, c) in the monitoring area (2), and having a monitoring module (13) for monitoring the protected area (2), wherein the definition module (10) is designed to define the position-dependent protected area (6a, b, c) on the basis of the position of the moving monitoring object (7).

Abstract: A deposition rate monitor device for monitoring the deposition rate of a vapor on a substrate is provided, including: a piezoelectric crystal monitor device including a piezoelectric crystal monitor provided in a housing, wherein the housing includes a vapor inlet aperture, and at least one elongated shielding device having a first end and a second end, the first end encompassing the vapor inlet aperture.

Abstract: The invention refers to an evaporation source for depositing of thin layers on substrates, the evaporation source comprising a vapor distribution system having an evaporation pipe made of inorganic non metallic material, with the evaporation pipe having at least one nozzle, wherein the nozzle is disposed in a nozzle element which is made as a separate component being arranged in a nozzle element opening of the evaporation pipe.