Patents by Inventor Frank Staals

Frank Staals has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10802408
    Abstract: A method for improving the yield of a lithographic process, the method including: determining a parameter fingerprint of a performance parameter across a substrate, the parameter fingerprint including information relating to uncertainty in the performance parameter; determining a process window fingerprint of the performance parameter across the substrate, the process window being associated with an allowable range of the performance parameter; and determining a probability metric associated with the probability of the performance parameter being outside an allowable range. Optionally a correction to the lithographic process is determined based on the probability metric.
    Type: Grant
    Filed: October 16, 2017
    Date of Patent: October 13, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Everhardus Cornelis Mos, Jochem Sebastiaan Wildenberg, Erik Johannes Maria Wallerbos, Maurits Van Der Schaar, Frank Staals, Franciscus Hendricus Arnoldus Elich
  • Publication number: 20200264522
    Abstract: Disclosed is a method of measuring focus performance of a lithographic apparatus, and corresponding patterning device and lithographic apparatus. The method comprises using the lithographic apparatus to print one or more first printed structures and second printed structures. The first printed structures are printed by illumination having a first non-telecentricity and the second printed structures being printed by illumination having a second non-telecentricity, different to said first non-telecentricity. A focus dependent parameter related to a focus-dependent positional shift between the first printed structures and the second printed structures on said substrate is measured and a measurement of focus performance based at least in part on the focus dependent parameter is derived therefrom.
    Type: Application
    Filed: August 3, 2018
    Publication date: August 20, 2020
    Applicant: ASML Netherlands B.V.
    Inventors: Laurentius Cornelius DE WINTER, Roland Pieter STOLK, Frank STAALS, Anton Bernhard VAN OOSTEN, Paul Christiaan HINNEN, Marinus JOCHEMSEN, Thomas THEEUWES, Eelco VAN SETTEN
  • Publication number: 20200249576
    Abstract: A method includes obtaining, for each particular feature of a plurality of features of a device pattern of a substrate being created using a patterning process, a modelled or simulated relation of a parameter of the patterning process between a measurement target for the substrate and the particular feature; and based on the relation and measured values of the parameter from the metrology target, generating a distribution of the parameter across at least part of the substrate for each of the features, the distribution for use in design, control or modification of the patterning process.
    Type: Application
    Filed: July 11, 2018
    Publication date: August 6, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Patrick WARNAAR, Patricius Aloysius Jacobus TINNEMANS, Grzegorz GRZELA, Everhardus Cornelis MOS, Wim Tjibbo TEL, Marinus JOCHEMSEN, Bart Peter Bert SEGERS, Frank STAALS
  • Patent number: 10725372
    Abstract: A method includes determining topographic information of a substrate for use in a lithographic imaging system, determining or estimating, based on the topographic information, imaging error information for a plurality of points in an image field of the lithographic imaging system, adapting a design for a patterning device based on the imaging error information. In an embodiment, a plurality of locations for metrology targets is optimized based on imaging error information for a plurality of points in an image field of a lithographic imaging system, wherein the optimizing involves minimizing a cost function that describes the imaging error information. In an embodiment, locations are weighted based on differences in imaging requirements across the image field.
    Type: Grant
    Filed: January 20, 2016
    Date of Patent: July 28, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Wim Tjibbo Tel, Marinus Jochemsen, Frank Staals, Christopher Prentice, Laurent Michel Marcel Depre, Johannes Marcus Maria Beltman, Roy Werkman, Jochem Sebastiaan Wildenberg, Everhardus Cornelis Mos
  • Publication number: 20200233310
    Abstract: A lithographic process is one that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. During the lithographic process, the focus needs to be controlled. There is disclosed a method for determining a fingerprint of a performance parameter associated with a substrate, such as a focus value to be used during the lithographic process. A reference fingerprint of the performance parameter is determined for a reference substrate. A reference substrate parameter of the reference substrate is determined. A substrate parameter for a substrate, such as a substrate with product structures, is determined. Subsequently, the fingerprint of the performance parameter is determined based on the reference fingerprint, reference substrate parameter and the substrate parameter. The fingerprint may then be used to control the lithographic process.
    Type: Application
    Filed: April 2, 2020
    Publication date: July 23, 2020
    Applicant: ASML NATHERLANDS B. V.
