Patents by Inventor Frank Schillke
Frank Schillke has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20190271532Abstract: Method for measuring a spherical-astigmatic optical surface (40), includes: a) generating a spherical-astigmatic wavefront as a test wavefront with a wavefront generating apparatus (10); b) interferometrically measuring wavefront aberrations between the wavefront generating apparatus and the surface which is adjusted to the wavefront generating apparatus such that the test wavefront impinges each point on the surface substantially perpendicularly, plural measurements being taken in which the surface is measured at a number of positions, spherized about the two centers of the radii of the astigmatism and/or rotated by 180° about a surface normal to the surface, such that corresponding interferogram phases are determined; and c) determining the wavefront of the wavefront generation device and a shape of the surface using a mathematical reconstruction method.Type: ApplicationFiled: May 17, 2019Publication date: September 5, 2019Inventors: Stefan SCHULTE, Frank SCHILLKE
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Publication number: 20160298951Abstract: Method for measuring a spherical-astigmatic optical surface (40), includes: a) generating a spherical-astigmatic wavefront as a test wavefront with a wavefront generating apparatus (10); b) interferometrically measuring wavefront aberrations between the wavefront generating apparatus and the surface which is adjusted to the wavefront generating apparatus such that the test wavefront impinges each point on the surface substantially perpendicularly, plural measurements being taken in which the surface is measured at a number of positions, spherized about the two centers of the radii of the astigmatism and/or rotated by 180° about a surface normal to the surface, such that corresponding interferogram phases are determined; and c) determining the wavefront of the wavefront generation device and a shape of the surface using a mathematical reconstruction method.Type: ApplicationFiled: June 20, 2016Publication date: October 13, 2016Inventors: Stefan SCHULTE, Frank SCHILLKE
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Patent number: 8345262Abstract: An optical element having an optical surface (12; 103), which optical surface has an actual shape, the actual shape deviating from a desired shape by maximum 0.2 nm, wherein the desired shape is either: a free-form surface having a deviation from its best-fitting sphere of at least 5 ?m or a substantially rotationally symmetrical surface having a deviation from its best-fitting sphere of at least 0.5 mm.Type: GrantFiled: January 30, 2012Date of Patent: January 1, 2013Assignee: Carl Zeiss SMT GmbHInventors: Frank Schillke, Rolf Freimann, Matthias Dreher
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Publication number: 20120127481Abstract: An optical element having an optical surface (12; 103), which optical surface has an actual shape, the actual shape deviating from a desired shape by maximum 0.2 nm, wherein the desired shape is either: a free-form surface having a deviation from its best-fitting sphere of at least 5 ?m or a substantially rotationally symmetrical surface having a deviation from its best-fitting sphere of at least 0.5 mm.Type: ApplicationFiled: January 30, 2012Publication date: May 24, 2012Applicant: CARL ZEISS SMT GMBHInventors: Frank SCHILLKE, Rolf FREIMANN, Matthias DREHER
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Patent number: 8104905Abstract: An optical element having an optical surface (12; 103), which optical surface has an actual shape, the actual shape deviating from a desired shape by maximum 0.2 nm, wherein the desired shape is either: a free-form surface having a deviation from its best-fitting sphere of at least 5 ?m or a substantially rotationally symmetrical surface having a deviation from its best-fitting sphere of at least 0.5 mm.Type: GrantFiled: November 3, 2008Date of Patent: January 31, 2012Assignee: Carl Zeiss SMT GmbHInventors: Frank Schillke, Rolf Freimann, Matthias Dreher
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Patent number: 8089634Abstract: Optical element having an optical surface, which optical surface is adapted to a non-spherical target shape, such that a long wave variation of the actual shape of the optical surface with respect to the target shape is limited to a maximum value of 0.2 nm, wherein the long wave variation includes only oscillations having a spatial wavelength equal to or larger than a minimum spatial wavelength of 10 mm.Type: GrantFiled: January 8, 2010Date of Patent: January 3, 2012Assignee: Carl Zeiss SMT GmbHInventors: Jochen Hetzler, Frank Schillke, Stefan Schulte, Rolf Freimann, Bernd Doerband
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Publication number: 20100177321Abstract: Optical element having an optical surface, which optical surface is adapted to a non-spherical target shape, such that a long wave variation of the actual shape of the optical surface with respect to the target shape is limited to a maximum value of 0.2 nm, wherein the long wave variation includes only oscillations having a spatial wavelength equal to or larger than a minimum spatial wavelength of 10 mm.Type: ApplicationFiled: January 8, 2010Publication date: July 15, 2010Inventors: Jochen HETZLER, Frank Schillke, Stefan Schulte, Rolf Freimann, Bernd Doerband
