Patents by Inventor Frank Sinclair

Frank Sinclair has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11482397
    Abstract: An ion source is provided. The ion source may include an ion source chamber, and a cathode disposed in the ion source chamber and configured to emit electrons to generate a plasma within the ion source chamber, the cathode comprising a refractory metal, wherein the refractory metal comprises a macrocrystalline structure.
    Type: Grant
    Filed: June 3, 2021
    Date of Patent: October 25, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Craig Richard Chaney, Frank Sinclair, Daniel R. Tieger
  • Patent number: 11476087
    Abstract: An ion implantation system, including an ion source and extraction system, arranged to generate an ion beam at a first energy, and a linear accelerator, disposed downstream of the ion source, the linear accelerator arranged to receive the ion beam as a bunched ion beam accelerate the ion beam to a second energy, greater than the first energy. The linear accelerator may include a plurality of acceleration stages, wherein a given acceleration stage of the plurality of acceleration stages comprises: a drift tube assembly, arranged to conduct the ion beam; a resonator, electrically coupled to the drift tube assembly; and an RF power assembly, coupled to the resonator, and arranged to output an RF signal to the resonator. As such, the given acceleration stage does not include a quadrupole element.
    Type: Grant
    Filed: August 3, 2020
    Date of Patent: October 18, 2022
    Assignee: Applied Materials, Inc.
    Inventor: Frank Sinclair
  • Publication number: 20220319806
    Abstract: An ion implanter may include an ion source, arranged to generate a continuous ion beam, a DC acceleration system, to accelerate the continuous ion beam, as well as an AC linear accelerator to receive the continuous ion beam and to output a bunched ion beam. The ion implanter may also include an energy spreading electrode assembly, to receive the bunched ion beam and to apply an RF voltage between a plurality of electrodes of the energy spreading electrode assembly, along a local direction of propagation of the bunched ion beam.
    Type: Application
    Filed: April 2, 2021
    Publication date: October 6, 2022
    Applicant: Applied Materials, Inc.
    Inventors: Paul J. Murphy, Frank Sinclair, Jun Lu, Daniel Tieger, Anthony Renau
  • Patent number: 11437215
    Abstract: Provided herein are approaches for decreasing particle generation in an electrostatic lens. In some embodiments, an ion implantation system may include an electrostatic lens including an entrance for receiving an ion beam and an exit for delivering the ion beam towards a target, the electrostatic lens including a first terminal electrode, a first suppression electrode, and a first ground electrode disposed along a first side of an ion beamline, wherein the first ground electrode is grounded and positioned adjacent the exit. The electrostatic lens may further include a second terminal electrode, a second suppression electrode, and a second ground electrode disposed along a second side of the ion beamline, wherein the second ground electrode is grounded and positioned adjacent the exit. The implantation system may further include a power supply operable to supply a voltage and a current to the electrostatic lens for controlling the ion beam.
    Type: Grant
    Filed: December 13, 2019
    Date of Patent: September 6, 2022
    Assignee: APPLIED Materials, Inc.
    Inventors: Alexandre Likhanskii, Antonella Cucchetti, Eric D. Hermanson, Frank Sinclair, Jay T. Scheuer, Robert C. Lindberg
  • Publication number: 20220267318
    Abstract: The invention relates to substituted tetrahydro-pyrido-pyrimidine derivatives of the formula (I), wherein Y, R1, R2 and m are as defined in the description. Such compounds are suitable for the treatment of a disorder or disease which is mediated by the activity of the PI3K enzymes.
    Type: Application
    Filed: August 11, 2021
    Publication date: August 25, 2022
    Applicant: Novartis AG
    Inventors: Nigel Graham Cooke, Paulo Fernandes Gomes Dos Santos, Nadege Graveleau, Christina Hebach, Klemens Hoegenauer, Gregory John Hollingworth, Alexander Baxter Smith, Nicolas Soldermann, Frank Stowasser, Ross Sinclair Strang, Nicola Tufilli, Anette von Matt, Romain Wolf, Frederic Zecri
  • Patent number: 11424097
    Abstract: Provided herein are approaches for increasing efficiency of ion sources. In some embodiments, an apparatus, such as an ion source, may include a chamber housing having a first end wall and a second end wall, and an extraction plate coupled to at least one of the first end wall and the second end wall. The extraction plate may include an extraction aperture. The apparatus may further include a tubular cathode extending between the first end wall and the second end wall.
    Type: Grant
    Filed: July 8, 2020
    Date of Patent: August 23, 2022
    Assignee: APPLIED Materials, Inc.
    Inventors: Bon-Woong Koo, Svetlana Radovanov, Frank Sinclair, You Chia Li, Peter Ewing, Ajdin Sarajlic, Christopher A. Rowland, Nunzio Carbone
  • Publication number: 20220248523
    Abstract: An apparatus may include a drift tube assembly, the drift tube assembly defining a triple gap configuration, and arranged to accelerate and transmit an ion beam along abeam path. The apparatus may include a resonator, to output an RF signal to the drift tube assembly, and an RF quadrupole triplet, connected to the drift tube assembly, and arranged circumferentially around the beam path.
