Patents by Inventor Frank W. Harris

Frank W. Harris has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20160075826
    Abstract: In one or a plurality of embodiments, a process for manufacturing polyamide without using PrO (propylene oxide) in synthesis is provided. In one or a plurality of embodiments, provided is a process for manufacturing polyamide, including steps (a) to (c): (a) reacting diacid dichloride monomer with at least two kinds of diamine monomers in a solvent so as to generate polyamide; and (b) removing hydrochloric acid physically out of a reaction system, the hydrochloric acid being generated during the reaction in the step (a); or (c) adding a trapping reagent capable of trapping hydrochloric acid, at any time at least before the step (a), at the same time of starting the step (a), or during the step (a), wherein at least one of the diamine monomers is a diamine monomer containing a carboxyl group, and the trapping reagent does not include propylene oxide.
    Type: Application
    Filed: September 9, 2015
    Publication date: March 17, 2016
    Applicants: AKRON POLYMER SYSTEMS, INC., SUMITOMO BAKELITE COMPANY LIMITED
    Inventors: Limin SUN, Dong Zhang, Jiaokai Jing, Frank W. Harris, Jun Okada, Toshihiko Katayama, Hideo Umeda, Ritsuya Kawasaki
  • Publication number: 20160039974
    Abstract: In one or a plurality of embodiments, a process for manufacturing polyamide, with a reduced use of an amide-based solvent in synthesis, is provided. In one or a plurality of embodiments, provided is a process for manufacturing polyamide, including steps (1) to (3): (1) dissolving diamine in a non-amide-based organic solvent or a non-amide-based organic solvent containing 10 mass% or less of an amide-based organic solvent; (2) adding diacid dichloride to a solution obtained in the step (1) and reacting the diamine with the diacid dichloride so as to generate polyamide; and (3) adding a trapping reagent capable of trapping hydrochloric acid.
    Type: Application
    Filed: August 5, 2015
    Publication date: February 11, 2016
    Applicants: SUMITOMO BAKELITE COMPANY LIMITED, AKRON POLYMER SYSTEMS, INC.
    Inventors: Limin SUN, Dong ZHANG, Frank W. HARRIS, Jun OKADA, Toshihiko KATAYAMA, Hideo UMEDA, Ritsuya KAWASAKI
  • Patent number: 9255192
    Abstract: An optical compensation film composition is disclosed herein wherein the optical compensation film is stretched to yield a negative A-plate having a refractive index profile of nx<ny=nz. or a biaxial polymer film having a refractive index profile of nx<ny<nz, the film having been stretched from a film cast from a polymer solution comprising a solvent and a polymer having a moiety of wherein R1, R2, and R3 are each independently hydrogen atoms, alkyl groups, substituted alkyl groups, or halogens, wherein at least one of R1, R2, and R3 is a fluorine atom, and wherein R is hydrogen or a substituent on the styrenic ring.
    Type: Grant
    Filed: August 11, 2014
    Date of Patent: February 9, 2016
    Assignee: Akron Polymer Systems, Inc.
    Inventors: Xiaoliang Zheng, Dong Zhang, Jiaokai Jing, Frank W. Harris, Brian King, Ted Germroth, Thauming Kuo
  • Patent number: 9234987
    Abstract: A multilayer optical film includes a wave plate having a refractive index profile of nx>ny?nz and a fluoropolymer film comprising a moiety of wherein R1, R2, and R3 are each independently hydrogen atoms, alkyl groups, substituted alkyl groups, or halogens, wherein at least one of R1, R2, and R3 is a fluorine atom, wherein R is each independently a substituent on the styrenic ring, n is an integer from 0 to 5 representing the number of the substituents on the styrenic ring, and wherein nx and ny represent in-plane refractive indices and nz the thickness-direction refractive index of the wave plates; wherein said multilayer optical film has a positive in-plane retardation (Re) and an out-of-plane retardation (Rth) that satisfies the equation of |Rth|<Re/2 throughout the wavelength range of 400 nm to 800 nm.
