Patents by Inventor Frank Tran

Frank Tran has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11950799
    Abstract: Embodiments herein relate to systems and methods for intravascular lesion disruption. In an embodiment, a catheter system for imparting pressure to induce fractures upon a vascular lesion within or adjacent a blood vessel wall is included. The system includes a catheter configured to advance to a vascular lesion, the catheter including an elongate shaft that defines at least a first orifice for fluid flow; a balloon, coupled to the elongate shaft, that surrounds the first orifice where the balloon can expand from a collapsed configuration suitable for advancing the catheter through a patient's vasculature to a first expanded configuration suitable for anchoring the catheter in position relative to a treatment site; and a propulsion system configured to propel a fluid from the first orifice toward the balloon wall to create an inertial impulse in a vessel wall to transfer momentum to the vascular lesion. Other embodiments are also included herein.
    Type: Grant
    Filed: June 23, 2022
    Date of Patent: April 9, 2024
    Assignee: Boston Scientific Scimed, Inc.
    Inventors: Daniel Frank Massimini, Roger W. McGowan, Christopher Smuk, Binh C. Tran
  • Patent number: 9938436
    Abstract: The present disclosure relates to UV resistant multi-component structural adhesive systems that are substantially free of aromatic epoxy resins, Also provided are methods of preparing the multi-component structural adhesive systems and methods of bonding substrates together with such adhesive systems.
    Type: Grant
    Filed: August 13, 2013
    Date of Patent: April 10, 2018
    Assignee: HUNTSMAN ADVANCED MATERIALS AMERICAS LLC
    Inventors: Frank Tran, Derek S. Kincaid, K. P. Subrahmanian, Surendar N. Kaul
  • Publication number: 20150232717
    Abstract: The present disclosure relates to UV resistant multi-component structural adhesive systems that are substantially free of aromatic epoxy resins, Also provided are methods of preparing the multi-component structural adhesive systems and methods of bonding substrates together with such adhesive systems.
    Type: Application
    Filed: August 13, 2013
    Publication date: August 20, 2015
    Inventors: Frank Tran, Derek S. Kincaid, K.P. Subrahmanian, Surendar N. Kaul
  • Patent number: 8227048
    Abstract: The present invention provides a clear, low viscosity photocurable composition including (i) a cationically curable compound (ii) an acrylate-containing compound (iii) a polyol-containing mixture (iv) a cationic photoinitiator and (v) a free radical photoinitiator. The photocurable composition can be cured using rapid prototyping techniques to form opaque-white three-dimensional articles having ABS-like properties.
    Type: Grant
    Filed: September 12, 2006
    Date of Patent: July 24, 2012
    Assignee: 3D Systems, Inc.
    Inventors: Richard N. Leyden, Laurence Messe, Frank Tran, David L. Johnson, John Wai Fong, Carole Chapelat, Ranjana C. Patel
  • Publication number: 20110293891
    Abstract: The present invention provides a clear, low viscosity photocurable composition including (i) a cationically curable compound (ii) an acrylate-containing compound (iii) a polyol-containing mixture (iv) a cationic photoinitiator and (v) a free radical photoinitiator. The photocurable composition can be cured using rapid prototyping techniques to form opaque-white three-dimensional articles having ABS-like properties.
    Type: Application
    Filed: September 12, 2006
    Publication date: December 1, 2011
    Applicant: Huntsman International LLC
    Inventors: Richard N. Leyden, Laurence Messe, Frank Tran, David L. Johnson, John Wal Fong, Carole Chapelat, Ranjana C. Patel
  • Patent number: 7820275
    Abstract: A photocurable composition comprising: (a) a cationically curable component preferably formed from one or more epoxy compound(s), (b) an acrylate component having no or a low amount of hydroxy groups preferably dipentaerythritol hexaacrylate, (c) a polyol component, preferably a polyether polyol, (d) a cationic photoinitiator; and (e) a free radical photoinitiator. The composition may produce when cured three-dimensional articles with high clarity and improved mechanical properties.