    Inventors: Léon Maria Albertus VAN DER LOGT, Bart Peter Bert SEGERS, Simon Hendrik Celine VAN GORP, Carlos Cornelis Maria LUIJTEN, Frank STAALS
  • Patent number: 10691030
    Abstract: A focus metrology target includes one or more periodic arrays of features. A measurement of focus performance of a lithographic apparatus is based at least in part on diffraction signals obtained from the focus metrology target. Each periodic array of features includes a repeating arrangement of first zones interleaved with second zones, a feature density being different in the first zones and the second zones. Each first zone includes a repeating arrangement of first features. A minimum dimension of each first feature is close to but not less than a resolution limit of the printing by the lithographic apparatus, so as to comply with a design rule in a given a process environment. A region of high feature density may further include a repeating arrangement of larger features.
    Type: Grant
    Filed: November 16, 2018
    Date of Patent: June 23, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Frank Staals, Eric Jos Anton Brouwer, Carlo Cornelius Maria Luijten, Jean-Pierre Agnes Henricus Marie Vaessen
  • Publication number: 20200159130
    Abstract: Disclosed is a method of measuring focus performance of a lithographic apparatus. The method comprises using the lithographic apparatus to print at least one focus metrology pattern on a substrate, the printed focus metrology pattern comprising at least a first periodic array of features, and using inspection radiation to measure asymmetry between opposite portions of a diffraction spectrum for the first periodic array in the printed focus metrology pattern. A measurement of focus performance is derived based at least in part on the asymmetry measured. The first periodic array comprises a repeating arrangement of a space region having no features and a pattern region having at least one first feature comprising sub-features projecting from a main body and at least one second feature; and wherein the first feature and second feature are in sufficient proximity to be effectively detected as a single feature during measurement. A patterning device comprising said first periodic array is also disclosed.
    Type: Application
    Filed: November 19, 2019
    Publication date: May 21, 2020
    Applicant: ASML Netherlands B.V.
    Inventor: Frank STAALS
  • Patent number: 10649342
    Abstract: A lithographic process is one that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. During the lithographic process, the focus should be controlled. There is disclosed a method for determining a fingerprint of a performance parameter associated with a substrate, such as a focus value to be used during the lithographic process. A reference fingerprint of the performance parameter is determined for a reference substrate. A reference substrate parameter of the reference substrate is determined. A substrate parameter for a substrate, such as a substrate with product structures, is determined. Subsequently, the fingerprint of the performance parameter is determined based on the reference fingerprint, the reference substrate parameter and the substrate parameter. The fingerprint may then be used to control the lithographic process.
    Type: Grant
    Filed: June 22, 2017
    Date of Patent: May 12, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Léon Maria Albertus Van Der Logt, Bart Peter Bert Segers, Simon Hendrik Celine Van Gorp, Carlo Cornelis Maria Luijten, Frank Staals
  • Publication number: 20200142324
    Abstract: Focus metrology patterns and methods are disclosed which do not rely on sub-resolution features. Focus can be measured by measuring asymmetry of the printed pattern (T), or complementary pairs of printed patterns (TN/TM). Asymmetry can be measured by scatterometry. Patterns may be printed using EUV radiation or DUV radiation. A first type of focus metrology pattern comprises first features (422) interleaved with second features (424) A minimum dimension (w1) of each first feature is close to a printing resolution. A maximum dimension (w2) of each second feature in the direction of periodicity is at least twice the minimum dimension of the first features. Each first feature is positioned between two adjacent second features such that a spacing (w1?) and its nearest second feature is between one half and twice the minimum dimension of the first features. A second type of focus metrology pattern comprises features (1122, 1124) arranged in pairs.
    Type: Application
    Filed: May 28, 2018
    Publication date: May 7, 2020
    Applicant: ASML Netherlands B.V.
    Inventors: Frank STAALS, Anton Bernhard VAN OOSTEN, Yasri YUDHISTIRA, Carlo Cornelis Maria LUIJTEN, Bert VERSTRAETEN, Jan-Willem GEMMINK
  • Publication number: 20200124968
    Abstract: A method involving determining a contribution that one or more process apparatuses make to a characteristic of a substrate after the substrate has been processed according to a patterning process by the one or more process apparatuses by removing from values of the characteristic of the substrate a contribution of a lithography apparatus to the characteristic and a contribution of one or more pre-lithography process apparatuses to the characteristic.
