Abstract: This Application discloses the display of stored information when creating a electronic command for use with mobile smartphones and other computer-enabled telephones. A software app recognizes input from the user (such as the initial digits of a phone number) that identifies the organization to be called, and accesses stored representations of information along with corresponding IVR phone tree information and user display preferences. The app then presents a representation of all or part of the retrieved information on a display using the user's language preferences. The user can then respond to the representation by providing selective inputs that cause the synthesis all or part of the commands needed to navigate to the desired destination. Once a command sequence has been synthesized, the user may provide additional input that the system interprets as an instruction to open a phone call and invoke the assembled commands.

Abstract: This Application discloses the display of stored information when creating a electronic command for use with mobile smartphones and other computer-enabled telephones. A software app recognizes input from the user (such as the initial digits of a phone number) that identifies the organization to be called, and accesses stored representations of information along with corresponding IVR phone tree information and user display preferences. The app then presents a representation of all or part of the retrieved information on a display using the user's language preferences. The user can then respond to the representation by providing selective inputs that cause the synthesis all or part of the commands needed to navigate to the desired destination. Once a command sequence has been synthesized, the user may provide additional input that the system interprets as an instruction to open a phone call and invoke the assembled commands.

Abstract: This application discloses the display of stored information when creating a dialstring for use with mobile smartphones and other computer-enabled telephones. A software app recognizes input from the user (such as the initial digits of a phone number) that identifies the organization to be called, and accesses stored representations of information along with corresponding IVR phone tree information and user display preferences. The app then presents a representation of all or part of the retrieved information on a display using the user's language preferences. The user can then respond to the representation by providing selective inputs that cause the synthesis all or part of the dialstring needed to navigate the phone tree to the desired destination. Once a dialing option has been synthesized, the user may provide additional input that the system interprets as an instruction to open a phone call and dial the synthesized number.

Abstract: This application discloses the display of stored information when creating a dialstring for use with mobile smartphones and other computer-enabled telephones. A software app recognizes input from the user (such as the initial digits of a phone number) that identifies the organization to be called, and accesses stored representations of information along with corresponding IVR phone tree information and user display preferences. The app then presents a representation of all or part of the retrieved information on a display using the user's language preferences. The user can then respond to the representation by providing selective inputs that cause the synthesis all or part of the dialstring needed to navigate the phone tree to the desired destination. Once a dialing option has been synthesized, the user may provide additional input that the system interprets as an instruction to open a phone call and dial the synthesized number.

Abstract: The invention is a method of creating a dialstring for use with mobile smartphones and other computer-enabled telephones. A software app designed to implement the method recognizes input from the user that identifies an organization to be called, and accesses a stored representation of a corresponding IVR phone tree. The app then presents a graphical representation of all or part of the phone tree on the display of the telephone in a language that is different than the language used in the phone tree. The user can then respond by providing selective inputs that cause the app to synthesize all or part of the dialstring needed to navigate the phone tree to the desired destination. Once a dialing option has been synthesized to the user's satisfaction, the user may provide additional input that the system interprets as an instruction to open a phone call and dial the synthesized number.

Abstract: The invention is a method of creating a dialstring for use with mobile smartphones and other computer-enabled telephones. A software app designed to implement the method recognizes input from the user that identifies an organization to be called, and accesses a stored representation of a corresponding IVR phone tree. The app then presents a graphical representation of all or part of the phone tree on the display of the telephone in a language that is different than the language used in the phone tree. The user can then respond by providing selective inputs that cause the app to synthesize all or part of the dialstring needed to navigate the phone tree to the desired destination. Once a dialing option has been synthesized to the user's satisfaction, the user may provide additional input that the system interprets as an instruction to open a phone call and dial the synthesized number.

