Patents by Inventor Frank Xavier BYRNE
Frank Xavier BYRNE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20170287694Abstract: A method of patterning a device includes forming a fluorinated photopolymer layer over a device substrate. The photopolymer layer has a lower portion proximate the device substrate and an upper portion distal the device substrate. The fluorinated photopolymer layer includes a radiation-absorbing dye and a fluorinated photopolymer having a solubility-altering reactive group. The photopolymer layer is exposed to patterned radiation to form exposed and unexposed areas in accordance with the patterned radiation and a developed structure is formed by removing unexposed areas using a developing agent that includes a first fluorinated solvent. The lower portion of the exposed area of the photopolymer layer has a dissolution rate in the developing agent that is at least 5 times higher than a dissolution rate for the upper portion.Type: ApplicationFiled: June 23, 2017Publication date: October 5, 2017Applicant: ORTHOGONAL, INC.Inventors: Douglas Robert ROBELLO, Terrence Robert O'TOOLE, Frank Xavier BYRNE, Diane Carol FREEMAN
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Publication number: 20170256754Abstract: A method of making an OLED device includes providing a first undercut lift-off structure over the device substrate having a first array of bottom electrodes. Next, one or more first organic EL medium layers including at least a first light-emitting layer are deposited over the first undercut lift-off structure and over the first array of bottom electrodes. The first undercut lift-off structure and overlying first organic EL medium layer(s) are removed by treatment with a first lift-off agent comprising a fluorinated solvent to form a first intermediate structure. The process is repeated using a second undercut lift-off structure to deposit one or more second organic EL medium layers over a second array of bottom electrodes. After removal of the second undercut lift-off structure, a common top electrode is provided in electrical contact with the first and second organic EL medium layers.Type: ApplicationFiled: July 31, 2015Publication date: September 7, 2017Inventors: John Andrew DEFRANCO, Terrence Robert O'TOOLE, Frank Xavier BYRNE, Diane Carol FREEMAN
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Publication number: 20170222148Abstract: A method of making a device includes providing a fluorinated material layer over the device substrate having one or more target areas for patterning. One or more lift-off structures are formed at least in part by developing a first pattern of one or more open areas in the fluorinated material layer in alignment with the one or more target areas by contact with a developing agent including a fluorinated solvent which dissolves the fluorinated material at a first rate. After patterning, the lift-off structures are removed by contact with a lift-off agent including a fluorinated solvent wherein the lift-off agent dissolves the fluorinated material at a second rate that is at least 150 nm/sec and higher than the first rate.Type: ApplicationFiled: July 31, 2015Publication date: August 3, 2017Inventors: John Andrew DEFRANCO, Charles Warren WRIGHT, Douglas Robert ROBELLO, Frank Xavier BYRNE, Diane Carol FREEMAN, Terrence Robert O'TOOLE
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Publication number: 20170219921Abstract: A method of patterning a device is disclosed using a resist precursor structure having at least two fluoropolymer layers. A first fluoropolymer layer includes a first fluoropolymer material having a fluorine content of at least 50% by weight and is substantially soluble in a first hydrofluoroether solvent or in a first perfluorinated solvent, but substantially less soluble in a second hydrofluoroether solvent relative to both the first hydrofluoroether and the first perfluorinated solvent. The second fluoropolymer layer includes a second fluoropolymer material having a fluorine content less than that of the first fluoropolymer material and is substantially soluble in the first or second hydrofluoroether solvents, but substantially less soluble in the first perfluorinated solvent relative to both the first and second hydrofluoroether solvents.Type: ApplicationFiled: July 31, 2015Publication date: August 3, 2017Inventors: Terrence Robert O'TOOLE, John Andrew DEFRANCO, Frank Xavier BYRNE