    Type: Grant
    Filed: November 2, 2012
    Date of Patent: January 12, 2016
    Assignee: Akron Polymer Systems, Inc.
    Inventors: Bin Wang, Ted Calvin Germroth, Thauming Kuo, Frank W. Harris, Dong Zhang, Douglas S. McWilliams, Jiaokai Jing, Xiaoliang Zheng
  • Patent number: 9206285
    Abstract: The present invention relates to conjugated polymers and a method for their synthesis. Furthermore, the present invention relates to electro-synthesis methods for producing polymers that include the use of at least one Lewis acid and at least one proton trap to form organic conjugated polymers having elevated refractive indices. In one embodiment, the present invention relates to an organic polymer having an elevated refractive index, the organic polymer formed by a process comprising the steps of: providing a solution of unsaturated organic monomer units and at least one acidic component; impeding saturation of the unsaturated organic-monomer units by at least one protic element in the solution; and polymerizing the unsaturated organic monomer units to form a conjugated organic polymer having a refractive index of at least about 2.3 for electromagnetic energy having a wavelength of about 700 nm.
    Type: Grant
    Filed: July 31, 2012
    Date of Patent: December 8, 2015
    Assignee: The University of Akron
    Inventors: Stephen Z. Cheng, Matthew J. Graham, Frank W. Harris, Shi Jin
  • Publication number: 20150344359
    Abstract: This disclosure, viewed from one aspect, relates to a method for producing a sensor element, including the following steps (A) and (B): (A) applying a polyamide solution onto a base to form a polyamide film on the base; and (B) forming a sensor element on the surface of the polyamide film, wherein the base or the surface of the base is composed of glass or silicon wafer, wherein a polyamide of the polyamide solution has a constitutional unit represented by the following general formulae (I) and (II):
    Type: Application
    Filed: May 28, 2015
    Publication date: December 3, 2015
    Applicants: SUMITOMO BAKELITE COMPANY LIMITED, AKRON POLYMER SYSTEMS, INC.
    Inventors: Ritsuya KAWASAKI, Takehiko MAETANI, Toshihiko KATAYAMA, Jun OKADA, Hideo UMEDA, Limin SUN, Jiaokai JING, Dong ZHANG, Frank W. HARRIS
  • Publication number: 20150232697
    Abstract: In an aspect, the present disclosure relates to a polyamide solution including aromatic polyamide and a solvent. A dimension change gap between a cast film of the polyamide solution and the cast film after being subjected to a heat treatment is not more than a predetermined value. In another aspect, the present disclosure relates to a method for manufacturing a display element, an optical element, an illumination element or a sensor element, including a step of forming a polyamide film by using the polyamide solution.
    Type: Application
    Filed: February 19, 2015
    Publication date: August 20, 2015
    Applicants: AKRON POLYMER SYSTEMS, INC., SUMITOMO BAKELITE CO., LTD.
    Inventors: Limin SUN, Dong Zhang, Frank W. Harris, Hideo Umeda, Ritsuya Kawasaki, Toshihiko Katayama, Yusuke Inoue, Jun Okada, Mizuho Inoue, Manabu Naito
  • Patent number: 9096719
    Abstract: Optical compensation films (positive C-plate) with mesogen anisotropic subunits (OASUs) that have high positive birefringence throughout the wavelength range 400 nm<?<800 nm are provided. The optical compensation films may be processed by solution casting to yield a polymer film with high birefringence without the need for stretching, photopolymerization, or other processes. Such optical compensation films are suitable for use as a positive C-plate in LCDs, particularly IPS-LCDs.