Abstract: A computer system reads data corresponding to an IC layout target layer and performs an etch simulation on the target layer. Etch biases are calculated and the inverse of the etch biases are used to produce a new target layer. The new target layer is provided as an input to an optical process correction (OPC) loop that corrects the data for image/resist distortions until a simulation indicates that a pattern of objects created on a wafer matches the new target layer. In another embodiment of the invention, original IC layout data is provided to both the OPC loop and an etch simulation. Etch biases calculated by the etch simulation are used in the OPC loop in order to produce mask/reticle data that will be compensated for both optical and resist distortions as well as for etch distortions.

Abstract: An embodiment of the present invention described and shown in the specification is a system for optimizing data used in creating a photolithographic mask. The system reads a definition of a layer of wafer to be created with a photolithographic mask and defines a number of polygons corresponding to conventional patterns on a mask and polygons corresponding to areas on the mask that are phase shifters. A number of data layers are created and the polygons that define phase shifting areas that shift the phase of light by differing amounts of are grouped in different data layers. Once separated, the system analyzes the polygons in each data layer against one or more design rules and assigns a phase shift amount to all the polygons in a data layer in accordance with the analysis. The polygon definitions in each data layer are then given to a mask maker to fabricate a photolithographic mask.

Abstract: An embodiment of the present invention described and shown in the specification is a system for optimizing data used in creating a photolithographic mask. The system reads a definition of a layer of wafer to be created with a photolithographic mask and defines a number of polygons corresponding to conventional patterns on a mask and polygons corresponding to areas on the mask that are phase shifters. A number of data layers are created and the polygons that define phase shifting areas that shift the phase of light by differing amounts of are grouped in different data layers. Once separated, the system analyzes the polygons in each data layer against one or more design rules and assigns a phase shift amount to all the polygons in a data layer in accordance with the analysis. The polygon definitions in each data layer are then given to a mask maker to fabricate a photolithographic mask.

Abstract: Design-based reticle inspection allows for a more efficient prioritization than typical human labor intensive reticle inspection techniques. A processed netlist for an integrated circuit (IC) and/or layout of the IC is used to determine the relative priorities of reticle defects identified by a reticle inspection device. In one embodiment, the processed netlist is a netlist that is derived by a verification tool based on a layout of the IC design. The processed netlist can include component coordinates that indicate the position of the components of the IC. In one embodiment, the processed layout includes derived geometry, for example, critical dimensions and/or device identifications that can be used to determine regions of interest. In one embodiment, defects are prioritized based on the location of the defects with respect to functional portions of the integrated circuit. For example, regions of interest can be determined around certain IC structures (e.g.

Abstract: An embodiment of the present invention described and shown in the specification is a system for optimizing data used in creating a photolithographic mask. The system reads a definition of a layer of wafer to be created with a photolithographic mask and defines a number of polygons corresponding to conventional patterns on a mask and polygons corresponding to areas on the mask that are phase shifters. A number of data layers are created and the polygons that define phase shifting areas that shift the phase of light by differing amounts of are grouped in different data layers. Once separated, the system analyzes the polygons in each data layer against one or more design rules and assigns a phase shift amount to all the polygons in a data layer in accordance with the analysis. The polygon definitions in each data layer are then given to a mask maker to fabricate a photolithographic mask.

Abstract: A computer system reads data corresponding to an IC layout target layer and performs an etch simulation on the target layer. Etch biases are calculated and the inverse of the etch biases are used to produce a new target layer. The new target layer is provided as an input to an optical process correction (OPC) loop that corrects the data for image/resist distortions until a simulation indicates that a pattern of objects created on a wafer matches the new target layer. In another embodiment of the invention, original IC layout data is provided to both the OPC loop and an etch simulation. Etch biases calculated by the etch simulation are used in the OPC loop in order to produce mask/reticle data that will be compensated for both optical and resist distortions as well as for etch distortions.

Abstract: A nonlinear optical device comprising a substrate and a film structure coated on to the substrate. The film has, in a direction normal to the substrate, an intercalation structure including a semiconductor layer and an organic layer that lave different energy gaps. The intercalation structure includes a plurality of semiconductor layers and a plurality of organic layers which comprise a quantum well system. The film structure includes an assembly of microcrystals having domain size smaller than that of the wavelength of light with which the device operates. The microcrystals have an axis aligned in a direction normal to the substrate and have randomly oriented axes in a direction parallel to the substrate. A method for producing the device comprises providing a solution of an organic material in a solvent and placing a quantity of the solution on a substrate to form the organic material film structure thereon. The film is formed by spin coating of the solution on the substrate.