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Publication number: 20160349614Abstract: A photosensitive composition is disclosed including a fluorinated photo cross-linkable polymer provided in a fluorinated solvent such as a hydrofluoroether. The photo cross-linkable polymer includes a first repeating unit having a fluorine-containing group but not a cinnamate group, and a second repeating unit having a fluorine-containing cinnamate group. The polymer has a total fluorine content in a range of 30 to 60% by weight. The composition can be used to form patterned barrier or dielectric structures over substrates and devices such as organic electronic devices.Type: ApplicationFiled: February 4, 2015Publication date: December 1, 2016Inventors: Charles Warren WRIGHT, Douglas Robert ROBELLO, John Andrew DEFRANCO, Diane Carol FREEMAN, Frank Xavier BYRNE
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Patent number: 9335636Abstract: A photopolymer layer is formed on an organic device substrate and exposed to patterned radiation. The photopolymer layer includes a photopolymer comprising at least a first repeating unit having an acid-catalyzed, solubility-altering reactive group, wherein the total fluorine content of the photopolymer is less than 30% by weight. The pattern exposed photopolymer is contacted with a developing agent, such as a developing solution, to remove unexposed photopolymer, thereby forming a developed structure having a first pattern of exposed photopolymer covering the substrate and a complementary second pattern of uncovered substrate corresponding to the unexposed photopolymer. The developing agent comprises at least 50% by volume of a hydrofluoroether developing solvent.Type: GrantFiled: July 24, 2015Date of Patent: May 10, 2016Assignee: ORTHOGONAL, INC.Inventors: John Andrew DeFranco, Francis Houlihan, Charles Warren Wright, Diane Carol Freeman, Frank Xavier Byrne, Douglas Robert Robello, Sandra Rubsam, Terrence Robert O'Toole
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Publication number: 20150331325Abstract: A photopolymer layer is formed on an organic device substrate and exposed to patterned radiation. The photopolymer layer includes a photopolymer comprising at least a first repeating unit having an acid-catalyzed, solubility-altering reactive group, wherein the total fluorine content of the photopolymer is less than 30% by weight. The pattern exposed photopolymer is contacted with a developing agent, such as a developing solution, to remove unexposed photopolymer, thereby forming a developed structure having a first pattern of exposed photopolymer covering the substrate and a complementary second pattern of uncovered substrate corresponding to the unexposed photopolymer. The developing agent comprises at least 50% by volume of a hydrofluoroether developing solvent.Type: ApplicationFiled: July 24, 2015Publication date: November 19, 2015Inventors: John Andrew DEFRANCO, Francis HOULIHAN, Charles Warren WRIGHT, Diane Carol FREEMAN, Frank Xavier BYRNE, Douglas Robert ROBELLO, Sandra RUBSAM, Terrence Robert O'TOOLE
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Patent number: 9122167Abstract: A photopolymer layer is formed on an organic device substrate and exposed to patterned radiation. The photopolymer layer includes a photopolymer comprising at least a first repeating unit having an acid-catalyzed, solubility-altering reactive group, wherein the total fluorine content of the photopolymer is less than 30% by weight. The pattern exposed photopolymer is contacted with a developing agent, such as a developing solution, to remove unexposed photopolymer, thereby forming a developed structure having a first pattern of exposed photopolymer covering the substrate and a complementary second pattern of uncovered substrate corresponding to the unexposed photopolymer. The developing agent comprises at least 50% by volume of a hydrofluoroether developing solvent.Type: GrantFiled: May 12, 2014Date of Patent: September 1, 2015Assignee: Orthogonal, Inc.Inventors: John Andrew Defranco, Francis Houlihan, Charles Warren Wright, Diane Carol Freeman, Frank Xavier Byrne, Douglas Robert Robello, Sandra Rubsam, Terrence Robert O'Toole
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Patent number: 9104104Abstract: A fluorinated photopolymer is formed on a device substrate and exposed to patterned radiation. The photopolymer has a total fluorine content in a weight range of 15 to 60% and comprises at least three distinct repeating units, including a first repeating unit having a fluorine-containing group, a second repeating unit having an acid- or alcohol-forming precursor group, and a third repeating unit different from the first and second repeating units. The pattern-exposed photopolymer layer is contacted with a developing solution comprising at least a first fluorinated solvent that dissolves the unexposed photopolymer thereby forming a developed structure having a first pattern of photopolymer covering the substrate and a complementary second pattern of uncovered substrate. The developing solution is selected to provide a maximum photopolymer contrast in a range of 1.9 to 5.0.Type: GrantFiled: April 24, 2014Date of Patent: August 11, 2015Assignee: Orthogonal, Inc.Inventors: Charles Warren Wright, Diane Carol Freeman, Frank Xavier Byrne, John Andrew DeFranco, Sandra Rubsam, Terrence Robert O'Toole, Douglas Robert Robello