    Type: Grant
    Filed: March 29, 2007
    Date of Patent: August 4, 2015
    Assignee: AKRON POLYMER SYSTEMS
    Inventors: Dong Zhang, Frank W. Harris, Xiaoliang Joe Zheng, Jiaokai Alexander Jing, Thauming Kuo, Brian Michael King, Ted Calvin Germroth, Qifeng Zhou
  • Publication number: 20150115255
    Abstract: Provided are a resin composition and a substrate that are capable of being used for manufacturing an electronic device having excellent light extraction efficiency. The resin composition contains a polymer and a solvent dissolving the polymer. The resin composition is used to form a layer, and when refractive indexes of the layer along two perpendicular in-plane directions thereof are respectively defined as “Nx” and “Ny” and a refractive index of the layer along a thickness direction thereof is defined as “Nz”, Nx, Ny and Nz satisfy a relationship of “(Nx+Ny)/2?Nz”>0.01. Further, a method of manufacturing the electronic device by using such a substrate, and the electronic device are also provided.
    Type: Application
    Filed: October 24, 2014
    Publication date: April 30, 2015
    Applicants: AKRON POLYMER SYSTEMS INC., SUMITOMO BAKELITE COMPANY LIMITED
    Inventors: Limin SUN, Jiaokai Jing, Dong Zhang, Frank W. Harris, Hideo Umeda, Ritsuya Kawasaki, Toshihiko Katayama, Yusuke Inoue, Jun Okada, Mizuho Inoue, Manabu Naito
  • Publication number: 20150108457
    Abstract: Provided are a resin composition and a substrate that are capable of being used for manufacturing an electronic device including a transparent resin film having an excellent display property, a method of manufacturing such a resin composition and a method of manufacturing the electronic device using such a substrate and the electronic device. The resin composition of the present invention contains an aromatic polyamide, an aromatic multifunctional compound having two or more functional groups including a carboxyl group or an amino group, and a solvent dissolving the aromatic polyamide.
    Type: Application
    Filed: October 22, 2014
    Publication date: April 23, 2015
    Applicants: AKRON POLYMER SYSTEMS INC., SUMITOMO BAKELITE COMPANY LIMITED
    Inventors: Limin Sun, Dong Zhang, Jiaokai Jing, Frank W. Harris, Hideo Umeda, Ritsuya Kawasaki, Jun Okada, Mizuho Inoue, Manabu Naito
  • Patent number: 9011992
    Abstract: The present invention provides uniaxially stretched polymer films that have a refractive index profile suitable for use as negative A-plates or biaxial birefringent plates in a liquid crystal display (LCD) device. These wave plates can be used to compensate for the phase retardations existing in various modes of LCDs including TN (twisted nematic), VA (vertically aligned), IPS (in-plane switching), and OCB (optically compensated bend), and therefore improving the viewing quality of the displays.
    Type: Grant
    Filed: August 22, 2008
    Date of Patent: April 21, 2015
    Assignee: Akron Polymer Systems
    Inventors: Xiaoliang Joe Zheng, Frank W. Harris, Ted Calvin Germroth, Jiaokai Alexander Jing, Dong Zhang, Thauming Kuo, Brian Michael King
  • Publication number: 20150097174
    Abstract: Provided are a resin composition and a substrate that are capable of being used for manufacturing an electronic device having excellent light extraction efficiency. The resin composition contains a crystalline polymer and a solvent dissolving the crystalline polymer. The resin composition is used to form a layer, and a haze value of the layer is 5% or more. Further, a method of manufacturing the electronic device by using such a substrate, and the electronic device are also provided.
    Type: Application
    Filed: October 3, 2014
    Publication date: April 9, 2015
    Applicants: AKRON POLYMER SYSTEMS INC., SUMITOMO BAKELITE COMPANY LIMITED
    Inventors: Limin SUN, Dong ZHANG, Jiaokai JING, Frank W. HARRIS, Hideo UMEDA, Jun OKADA, Manabu NAITO
  • Publication number: 20150099131
    Abstract: The present disclosure, in one aspect, relates to a polyamide solution including an aromatic polyamide and a solvent, wherein the aromatic polyamide includes at least two types of constitutional units, and a change rate of coefficient of thermal expansion (CTE) of a cast film produced by casting the polyamide solution on a glass plate and CTE of the same cast film after being subjected to a heat treatment at temperature of 200° C. to 450° C. (=CTE after heat treatment/CTE before heat treatment) is 1.3 or less.