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Patent number: 7728987Abstract: A method of manufacturing an optical element includes testing the optical element by using an interferometer optics generating a beam of measuring light illuminating only a sub-aperture of the tested optical element. The interferometer optics comprises a hologram. Results of the sub-aperture measurement are stitched together to obtain a measuring result with respect to the full surface of the optical element. Further, a method of calibrating the interferometer optics includes performing an interferometric measurement using a calibrating optics having a hologram covering only a sub-aperture of the full cross section of the beam of measuring light generated by the interferometer optics and stitching together the sub-aperture measurements to obtain a result indicative for the full cross section of the interferometer optics.Type: GrantFiled: May 14, 2004Date of Patent: June 1, 2010Assignee: Carl Zeiss SMT AGInventors: Ralf Arnold, Bernd Dörband, Frank Schillke, Susanne Beder
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Patent number: 7605926Abstract: A method of positioning optical elements relative to each other uses an interferometer apparatus comprising a plurality of holograms generating beams of adjustment measuring light which are incident on optical surfaces of the optical elements. Interference patterns generated by superimposing adjustment measuring light of the beams reflected from the surfaces are indicative of positioning errors of the optical elements. The beams of adjustment measuring light may comprise focused beams forming a point focus on the optical surface and beams of light which is orthogonally incident on extended portions on the optical surface.Type: GrantFiled: August 22, 2008Date of Patent: October 20, 2009Assignee: Carl Zeiss SMT AGInventors: Jochen Hetzler, Ralf Arnold, Frank Schillke, Bernd Doerband
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Publication number: 20090128829Abstract: A method of determining a deviation of an actual shape from a desired shape of an optical surface (12; 103) includes: providing an incoming electromagnetic measuring wave (20; 113), providing two diffractive structures (47, 49; 145, 146, 141, 143) which are respectively designed to reshape the wavefront of an arriving wave, calibrating one of the two diffractive structures (47, 49; 145, 146, 141, 143) by radiating the incoming measuring wave (20; 113) onto the at least one diffractive structure to be calibrated (47, 49; 145, 146, 141, 143) and determining a calibration deviation of the actual wavefront from a desired wavefront of the measuring wave (20; 113) after interaction of the latter with the at least one diffractive structure to be calibrated (47, 49; 145, 146, 141, 143), positioning the two diffractive structures (47; 49; 145, 146, 141, 143) in the optical path of the incoming measuring wave (20; 113) such that individual rays of the measuring wave radiate through both diffractive structures (47; 49;Type: ApplicationFiled: November 3, 2008Publication date: May 21, 2009Applicant: Carl Zeiss SMT AGInventors: Frank Schillke, Rolf Freimann, Matthias Dreher
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Publication number: 20080043247Abstract: A method of manufacturing an optical element includes testing the optical element by using an interferometer optics generating a beam of measuring light illuminating only a sub-aperture of the tested optical element. The interferometer optics comprises a hologram. Results of the sub-aperture measurement are stitched together to obtain a measuring result with respect to the full surface of the optical element. Further, a method of calibrating the interferometer optics includes performing an interferometric measurement using a calibrating optics having a hologram covering only a sub-aperture of the full cross section of the beam of measuring light generated by the interferometer optics and stitching together the sub-aperture measurements to obtain a result indicative for the full cross section of the interferometer optics.Type: ApplicationFiled: May 14, 2004Publication date: February 21, 2008Applicant: Carl Zeiss SMT AGInventors: Ralf Arnold, Bernd Dorband, Frank Schillke, Susanne Beder
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Patent number: 7133225Abstract: A method of manufacturing an optical system comprises assembling an optical element on a mounting frame thereof. The mounting frame is disposed on a rotary table having an axis of rotation, and the mounting frame is adjusted such that a predefined axis of symmetry thereof is parallel to the axis of rotation. The optical element is placed on the mounting frame, and an interferometric measurement of a surface of the optical element is performed. The interferometric measurement is analyzed to arrange the optical element relative to the mounting frame such that a predefined axis of the optical element is parallel to the axis of rotation.Type: GrantFiled: October 18, 2004Date of Patent: November 7, 2006Assignee: Carl Zeiss SMT AGInventors: Rolf Freimann, Bernhard Fellner, Hans-Guenther Sachs, Hartmut Brandenburg, Bernd Doerband, Frank Schillke
