Patents by Inventor Frans Reinier SPIERING

Frans Reinier SPIERING has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240118629
    Abstract: A method of processing measurement data relating to a substrate processed by a manufacturing process. The method includes obtaining measurement data relating to a performance parameter for at least a portion of the substrate; and fitting the measurement data to a model by minimizing a complexity metric applied to fitting parameters of the model while not allowing the deviation between the measurement data and the fitted model to exceed a threshold value.
    Type: Application
    Filed: October 5, 2020
    Publication date: April 11, 2024
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Aliasghar KEYVANI JANBAHAN, Frans Reinier SPIERING, Jochem Sebastiaan WILDENBERG, Everhardus Cornelis MOS
  • Patent number: 11520238
    Abstract: A method of optimizing an apparatus for multi-stage processing of product units such as wafers, the method includes: receiving object data representing one or more parameters measured across the product units and associated with different stages of processing of the product units; and determining fingerprints of variation of the object data across the product units, the fingerprints being associated with different respective stages of processing of the product units. The fingerprints may be determined by decomposing the object data into components using principal component analysis for each different respective stage; analyzing commonality of the fingerprints through the different stages to produce commonality results; and optimizing an apparatus for processing product units based on the commonality results.
    Type: Grant
    Filed: September 20, 2021
    Date of Patent: December 6, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Jelle Nije, Alexander Ypma, Dimitra Gkorou, Georgios Tsirogiannis, Robert Jan Van Wijk, Tzu-Chao Chen, Frans Reinier Spiering, Sarathi Roy, Cédric Désiré Grouwstra
  • Publication number: 20220291593
    Abstract: A method for characterizing a patterning process, the method including obtaining a plurality of values of stitching errors made along one or more boundaries between at least two patterned adjacent fields or sub-fields on a substrate; and fitting, using a hardware computer system, a distortion model to the plurality of values to obtain a fingerprint representing deformation of a field or sub-field out of the at least two patterned adjacent fields or sub-fields.
    Type: Application
    Filed: August 5, 2020
    Publication date: September 15, 2022
    Inventors: Roy WERKMAN, Pui Leng LAM, Blandine Marie Andree Richit MINGHETTI, Vahid BASTANI, Mohamadrezh HAJIAHMADI, Lydia Marianna VERGAIJ-HUIZER, Frans Reinier SPIERING
  • Publication number: 20220004108
    Abstract: A method of optimizing an apparatus for multi-stage processing of product units such as wafers, the method includes: receiving object data representing one or more parameters measured across the product units and associated with different stages of processing of the product units; and determining fingerprints of variation of the object data across the product units, the fingerprints being associated with different respective stages of processing of the product units. The fingerprints may be determined by decomposing the object data into components using principal component analysis for each different respective stage; analyzing commonality of the fingerprints through the different stages to produce commonality results; and optimizing an apparatus for processing product units based on the commonality results.
    Type: Application
    Filed: September 20, 2021
    Publication date: January 6, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jelle NIJE, Alexander YPMA, Dimitra GKOROU, Georgios TSIROGIANNIS, Robert Jan VAN WIJK, Tzu-Chao CHEN, Frans Reinier SPIERING, Sarathi ROY, Cédric Désiré GROUWSTRA
  • Patent number: 11150562
    Abstract: A method of optimizing an apparatus for multi-stage processing of product units such as wafers, the method includes: receiving object data representing one or more parameters measured across the product units and associated with different stages of processing of the product units; and determining fingerprints of variation of the object data across the product units, the fingerprints being associated with different respective stages of processing of the product units. The fingerprints may be determined by decomposing the object data into components using principal component analysis for each different respective stage; analyzing commonality of the fingerprints through the different stages to produce commonality results; and optimizing an apparatus for processing product units based on the commonality results.
    Type: Grant
    Filed: February 22, 2018
    Date of Patent: October 19, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Jelle Nije, Alexander Ypma, Dimitra Gkorou, Georgios Tsirogiannis, Robert Jan Van Wijk, Tzu-Chao Chen, Frans Reinier Spiering, Sarathi Roy, Cédric Désiré Grouwstra
  • Publication number: 20200233315
    Abstract: A method of optimizing an apparatus for multi-stage processing of product units such as wafers, the method includes: receiving object data representing one or more parameters measured across the product units and associated with different stages of processing of the product units; and determining fingerprints of variation of the object data across the product units, the fingerprints being associated with different respective stages of processing of the product units. The fingerprints may be determined by decomposing the object data into components using principal component analysis for each different respective stage; analyzing commonality of the fingerprints through the different stages to produce commonality results; and optimizing an apparatus for processing product units based on the commonality results.
    Type: Application
    Filed: February 22, 2018
    Publication date: July 23, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jelle NIJE, Alexander YPMA, Dimitra GKOROU, Georgios TSIROGIANNIS, Robert Jan VAN WIJK, Tzu-Chao CHEN, Frans Reinier SPIERING, Sarathi ROY, Cédric Désiré GROUWSTRA