Patents by Inventor Frank SUPPLIETH

Frank SUPPLIETH has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Use of wafer brightness to monitor laser anneal process and laser anneal tool
    Patent number: 10916446
    Abstract: A method is provided for monitoring the laser annealing of a semiconductor wafer. After annealing, images of many regions of the wafer are captured. The surface brightness of these regions is measured by computer, and statistics of these surface brightness measurements are determined, such as their mean and their standard deviation. Using a correlation between the surface brightnesses and the electrical resistance of the annealed wafer, the surface brightness statistics can be used to determine whether the annealing process resulted in a wafer that meets end user specifications. The surface brightness statistics can also be used to monitor the annealing tool, both during manufacturing and periodically or following maintenance.
    Type: Grant
    Filed: March 18, 2019
    Date of Patent: February 9, 2021
    Assignee: X-FAB TEXAS, INC.
    Inventor: Frank Supplieth
  • USE OF WAFER BRIGHTNESS TO MONITOR LASER ANNEAL PROCESS AND LASER ANNEAL TOOL
    Publication number: 20190287814
    Abstract: A method is provided for monitoring the laser annealing of a semiconductor wafer. After annealing, images of many regions of the wafer are captured. The surface brightness of these regions is measured by computer, and statistics of these surface brightness measurements are determined, such as their mean and their standard deviation. Using a correlation between the surface brightnesses and the electrical resistance of the annealed wafer, the surface brightness statistics can be used to determine whether the annealing process resulted in a wafer that meets end user specifications. The surface brightness statistics can also be used to monitor the annealing tool, both during manufacturing and periodically or following maintenance.
    Type: Application
    Filed: March 18, 2019
    Publication date: September 19, 2019
    Inventor: Frank SUPPLIETH