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Patent number: 7061626Abstract: A method of manufacturing an optical element having an optical surface of a target shape includes performing an interferometric test using an interferometer optics, wherein the interferometer optics includes a hologram that deflects a beam of measuring light by a substantial angle or that displaces an axis of symmetry of measuring light emerging from the hologram with respect to an axis of symmetry of measuring light incident on the hologram.Type: GrantFiled: May 14, 2004Date of Patent: June 13, 2006Assignee: Carl Zeiss SMT AGInventors: Frank Schillke, Susanne Beder, Jochen Hetzler
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Publication number: 20050275849Abstract: A method of calibrating an interferometer for determining an optical property of the interferometer uses a calibrating optical arrangement. The calibrating optical arrangement comprises at least one diffractive pattern and a mirror having a reflecting surface. The diffractive pattern and the reflecting surface are disposed at a distance from each other in a beam path of measuring light emitted from an interferometer optics of the interferometer system to be calibrated.Type: ApplicationFiled: May 20, 2005Publication date: December 15, 2005Applicant: Carl Zeiss SMT AGInventors: Rolf Freimann, Bernd Doerband, Frank Schillke, Susanne Beder, Stefan Schulte
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Publication number: 20050225774Abstract: A method of processing an optical element comprises testing the optical surface of the optical element using an interferometer optics for generating a beam of measuring light; wherein the interferometer optics has a plurality of optical elements which are configured and arranged such that the measuring light is substantially orthogonally incident on a reflecting surface, at each location thereof; and wherein the method further comprises: measuring at least one property of the interferometer optics, disposing the optical surface of the optical element at a measuring position relative to the interferometer optics within the beam of measuring light, and performing at least one interferometric measurement; determining deviations of the optical surface of the first optical element from a target shape thereof, based on the interferometric measurement and the at least one measured property of the interferometer optics.Type: ApplicationFiled: April 5, 2005Publication date: October 13, 2005Applicant: Carl Zeiss SMT AGInventors: Rolf Freimann, Susanne Beder, Guenther Seitz, Frank Schillke, Bernd Doerband, Heinz Martin, Franz Krug
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Patent number: 6831794Abstract: A lens has at least one aspheric lens surface, an objective with at least one aspheric lens surface, and a projection exposure device for microlithography and a method for the production of microstructured components with an objective having at least one aspheric lens surface. The object of the invention is to provide a method by which new designs with aspheric lens surfaces can be generated without consultation with manufacturing, with this object attained by the measure of describing the aspheric lens surfaces by Zernike polynomials, which makes it is possible to undertake a classification of aspheric lens surfaces such that the respective aspheric lens surface can be polished and tested at a justifiable cost when at least two of three, or all three, of certain conditions are present.Type: GrantFiled: June 21, 2003Date of Patent: December 14, 2004Assignee: Carl Zeiss SMT AGInventors: Karl-Heinz Schuster, Frank Schillke, Franz-Josef Stickel, Alexander Epple
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Publication number: 20040212899Abstract: A lens has at least one aspheric lens surface, an objective with at least one aspheric lens surface, and a projection exposure device for microlithography and a method for the production of microstructured components with an objective having at least one aspheric lens surface. The object of the invention is to provide a method by which new designs with aspheric lens surfaces can be generated without consultation with manufacturing, with this object attained by the measure of describing the aspheric lens surfaces by Zernike polynomials, which makes it is possible to undertake a classification of aspheric lens surfaces such that the respective aspheric lens surface can be polished and tested at a justifiable cost when at least two of three, or all three, of certain conditions are present.Type: ApplicationFiled: June 21, 2003Publication date: October 28, 2004Inventors: Karl-Heinz Schuster, Frank Schillke, Franz-Josef Stickel, Alexander Epple