Abstract: A photomask and method for manufacturing the same are disclosed. A first material is deposited on at least a portion of a substrate to form a first material layer. Before completion of the deposition of the first material, a thermal treatment is applied to the substrate at a temperature greater than approximately 300 degrees Celsius.

Abstract: A method and apparatus for coupling a pellicle to a photomask using a non-distorting mechanism are disclosed. A pellicle is coupled to a photomask with a non-distorting mechanism that is located on a pellicle frame opposite a thin film coupled to the pellicle frame. The non-distorting mechanism acts to reduce stress exerted on the photomask by the pellicle.

Abstract: A photomask and a method for forming an opaque border on the same are disclosed. In an example method of manufacturing a photomask, no more than one patterning operation is used to form a mask field with an opaque border substantially surrounding the mask field. The border region may be substantially covered by an opaque material, and features in the mask field may be free from the opaque material. When the photomask is used to expose a pattern on an object, the opaque border may substantially prevent electromagnetic radiation (EMR) from exposing portions of the object outside the field of exposure associated with the mask field. The operation of forming the mask field may include forming an insulating clear region surrounding the features and leaving the border region outside the insulating clear region. The opaque layer may be deposited by electroplating or spraying an opaque material onto the border region.

Abstract: The present disclosure describes an Alternating Aperture Phase Shifting (AAPS) photomask with improved transmission balance. The method includes forming an alternating aperture phase shifting photomask pattern on a substrate, including forming trenches within the substrate. The method further includes forming a transmission balancing layer over the substrate. More particularly, the method includes forming the transmission balancing layer from a material having a higher index of refraction than the substrate. In one embodiment the transmission balancing layer may be formed from spin on glass (SOG). Another embodiment of the invention may include an enhanced AAPS photomask fabricated according to the above method.

Abstract: The present disclosure includes describes a method for fabricating an AAPS photomask with improved intensity balance. The method includes forming an alternating aperture phase shifting photomask pattern on a substrate, including forming trenches within the substrate. The method further includes forming a layer of antireflective material within the bottom of at least one trench. In one embodiment the layer antireflective material is Magnesium Fluoride (MgF2) formed using a vacuum evaporation technique. The layer of antireflective material formed at the bottom of the trench areas increases the transmission of light through the trench areas by improving light coupling into the trench.

Abstract: A method and apparatus evaluates the runability of a photomask inspection tool that inspects plural sets of die, each die having a standard simulated industrial device feature at plural technology nodes. A technology node size is determined for each feature at which inspection by the tool provides no false detection of faults. A sensitivity module included on a photomask test plate along with a runability module allows determination of inspection tool sensitivity and runability in a single test sequence.

Abstract: A photomask and method for manufacturing the same are disclosed. A first material is deposited on at least a portion of a substrate to form a first material layer. Before completion of the deposition of the first material, a thermal treatment is applied to the substrate at a temperature greater than approximately 300 degrees Celsius.

Abstract: A method and apparatus evaluates the runability of a photomask inspection tool that inspects plural sets of die, each die having a standard simulated industrial device feature at plural technology nodes. A technology node size is determined for each feature at which inspection by the tool provides no false detection of faults. A sensitivity module included on a photomask test plate along with a runability module allows determination of inspection tool sensitivity and runability in a single test sequence.