Abstract: A plurality of noncontiguous polygonal regions of phase-shifting material have edges spaced apart less than the distance at which images of said edges would separate. The edges of the regions of phase-shifting material have differing arbitrarily selectable angular orientations (nonparallel as well as parallel) on a nonphase-shifting material. The noncontiguous phase-shifting regions may be arranged in a matrix of parallel columns and rows to facilitate fabrication and facilitate writing of the phase-shifting regions in any arbitrary pattern on an image plane. At least one of the phase-shifting regions constitutes a connective phase-shifting region with edges spaced from edges of adjacent ones of the phase-shifting regions to create a pattern with a continuous body of photoresist covering areas corresponding to the phase-shifting regions upon exposure of the mask.

Abstract: A birefringent structure useful as a waveplate, grating, a hologram, a beam separator, a digital data storage medium or the like is formed by photo-exposure causing photo-reaction between photons and polymeric structures. In a specific embodiment, birefringence is induced by applying optical energy to a polymer film such as a polysilane with sufficient intensity to excite nonlinear absorption in the polymer film such that a pattern of the exposing optical energy is recorded in the polymer film. The optical energy is of a distinct polarization state such that the nonlinear optical efBACKGROUND OF THE INVENTIONThis invention was made under contract with or supported by the United States Air Force Office of Scientific Research under Contract No. AFOSR-88-0354. The Government has certain rights in this invention.

Abstract: A birefringent structure useful as a waveplate, grating, a hologram, a beam separator, a digital data storage medium or the like is formed by photo-exposure causing photo-reaction between photons and polymeric structures. In a specific embodiment, birefringence is induced by applying optical energy to a polymer film such as a polysilane with sufficient intensity to excite nonlinear absorption in the polymer film such that a pattern of the exposing optical energy is recorded in the polymer film. The optical energy is of a distinct polarThis invention was made under contract with or supported by the United States Air Force office of Scientific Research under Contract No. AFOSR-88-0354. The Government has certain rights in this invention.

Abstract: An improved apparatus and method for detecting the polarization state of an optical wavefront is disclosed, which is especially suitable for use in an integrated magneto-optic recording head. An optically transparent waveguide structure transmits TE and TM modes of the wavefront propagated as a beam coupled into the waveguide by a TE/TM grating coupler. In the waveguide structure is a periodic structure comprising a birefringent mode separator that splits the propagating beam into TE and TM modes. The mode separator comprises an array of uniformly spaced volumes of identical configuration. Photosensitive devices detect the intensity of the light contained within each of the separated beams. The signals from these photosensitive devices are used to determine the state of polarization of the optical wavefront. The periodic structure may, if desired, comprise regions of alternating birefringence, such as a Bragg grating, either in a waveguide layer or a cladding layer.

Abstract: A process and apparatus are disclosed for producing a beam of coherent radiation at essentially 459 nm by mixing, in a nonlinear crystal consisting essentially of KTP, two laser beams, one at essentially 1064 nm and the other at essentially 808 nm. The 1064 nm radiation is derived from a Nd:YAG laser that consists of an input mirror, an output mirror and a Nd:YAG crystal, and contains also the KTP crystal. The Nd:YAG laser is pumped by an essentially 808 nm semiconductor diode laser beam, which passes through the input mirror and through the KTP crystal into the Nd:YAG laser crystal where it is absorbed. The 1064 nm radiation oscillating inside the Nd:YAG laser resonator is mixed either with the said 808 nm pump beam or with 808 nm radiation provided by a second semiconductor diode laser whose light is coupled with the 1064 nm beam using a beamsplitter. The essentially 459 nm beam passes through the output mirror to a utilization device.