    Type: Application
    Filed: October 1, 2014
    Publication date: April 9, 2015
    Applicants: AKRON POLYMER SYSTEMS, INC., SUMITOMO BAKELITE CO., LTD.
    Inventors: Limin SUN, Dong Zhang, Jiaokai Jing, Frank W. Harris, Hideo Umeda, Ritsuya Kawasaki, Toshihiko Katayama, Yusuke Inoue, Jun Okada, Mizuho Inoue, Manabu Naito
  • Publication number: 20150099332
    Abstract: Provided are a resin composition and a substrate that are capable of being used for producing an electronic device including thin-film transistors having an excellent switching property. The resin composition contains an aromatic polyamide and a solvent dissolving the aromatic polyamide. The resin composition is used to form a layer, and a total light transmittance of the layer in a wavelength of 355 nm is 10% or less. Further, a method of manufacturing the electronic device using such a substrate is also provided.
    Type: Application
    Filed: October 3, 2014
    Publication date: April 9, 2015
    Applicants: AKRON POLYMER SYSTEMS INC., SUMITOMO BAKELITE COMPANY LIMITED
    Inventors: Limin SUN, Dong ZHANG, Jiaokai JING, Frank W. HARRIS, Hideo UMEDA, Toshihiko KATAYAMA, Jun OKADA, Mizuho INOUE, Manabu NAITO
  • Publication number: 20140356636
    Abstract: This disclosure, in one or plurality of embodiments, relates to a solution of polyamide from which a cast film with low CTE and Rth can be achieved. This disclosure, viewed from one aspect, relates to a solution of polyamide comprising: an aromatic polyamide; inorganic filler; and a solvent. This disclosure, viewed from one aspect, relates to a laminated composite material, comprising a base, and a polyamide resin layer: wherein the polyamide resin layer is laminated to one surface of the base; and wherein the polyamide resin layer is obtained or obtainable by applying a polyamide solution comprising an aromatic polyamide, an inorganic filler and a solvent onto the base.
    Type: Application
    Filed: May 28, 2014
    Publication date: December 4, 2014
    Applicants: Akron Polymer Systems, Inc., Sumitomo Bakelite Co., Ltd.
    Inventors: Limin SUN, Jiaokai JING, Dong ZHANG, Frank W. HARRIS, Hideo UMEDA, Ritsuya KAWASAKI, Toshihiko KATAYAMA, Yusuke INOUE, Jun OKADA, Mizuho INOUE, Manabu NAITO
  • Publication number: 20140350166
    Abstract: An optical compensation film composition is disclosed herein wherein the optical compensation film is stretched to yield a negative A-plate having a refractive index profile of nx<ny=nz. or a biaxial polymer film having a refractive index profile of nx<ny<nz, the film having been stretched from a film cast from a polymer solution comprising a solvent and a polymer having a moiety of wherein R1, R2, and R3 are each independently hydrogen atoms, alkyl groups, substituted alkyl groups, or halogens, wherein at least one of R1, R2, and R3 is a fluorine atom, and wherein R is hydrogen or a substituent on the styrenic ring.
    Type: Application
    Filed: August 11, 2014
    Publication date: November 27, 2014
    Applicant: AKRON POLYMER SYSTEMS, INC.