    Type: Application
    Filed: January 29, 2021
    Publication date: August 4, 2022
    Applicant: Applied Materials, Inc.
    Inventors: Frank Sinclair, Wai-Ming Tam, Costel Biloiu, William Davis Lee
  • Patent number: 11387073
    Abstract: A system and method that is capable of measuring the incident angle of an ion beam, especially an ion beam comprising heavier ions, is disclosed. In one embodiment, X-rays, rather than ions, are used to determine the channeling direction. In another embodiment, the workpiece is constructed, at least in part, of a material having a high molecular weight such that heaver ion beams can be measured. Further, in another embodiment, the parameters of the ion beam are measured across an entirety of the beam, allowing components of the ion implantation system to be further tuned to create a more uniform beam.
    Type: Grant
    Filed: March 24, 2020
    Date of Patent: July 12, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Frank Sinclair, Jonathan Gerald England, Joseph C. Olson
  • Patent number: 11388810
    Abstract: An apparatus, system and method. An apparatus may include an RF power assembly, arranged to output an RF signal; a resonator, coupled to receive the RF signal, the resonator comprising a first output end and a second output end, and a drift tube assembly, configured to transmit an ion beam, and coupled to the resonator. As such, the drift tube assembly may include a first AC drift tube electrode, coupled to the first output end, and a second AC drift tube electrode, coupled to the second output end and separated from the first AC drift tube by a first gap. The RF power assembly may be switchable to switch output from a first Eigenmode frequency to a second Eigenmode frequency.
    Type: Grant
    Filed: September 17, 2020
    Date of Patent: July 12, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Peter F. Kurunczi, David T. Blahnik, Frank Sinclair
  • Patent number: 11361935
    Abstract: An extraction plate for an ion beam system. The extraction plate may include an insulator body that includes a peripheral portion, to connect to a first side of a plasma chamber, and further includes a central portion, defining a concave shape. As such, an extraction aperture may be arranged along a first surface of the central portion, where the first surface is oriented at a high angle with respect to the first side. The extraction plate may further include a patterned electrode, comprising a first portion and a second portion, affixed to an outer side of the insulator body, facing away from the plasma chamber, wherein the first portion is separated from the second portion by an insulating gap.
    Type: Grant
    Filed: November 7, 2020
    Date of Patent: June 14, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Costel Biloiu, Jay R. Wallace, Kevin M. Daniels, Frank Sinclair, Christopher Campbell
  • Publication number: 20220183137
    Abstract: Embodiments herein are directed to a linear accelerator assembly for an ion implanter. In some embodiments, the linear accelerator assembly may include a central support within a chamber, and a plurality of modules coupled to the central support, at least one module of the plurality of modules including an electrode having an aperture for receiving and delivering an ion beam along a beamline axis.
    Type: Application
    Filed: December 4, 2020
    Publication date: June 9, 2022
    Applicant: Applied Materials, Inc.
    Inventors: Frank Sinclair, Paul J. Murphy, Michael Honan, Charles T. Carlson
  • Publication number: 20220174810
    Abstract: An apparatus may include a drift tube assembly, arranged to transmit an ion beam. The drift tube assembly may include a first ground electrode; an RF drift tube assembly, disposed downstream of the first ground electrode; and a second ground electrode, disposed downstream of the RF drift tube assembly. The RF drift tube assembly may define a triple gap configuration. The apparatus may include a resonator, where the resonator comprises a toroidal coil, having a first end, connected to a first RF drift tube of the RF drift tube assembly, and a second end, connected to a second RF drift tube of the RF drift tube assembly.
    Type: Application
    Filed: December 1, 2020
    Publication date: June 2, 2022
    Applicant: Applied Materials, Inc.
    Inventors: Costel Biloiu, Charles T. Carlson, Frank Sinclair, Paul J. Murphy, David T. Blahnik
  • Publication number: 20220148843
    Abstract: An extraction plate for an ion beam system. The extraction plate may include an insulator body that includes a peripheral portion, to connect to a first side of a plasma chamber, and further includes a central portion, defining a concave shape. As such, an extraction aperture may be arranged along a first surface of the central portion, where the first surface is oriented at a high angle with respect to the first side. The extraction plate may further include a patterned electrode, comprising a first portion and a second portion, affixed to an outer side of the insulator body, facing away from the plasma chamber, wherein the first portion is separated from the second portion by an insulating gap.
    Type: Application
    Filed: November 7, 2020
    Publication date: May 12, 2022
    Applicant: Applied Materials, Inc.
    Inventors: Costel Biloiu, Jay R. Wallace, Kevin M. Daniels, Frank Sinclair, Christopher Campbell
  • Publication number: 20220139691
    Abstract: Provided herein are approaches for performing electrodynamic mass analysis with a radio frequency (RF) biased ion source to reduce ion beam energy spread. In some embodiments, a system may include an ion source including a power supply, the ion source operable to generate a plasma within a chamber housing, and an extraction power assembly including a first power supply and a second power supply electrically coupled with the chamber housing of the ion source, wherein the first power supply and the second power supply are operable to bias the chamber housing of the ion source with a time modulated voltage to extract an ion beam from the ion source. The system may further include an electrodynamic mass analysis (EDMA) assembly operable to receive the ion beam and perform mass analysis on the ion beam.
