Patents by Inventor Fransisco Camargo

Fransisco Camargo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • ARRANGEMENTS FOR IMPROVING BEVEL ETCH REPEATABILITY AMONG SUBSTRATES
    Publication number: 20110259520
    Abstract: An apparatus for improving bevel etch repeatability among substrates is provided. The apparatus includes an optical arrangement disposed to ascertain at least one bevel edge characteristic of a bevel edge of a substrate. The apparatus also includes a logic module for deriving at least one compensation factor from the at least one bevel edge characteristic. At least one compensation factor pertains to an adjustment in a bevel etch process parameter. The apparatus further includes a plasma processing chamber for performing bevel etching utilizing the at least one compensation factor.
    Type: Application
    Filed: July 7, 2011
    Publication date: October 27, 2011
    Inventors: Andreas Fischer, Neungho Shin, Fransisco Camargo
  • Arrangements and methods for improving bevel etch repeatability among substrates
    Patent number: 7977123
    Abstract: A method, performed in connection with bevel etching of a substrate, for improving bevel-etch repeatability among substrates, is disclosed. The method includes providing an optical arrangement and ascertaining at least one bevel edge characteristic of a bevel edge of said substrate. The method also includes deriving at least one compensation factor from said at least one bevel edge characteristic, said at least one compensation factor pertaining to an adjustment in a bevel etch process parameter. The method further includes performing said bevel etching utilizing said at least one compensation factor.
    Type: Grant
    Filed: May 22, 2009
    Date of Patent: July 12, 2011
    Assignee: Lam Research Corporation
    Inventors: Andreas Fischer, Neungho Shin, Fransisco Camargo
  • ARRANGEMENTS AND METHODS FOR IMPROVING BEVEL ETCH REPEATABILITY AMONG SUBSTRATES
    Publication number: 20100297788
    Abstract: A method, performed in connection with bevel etching of a substrate, for improving bevel-etch repeatability among substrates, is disclosed. The method includes providing an optical arrangement and ascertaining at least one bevel edge characteristic of a bevel edge of said substrate. The method also includes deriving at least one compensation factor from said at least one bevel edge characteristic, said at least one compensation factor pertaining to an adjustment in a bevel etch process parameter. The method further includes performing said bevel etching utilizing said at least one compensation factor.
    Type: Application
    Filed: May 22, 2009
    Publication date: November 25, 2010
    Inventors: Andreas Fischer, Neungho Shin, Fransisco Camargo