Patents by Inventor Frans Munnik

Frans Munnik has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7385209
    Abstract: Ion beam lithography technique wherein a higher amount of radiation energy is deposited to predetermined regions in the bulk if a suitable substrate. By selecting the radiation nature, its energy and the irradiation parameters a structure can be created in the bulk of the material leaving the surface essentially untouched.
    Type: Grant
    Filed: October 24, 2005
    Date of Patent: June 10, 2008
    Assignee: Haute Ecole Arc Ne-Be-Ju
    Inventors: Samuel Jaccard, Serguei Mikhailov, Frans Munnik
  • Publication number: 20060214105
    Abstract: Ion beam lithography technique wherein a higher amount of radiation energy is deposited to predetermined regions in the bulk if a suitable substrate. By selecting the radiation nature, its energy and the irradiation parameters a structure can be created in the bulk of the material leaving the surface essentially untouched.
    Type: Application
    Filed: October 24, 2005
    Publication date: September 28, 2006
    Inventors: Samuel Jaccard, Serguei Mikhailov, Frans Munnik