    Type: Application
    Filed: November 3, 2020
    Publication date: May 5, 2022
    Applicant: Applied Materials, Inc.
    Inventors: Alexandre Likhanskii, Joseph C. Olson, Frank Sinclair, Peter F. Kurunczi
  • Patent number: 11295931
    Abstract: An ion implantation system, including an ion source, and a buncher to receive a continuous ion beam from the ion source, and output a bunched ion beam. The buncher may include a drift tube assembly, having an alternating sequence of grounded drift tubes and AC drift tubes. The drift tube assembly may include a first grounded drift tube, arranged to accept a continuous ion beam, at least two AC drift tubes downstream to the first grounded drift tube, a second grounded drift tube, downstream to the at least two AC drift tubes. The ion implantation system may include an AC voltage assembly, coupled to the at least two AC drift tubes, and comprising at least two AC voltage sources, separately coupled to the at least two AC drift tubes. The ion implantation system may include a linear accelerator, comprising a plurality of acceleration stages, disposed downstream of the buncher.
    Type: Grant
    Filed: July 14, 2020
    Date of Patent: April 5, 2022
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventor: Frank Sinclair
  • Publication number: 20220087004
    Abstract: An apparatus, system and method. An apparatus may include an RF power assembly, arranged to output an RF signal; a resonator, coupled to receive the RF signal, the resonator comprising a first output end and a second output end, and a drift tube assembly, configured to transmit an ion beam, and coupled to the resonator. As such, the drift tube assembly may include a first AC drift tube electrode, coupled to the first output end, and a second AC drift tube electrode, coupled to the second output end and separated from the first AC drift tube by a first gap. The RF power assembly may be switchable to switch output from a first Eigenmode frequency to a second Eigenmode frequency.
    Type: Application
    Filed: September 17, 2020
    Publication date: March 17, 2022
    Applicant: Applied Materials, Inc.
    Inventors: Peter F. Kurunczi, David T. Blahnik, Frank Sinclair
  • Publication number: 20220037116
    Abstract: An ion implantation system, including an ion source and extraction system, arranged to generate an ion beam at a first energy, and a linear accelerator, disposed downstream of the ion source, the linear accelerator arranged to receive the ion beam as a bunched ion beam accelerate the ion beam to a second energy, greater than the first energy. The linear accelerator may include a plurality of acceleration stages, wherein a given acceleration stage of the plurality of acceleration stages comprises: a drift tube assembly, arranged to conduct the ion beam; a resonator, electrically coupled to the drift tube assembly; and an RF power assembly, coupled to the resonator, and arranged to output an RF signal to the resonator. As such, the given acceleration stage does not include a quadrupole element.
    Type: Application
    Filed: August 3, 2020
    Publication date: February 3, 2022
    Applicant: Applied Materials, Inc.
    Inventor: Frank Sinclair
  • Patent number: 11232925
    Abstract: An IHC ion source that employs a negatively biased cathode and one or more side electrodes is disclosed. The one or more side electrodes are left electrically unconnected in certain embodiments and are grounded in other embodiments. The floating side electrodes may be beneficial in the formation of certain species. In certain embodiments, a relay is used to allow the side electrodes to be easily switched between these two modes. By changing the configuration of the side electrodes, beam current can be optimized for different species. For example, certain species, such as arsenic, may be optimized when the side electrodes are at the same voltage as the chamber. Other species, such as boron, may be optimized when the side electrodes are left floating relative to the chamber. In certain embodiments, a controller is in communication with the relay so as to control which mode is used, based on the desired feed gas.
    Type: Grant
    Filed: January 6, 2020
    Date of Patent: January 25, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Shengwu Chang, Frank Sinclair, Michael St. Peter
  • Publication number: 20210391155
    Abstract: A processing system may include a plasma chamber operable to generate a plasma, and an extraction assembly, arranged along a side of the plasma chamber. The extraction assembly may include an extraction plate including an extraction aperture, the extraction plate having a non-planar shape, and generating an extracted ion beam at a high angle of incidence with respect to a perpendicular to a plane of a substrate, when the plane of the substrate is arranged parallel to the side of the plasma chamber.
    Type: Application
    Filed: January 27, 2021
    Publication date: December 16, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Christopher Campbell, Costel Biloiu, Peter F. Kurunczi, Jay R. Wallace, Kevin M. Daniels, Kevin T. Ryan, Minab B. Teferi, Frank Sinclair, Joseph C. Olson
  • Patent number: D956005
    Type: Grant
    Filed: September 19, 2019
    Date of Patent: June 28, 2022
    Assignee: APPLIED Materials, Inc.
    Inventors: Robert C. Lindberg, Alexandre Likhanskii, Wayne LeBlanc, Frank Sinclair, Svetlana Radovanov