    Type: Grant
    Filed: November 4, 2004
    Date of Patent: October 26, 2010
    Assignee: Huntsman Advanced Materials Americas LLC
    Inventors: David L. Johnson, Frank Tran, John Wai Fong
  • Patent number: 7718111
    Abstract: A photocurable composition comprising cationically curable compound, an acrylate-containing compound; a hydroxyl-containing compound; a cationic photoinitiator; and a free radical photoinitiator; wherein said composition has less than 0.54 equivalents of cationically curable groups, less than 0.10 equivalents of acrylate groups and less than 0.10 equivalents of hydroxyl 0groups per 100 grams of said composition.
    Type: Grant
    Filed: April 11, 2007
    Date of Patent: May 18, 2010
    Assignee: Huntsman Advanced Materials Americas Inc.
    Inventors: David L. Johnson, Frank Tran, John Fong, Richard Leyden, Ranjana Patel
  • Publication number: 20080182078
    Abstract: A photocurable composition comprising: (a) a cationically curable component preferably formed from one or more epoxy compound(s), (b) an acrylate component having no or a low amount of hydroxy groups preferably dipentaerythritol hexaacrylate, (c) a polyol component, preferably a polyether polyol, (d) a cationic photoinitiator; and (e) a free radical photoinitiator. The composition may produce when cured three-dimensional articles with high clarity and improved mechanical properties.
    Type: Application
    Filed: November 4, 2004
    Publication date: July 31, 2008
    Applicant: Huntsman Advanced Materials Americas Inc.
    Inventors: David L. Johnson, Frank Tran, John Wai Fong
  • Publication number: 20070256781
    Abstract: A photocurable composition comprising cationically curable compound, an acrylate-containing compound; a hydroxyl-containing compound; a cationic photoinitiator; and a free radical photoinitiator; wherein said composition has less than 0.54 equivalents of cationically curable groups, less than 0.10 equivalents of acrylate groups and less than 0.10 equivalents of hydroxyl 0 groups per 100 grams of said composition.
    Type: Application
    Filed: April 11, 2007
    Publication date: November 8, 2007
    Applicant: Huntsman Advanced Materials Americas Inc.
    Inventors: David Johnson, Frank Tran, John Fong, Richard Leyden, Ranjana Patel
  • Patent number: 7232850
    Abstract: A photocurable composition comprising cationically curable compound, an acrylate-containing compound; a hydroxyl-containing compound; a cationic photoinitiator; and a free radical photoinitiator; wherein said composition has less than 0.54 equivalents of cationically curable groups, less than 0.10 equivalents of acrylate groups and less than 0.10 equivalents of hydroxyl groups per 100 grams of said composition.
    Type: Grant
    Filed: October 3, 2003
    Date of Patent: June 19, 2007
    Assignee: Huntsman Advanced Materials Americas Inc.
    Inventors: David Johnson, Frank Tran, John Fong, Richard Leyden, Ranjana Patel
  • Publication number: 20050228064
    Abstract: The present invention relates to a liquid, radiation-curable composition containing a cationically activated component, a cationic photoinitiator or a mixture of cationic photoinitiators, at least an effective amount of a compound having at least one terminal and/or pendant unsaturated group and at least one hydroxyl group in its molecule. The composition is free of free radical initiator. The compositions described herein are particularly useful in stereolithography process systems for producing three-dimensional articles.
    Type: Application
    Filed: March 21, 2005
    Publication date: October 13, 2005
    Applicant: Huntsman Advanced Materials Americas Inc.
    Inventors: David Johnson, Richard Leyden, Ranjana Patel, Frank Tran
  • Publication number: 20050072519
    Abstract: A photocurable composition comprising cationically curable compound, an acrylate-containing compound; a hydroxyl-containing compound; a cationic photoinitiator; and a free radical photoinitiator; wherein said composition has less than 0.54 equivalents of cationically curable groups, less than 0.10 equivalents of acrylate groups and less than 0.10 equivalents of hydroxyl 0groups per 100 grams of said composition.
    Type: Application
    Filed: October 3, 2003
    Publication date: April 7, 2005
    Inventors: David Johnson, Frank Tran, John Fong, Richard Leyden, Ranjana Patel