    Inventors: Xiaoliang Zheng, Dong Zhang, Jiaokai Jing, Frank W. Harris, Brian King, Ted Germroth, Thauming Kuo
  • Patent number: 8889043
    Abstract: A method for casting a styrenic fluoropolymer film on a substrate includes preparing a polymer solution by dissolving the fluoropolymer in a solvent or solvent blend whose Hansen solubility parameters (HSPs. MPa1/2) satisfy the following relations: |SPb?SPp|<5, |SPb?SPs|<4, |SPb(H)?SPp(H)|<7, and 2<|SPb(H)?SPs(H)|<10 wherein SPb, SPp, SPs, are the total Hansen solubility parameters of solvent/solvent blend, fluoropolymer, and substrate, respectively; SPb(H), SPp(H), and, SPs(H) are the hydrogen-bond Hansen solubility parameters of solvent/solvent blend, fluoropolymer, and substrate, respectively; wherein the fluoropolymer comprises a moiety of: wherein R1, R2, and R3 are each independently hydrogen atoms, alkyl groups, substituted alkyl groups, or halogens, wherein at least one of R1, R2, and R3 is a fluorine atom, and wherein R is each independently a substituent on the styrenic ring, n is an integer from 0 to 5 representing the number of the substituents on the styrenic ring.
    Type: Grant
    Filed: May 1, 2012
    Date of Patent: November 18, 2014
    Assignee: Akron Polymer Systems, Inc.
    Inventors: Bin Wang, Thauming Kuo, Douglas Stephens McWilliams, Frank W. Harris, Ted Calvin Germroth, Jiaokai Jing, Dong Zhang, Xiaoliang Zheng
  • Patent number: 8871882
    Abstract: A method for the preparation of a fluoropolymer by means of emulsion polymerization of a reaction mixture in an aqueous medium is disclosed wherein the reaction mixture includes a fluoromonomer having the structure of wherein R1, R2, and R3 are each independently hydrogen atoms, alkyl groups, substituted alkyl groups, or halogens, wherein at least one of R1, R2, and R3 is a fluorine atom, and wherein R is each independently a substituent on the styrenic ring, n is an integer from 0 to 5 representing the number of the substituents on the styrenic ring; b) an emulsion stabilizer combination comprising: i) an anionic surfactant; and, ii) a cationic surfactant or a non-ionic surfactant; and, c) a free-radical initiator.
    Type: Grant
    Filed: February 14, 2012
    Date of Patent: October 28, 2014
    Assignee: Akron Polymer Systems, Inc.
    Inventors: Xiaoliang Zheng, Dong Zhang, Jiaokai Jing, Ted Calvin Germroth, Frank W. Harris, Thauming Kuo, Bin Wang, Douglas Stephens McWilliams
  • Publication number: 20140305597
    Abstract: This disclosure, viewed from one aspect, relates to a solution of polyamide comprising: an aromatic polyamide; and a solvent; wherein elastic modulus at 30.0° C. of a cast film formed by applying the solution onto a glass plate is 5.0 GPa or less, and coefficient of thermal expansion (CTE) of the cast film is more than 30 ppm/K, and wherein the aromatic copolyamide comprises at least two repeat units, and at least one of the repeat units has one or more free carboxyl groups.
    Type: Application
    Filed: April 14, 2014
    Publication date: October 16, 2014
    Applicants: Akron Polymer Systems, Inc., Sumitomo Bakelite Co., Ltd.
    Inventors: Frank W. HARRIS, Dong Zhang, Limin Sun, Jiaokai Jing, Hideo Umeda, Ritsuya Kawasaki, Toshihiko Katayama, Yusuke Inoue, Jun Okada, Mizuho Inoue, Manabu Naito
  • Patent number: 8821994
    Abstract: A multilayer optical retardation compensation film having at least one positive C-plate and at least one negative C-plate is used in an LCD device. The multilayer film may have a substantially flat wavelength dispersion curve, or the multilayer film combined with other layers in the LCD device may have a substantially flat wavelength dispersion curve. Polymer films for the positive C-plate may be identified according to their absorbance maxima at certain wavelength ranges.
    Type: Grant
    Filed: March 29, 2007
    Date of Patent: September 2, 2014
    Assignee: Akron Polymer Systems
    Inventors: Frank W. Harris, Jiaokai Alexander Jing, Ted Calvin Germroth, Xiaoliang Joe Zheng, Brian Michael King, Dong Zhang, Thauming Kuo, Qifeng Zhou