    Type: Application
    Filed: December 20, 2019
    Publication date: April 23, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Wim Tjibbo TEL, Mark John Maslow, Frank Staals, Paul Christiaan Hinnen
  • Patent number: 10571806
    Abstract: A method involving determining a contribution that one or more process apparatuses make to a characteristic of a substrate after the substrate has been processed according to a patterning process by the one or more process apparatuses by removing from values of the characteristic of the substrate a contribution of a lithography apparatus to the characteristic and a contribution of one or more pre-lithography process apparatuses to the characteristic.
    Type: Grant
    Filed: August 3, 2017
    Date of Patent: February 25, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Wim Tjibbo Tel, Mark John Maslow, Frank Staals, Paul Christiaan Hinnen
  • Patent number: 10571812
    Abstract: Focus performance of a lithographic apparatus is measured using pairs of targets that have been exposed (1110) with an aberration setting (e.g. astigmatism) that induces a relative best focus offset between them. A calibration curve (904) is obtained in advance by exposing similar targets on FEM wafers (1174, 1172). In a set-up phase, calibration curves are obtained using multiple aberration settings, and an anchor point (910) is recorded, where all the calibration curves intersect. When a new calibration curve is measured (1192), the anchor point is used to produce an adjusted updated calibration curve (1004?) to cancel focus drift and optionally to measure drift of astigmatism. Another aspect of the disclosure (FIGS. 13-15) uses two aberration settings (+AST, ?AST) in each measurement, reducing sensitivity to astigmatism drift. Another aspect (FIGS. 16-17) uses pairs of targets printed with relative focus offsets, by double exposure in one resist layer.
    Type: Grant
    Filed: July 26, 2018
    Date of Patent: February 25, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Fahong Li, Miguel Garcia Granda, Carlo Cornelis Maria Luijten, Bart Peter Bert Segers, Cornelis Andreas Franciscus Johannes Van Der Poel, Frank Staals, Anton Bernhard Van Oosten, Mohamed Ridane
  • Publication number: 20200026182
    Abstract: Disclosed is a method of determining a characteristic of interest, in particular focus, relating to a structure on a substrate formed by a lithographic process, and an associated patterning device and lithographic system. The method comprises forming a modified substrate feature on the substrate using a corresponding modified reticle feature on a patterning device, the modified substrate feature being formed for a primary function other than metrology, more specifically for providing a support for a vertically integrated structure. The modified reticle feature is such that said modified substrate feature is formed with a geometry dependent on the characteristic of interest during formation. The modified substrate feature can be measured to determine said characteristic of interest.
    Type: Application
    Filed: June 28, 2019
    Publication date: January 23, 2020
    Applicant: ASML Netherlands B.V.
    Inventors: Miguel GARCIA GRANDA, Steven Erik STEEN, Eric Jos Anton BROUWER, Bart Peter Bert SEGERS, Pierre-Yves Jerome Yvan GUITTET, Frank STAALS, Paulus Jacobus Maria VAN ADRICHEM
  • Publication number: 20200004164
    Abstract: A method for monitoring a lithographic process, and associated lithographic apparatus. The method includes obtaining height variation data relating to a substrate supported by a substrate support and fitting a regression through the height variation data, the regression approximating the shape of the substrate; residual data between the height variation data and the regression is determined; and variation of the residual data is monitored over time. The residual data may be deconvolved based on known features of the substrate support.
    Type: Application
    Filed: January 3, 2018
    Publication date: January 2, 2020
    Applicant: ASML Netherlands B.V.
    Inventors: Emil Peter SCHMITT-WEAVER, Kaustuve BHATTACHARYYA, Wim Tjibbo TEL, Frank STAALS, Leon Martin LEVASIER
  • Publication number: 20190377264
    Abstract: A method including obtaining a measurement result from a target on a substrate, by using a substrate measurement recipe; determining, by a hardware computer system, a parameter from the measurement result, wherein the parameter characterizes dependence of the measurement result on an optical path length of the target for incident radiation used in the substrate measurement recipe and the determining the parameter includes determining dependence of the measurement result on a relative change of wavelength of the incident radiation; and if the parameter is not within a specified range, adjusting the substrate measurement recipe.