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Publication number: 20150132699Abstract: A fluorinated photopolymer composition is disclosed having a branched copolymer provided in a fluorinated solvent. The copolymer includes a branching unit, a first repeating unit having a fluorine-containing group, and a second repeating unit having a solubility-altering reactive group. The branched fluorinated photopolymer composition is particularly suited for the fabrication of organic electronic and bioelectronic devices, or other devices having sensitive active organic materials.Type: ApplicationFiled: November 12, 2014Publication date: May 14, 2015Inventors: Douglas Robert Robello, Charles Warren Wright, Diane Carol Freeman, Frank Xavier Byrne, John Andrew DeFranco, Sandra Rubsam, Terrence Robert O'Toole
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Publication number: 20140342287Abstract: A fluorinated photopolymer is formed on a device substrate and exposed to patterned radiation. The photopolymer has a total fluorine content in a weight range of 15 to 60% and comprises at least three distinct repeating units, including a first repeating unit having a fluorine-containing group, a second repeating unit having an acid- or alcohol-forming precursor group, and a third repeating unit different from the first and second repeating units. The pattern-exposed photopolymer layer is contacted with a developing solution comprising at least a first fluorinated solvent that dissolves the unexposed photopolymer thereby forming a developed structure having a first pattern of photopolymer covering the substrate and a complementary second pattern of uncovered substrate. The developing solution is selected to provide a maximum photopolymer contrast in a range of 1.9 to 5.0.Type: ApplicationFiled: April 24, 2014Publication date: November 20, 2014Inventors: Charles Warren Wright, Diane Carol Freeman, Frank Xavier Byrne, John Andrew DeFranco, Sandra Rubsam, Terrrence Robert O'Toole, Douglas Robert Robello
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Publication number: 20140322656Abstract: A photoresist layer comprising a fluorinated photoresist material is formed on a device substrate and exposed to patterned radiation. The exposed photoresist layer is contacted with a developing agent to remove a portion of the exposed photoresist layer in accordance with the patterned light, thereby forming a developed structure having a first pattern of photoresist covering the substrate and a complementary second pattern of uncovered substrate corresponding to the removed portion of photoresist, the developing agent comprising a mixture of first and second fluorinated solvents, wherein at least one of the first and second solvents is a hydrofluoroether. The developed structure is treated to form a treated structure. The treated structure is contacted with a stripping agent to remove the first pattern of photoresist, the stripping agent comprising at least the first or second solvent in a concentration different from the developing agent.Type: ApplicationFiled: April 24, 2014Publication date: October 30, 2014Inventors: Charles Warren Wright, Diane Carol Freeman, Frank Xavier Byrne, John Andrew DeFranco
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Publication number: 20140248565Abstract: A photopolymer layer is formed on an organic device substrate and exposed to patterned radiation. The photopolymer layer includes a photopolymer comprising at least a first repeating unit having an acid-catalyzed, solubility-altering reactive group, wherein the total fluorine content of the photopolymer is less than 30% by weight. The pattern exposed photopolymer is contacted with a developing agent, such as a developing solution, to remove unexposed photopolymer, thereby forming a developed structure having a first pattern of exposed photopolymer covering the substrate and a complementary second pattern of uncovered substrate corresponding to the unexposed photopolymer. The developing agent comprises at least 50% by volume of a hydrofluoroether developing solvent.Type: ApplicationFiled: May 12, 2014Publication date: September 4, 2014Inventors: John Andrew DEFRANCO, Francis HOULIHAN, Charles Warren WRIGHT, Diane Carol FREEMAN, Frank Xavier BYRNE, Douglas Robert ROBELLO, Sandra RUBSAM, Terrence Robert O'TOOLE