Patents by Inventor Frank Scheide

Frank Scheide has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Nickel-based alloy with silicon, aluminum, and chromium
    Patent number: 9932656
    Abstract: A nickel-based alloy, consisting of (in mass %) 1.5-3.0% Si, 1.5-3.0% Al, and >0.1-3.0% Cr, where Al+Si+Cr is ?4.0 and ?8.0 for the contents of Si, Al, and Cr in %; 0.005-0.20% Fe, 0.01-0.20% Y, and <0.001-0.20% of one or more the elements Hf, Zr, La, Ce, Ti, where Y+0.5*Hf+Zr+1.8*Ti+0.6*(La+Ce) is ?0.02 and ?0.30 for the contents of Y, Hf, Zr, La, Ce, and Ti in %; 0.001-0.10% C; 0.0005-0.10% N; 0.001-0.20% Mn; 0.0001-0.08% Mg; 0.0001-0.010% O; max. 0.015% S; max. 0.80% Cu; Ni remainder; and the usual production-related impurities.
    Type: Grant
    Filed: January 28, 2014
    Date of Patent: April 3, 2018
    Assignee: VDM Metals International GmbH
    Inventors: Heike Hattendorf, Frank Scheide, Larry Paul
  • NICKEL-BASED ALLOY WITH SILICON, ALUMINUM, AND CHROMIUM
    Publication number: 20160032425
    Abstract: A nickel-based alloy, consisting of (in mass %) 1.5-3.0% Si, 1.5-3.0% Al, and >0.1-3.0% Cr, where Al+Si+Cr is ?4.0 and ?8.0 for the contents of Si, Al, and Cr in %; 0.005-0.20% Fe, 0.01-0.20% Y, and <0.001-0.20% of one or more the elements Hf, Zr, La, Ce, Ti, where Y+0.5*Hf+Zr+1.8*Ti 0.6*(La+Ce) is ?0.02 and ?0.30 for the contents of Y, Hf, Zr, La, Ce, and Ti in %; 0.001-0.10% C; 0.0005-0.10% N; 0.001-0.20% Mn; 0.0001-0.08% Mg; 0.0001-0.010% O; max. 0.015% S; max. 0.80% Cu; Ni remainder; and the usual production-related impurities.
    Type: Application
    Filed: January 28, 2014
    Publication date: February 4, 2016
    Applicant: VDM Metals GmbH
    Inventors: Heike HATTENDORF, Frank SCHEIDE, Larry PAUL
  • Nickel-Based Alloy
    Publication number: 20100003163
    Abstract: Nickel-based alloy, consisting of (in % by mass) Al 1.2-<2.0% Si 1.2-<1.8% C 0.001-0.1% S 0.001-0.1% Cr 0.03-0.1% Mn 0.03-0.1% Cu max. 0.1% Fe 0.02-0.2% Mg 0.005-0.06% Pb max. 0.005% Y 0.05-0.15% and Hf 0.05-0.10% or Y 0.05-0.15% and La 0.05-0.10% or Y 0.05-0.15% and Hf 0.05-0.10% and La 0.05-0.10% Ni remainder together with manufacturing-related impurities.
    Type: Application
    Filed: July 6, 2007
    Publication date: January 7, 2010
    Inventors: Jutta Kloewer, Frank Scheide