    Type: Application
    Filed: August 23, 2019
    Publication date: December 12, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Miguel GARCIA GRANDA, Christian Marinus LEEWIS, Frank STAALS
  • Publication number: 20190378012
    Abstract: Disclosed is a method of determining a characteristic of interest relating to a structure on a substrate formed by a lithographic process, the method comprising: obtaining an input image of the structure; and using a trained neural network to determine the characteristic of interest from said input image. Also disclosed is a reticle comprising a target forming feature comprising more than two sub-features each having different sensitivities to a characteristic of interest when imaged onto a substrate to form a corresponding target structure on said substrate. Related methods and apparatuses are also described.
    Type: Application
    Filed: May 29, 2019
    Publication date: December 12, 2019
    Applicant: ASML Netherlands B.V.
    Inventors: Lorenzo Tripodi, Patrick Warnaar, Grzegorz Grzela, Mohammadreza Hajiahmadi, Farzad Farhadzadeh, Patricius Aloysius Jacobus Tinnemans, Scott Anderson Middlebrooks, Adrianus Cornelis Matheus Koopman, Frank Staals, Brennan Peterson, Anton Bernhard Van Oosten
  • Publication number: 20190324371
    Abstract: A lithographic process is one that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. During the lithographic process, the focus should be controlled. There is disclosed a method for determining a fingerprint of a performance parameter associated with a substrate, such as a focus value to be used during the lithographic process. A reference fingerprint of the performance parameter is determined for a reference substrate. A reference substrate parameter of the reference substrate is determined. A substrate parameter for a substrate, such as a substrate with product structures, is determined. Subsequently, the fingerprint of the performance parameter is determined based on the reference fingerprint, the reference substrate parameter and the substrate parameter. The fingerprint may then be used to control the lithographic process.
    Type: Application
    Filed: June 22, 2017
    Publication date: October 24, 2019
    Inventors: Léon Maria Albertus VAN DER LOGT, Bart Peter Bert SEGERS, Simon Hendrik Celine VAN GORP, Carlo Cornelis Maria LUIJTEN, Frank STAALS
  • Publication number: 20190317412
    Abstract: A method for improving the yield of a lithographic process, the method including: determining a parameter fingerprint of a performance parameter across a substrate, the parameter fingerprint including information relating to uncertainty in the performance parameter; determining a process window fingerprint of the performance parameter across the substrate, the process window being associated with an allowable range of the performance parameter; and determining a probability metric associated with the probability of the performance parameter being outside an allowable range. Optionally a correction to the lithographic process is determined based on the probability metric.
    Type: Application
    Filed: October 16, 2017
    Publication date: October 17, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Everhardus Cornelis MOS, Jochem Sebastiaan WILDENBERG, Erik Johannes Maria WALLERBOS, Maurits VAN DER SCHAAR, Frank STAALS, Franciscus Hendricus Arnoldus ELICH
  • Publication number: 20190271919
    Abstract: A method, system and program for determining a fingerprint of a parameter. The method includes determining a contribution from a device out of a plurality of devices to a fingerprint of a parameter. The method including: obtaining parameter data and usage data, wherein the parameter data is based on measurements for multiple substrates having been processed by the plurality of devices, and the usage data indicates which of the devices out of the plurality of the devices were used in the processing of each substrate; and determining the contribution using the usage data and parameter data.
    Type: Application
    Filed: May 23, 2018
    Publication date: September 5, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Davit HARUTYUNYAN, Fei JIA, Frank STAALS, Fuming WANG, Hugo Thomas LOOIJESTIJN, Cornelis Johannes RIJNIERSE, Maxim PISARENCO, Roy WERKMAN, Thomas THEEUWES, Tom VAN HEMERT, Vahid BASTANI, Jochem Sebastian WILDENBERG, Everhardus Cornelis MOS, Erik Johannes Maria WALLERBOS
  • Patent number: 10394132
    Abstract: A method including obtaining a measurement result from a target on a substrate, by using a substrate measurement recipe; determining, by a hardware computer system, a parameter from the measurement result, wherein the parameter characterizes dependence of the measurement result on an optical path length of the target for incident radiation used in the substrate measurement recipe and the determining the parameter includes determining dependence of the measurement result on a relative change of wavelength of the incident radiation; and if the parameter is not within a specified range, adjusting the substrate measurement recipe.
    Type: Grant
    Filed: April 24, 2017
    Date of Patent: August 27, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Miguel Garcia Granda, Christian Marinus Leewis, Frank Staals