Patents by Inventor Fransiscus Mathijs Jacobs
Fransiscus Mathijs Jacobs has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 10816910Abstract: The invention relates to a vibration isolator, comprising: a base; a coupling element to be coupled to a vibration sensitive object; a decoupling mass; a first vibration isolator part arranged between the base and the decoupling mass; and a second vibration isolator part arranged between the decoupling mass and the coupling element, and wherein at least one of the first and second vibration isolator part comprises a pneumatic isolator.Type: GrantFiled: February 3, 2017Date of Patent: October 27, 2020Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Cornelius Adrianus Lambertus De Hoon, Fransiscus Mathijs Jacobs, Pavel Kagan, Jeroen Pieter Starreveld, Maurice Willem Jozef Etienne Wijckmans
-
Patent number: 10503086Abstract: A lithographic apparatus is described, the lithographic apparatus comprising: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a projection system configured to project the patterned radiation beam onto a target portion of a substrate, a stage assembly comprising: a substrate table constructed to hold the substrate; and a positioning device configured to displace the substrate table relative to the projection system; a base frame onto which stage assembly and the projection system are mounted; the base frame comprising a first portion configured to support the stage assembly and a second portion configured to support the projection system, the first portion and the second portion being connected to each other via a compliant portion of the base frame.Type: GrantFiled: December 7, 2016Date of Patent: December 10, 2019Assignee: ASML NETHERLANDS B.V.Inventors: Hans Butler, Cornelius Adrianus Lambertus De Hoon, Fransiscus Mathijs Jacobs, Pavel Kagan, Jeroen Pieter Starreveld, Maurice Willem Jozef Etiënne Wijckmans
-
Publication number: 20190049852Abstract: The invention relates to a vibration isolator, comprising: a base; a coupling element to be coupled to a vibration sensitive object; a decoupling mass; a first vibration isolator pan arranged between the base and the decoupling mass; and a second vibration isolator part arranged between the decoupling mass and the coupling element, and wherein at least one of the first and second vibration isolator part comprises a pneumatic isolator.Type: ApplicationFiled: February 3, 2017Publication date: February 14, 2019Inventors: Hans Butler, Cornelius Adrianus Lambertus De Hoon, Fransiscus Mathijs Jacobs, Pavel Kagan, Jeroen Pieter Starreveld, Maurice Willem Jozef Etienne Wijckmans
-
Patent number: 10191393Abstract: A measurement system for a lithographic apparatus includes a sub-frame compliantly mounted on a reference frame. A measurement device, e.g. an alignment sensor, is mounted on the sub-frame. Soft mounting of the sub-frame isolates the alignment sensor from high-frequency disturbances, e.g. acoustic noise, by acting as a low-pass filter with a cut-off frequency, e.g. in the range of from 100 to 200 Hz.Type: GrantFiled: February 22, 2016Date of Patent: January 29, 2019Assignee: ASML Netherlands B.V.Inventors: Jan Steven Christiaan Westerlaken, Marcel Koenraad Marie Baggen, Fransiscus Mathijs Jacobs, Jeroen Arnoldus Leonardus Johannes Raaymakers, Frank Pieter Albert Van Den Berkmortel, Marc Wilhelmus Maria Van Der Wijst
-
Publication number: 20190011838Abstract: A lithographic apparatus is described, the lithographic apparatus comprising: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a projection system configured to project the patterned radiation beam onto a target portion of a substrate, a stage assembly comprising: a substrate table constructed to hold the substrate; and a positioning device configured to displace the substrate table relative to the projection system; a base frame onto which stage assembly and the projection system are mounted; the base frame comprising a first portion configured to support the stage assembly and a second portion configured to support the projection system, the first portion and the second portion being connected to each other via a compliant portion of the base frame.Type: ApplicationFiled: December 7, 2016Publication date: January 10, 2019Inventors: Hans BUTLER, Cornelius Adrianus Lambertus DE HOON, Fransiscus Mathijs JACOBS, Pavel KAGAN, Jeroen Pieter STARREVELD, Maurice Willem Jozef Etiënne WIJCKMANS
-
Publication number: 20180059555Abstract: A measurement system for a lithographic apparatus includes a sub-frame compliantly mounted on a reference frame. A measurement device, e.g. an alignment sensor, is mounted on the sub-frame. Soft mounting of the sub-frame isolates the alignment sensor from high-frequency disturbances, e.g. acoustic noise, by acting as a low-pass filter with a cut-off frequency, e.g. in the range of from 100 to 200 Hz.Type: ApplicationFiled: February 22, 2016Publication date: March 1, 2018Applicant: ASML Netherlands B.V.Inventors: Jan Steven Christiaan WESTERLAKEN, Marcel Koenraad Marie BAGGEN, Fransiscus Mathijs JACOBS, Jeroen Arnoldus Leonardus Johannes RAAYMAKERS, Frank Pieter Albert VAN DEN BERKMORTEL, Marc Wilhelmus Maria VAN DER WIJST
-
Patent number: 9575416Abstract: A lithographic apparatus including a moveable object (WT) and a displacement measuring system arranged to determine a position quantity of the moveable object. The displacement measuring system includes an encoder (BC) and a grid structure. One of the encoder and the grid structure is connected to the moveable object. The grid structure includes a high precision grid portion (HG) and a low precision grid portion (LG). The encoder is arranged to cooperate with the high precision grid portion to determine the position quantity relative to the grid structure with a high precision. The encoder is arranged to cooperate with the low precision grid portion to determine the position quantity relative to the grid structure with a low precision.Type: GrantFiled: August 2, 2013Date of Patent: February 21, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Engelbertus Antonius Fransiscus Van Der Pasch, Ruud Antonius Catharina Maria Beerens, Martinus Agnes Willem Cuijpers, Christiaan Alexander Hoogendam, Fransiscus Mathijs Jacobs, Willem Herman Gertruda Anna Koenen, Erik Roelof Loopstra
-
Publication number: 20150212428Abstract: A lithographic apparatus including a moveable object (WT) and a displacement measuring system arranged to determine a position quantity of the moveable object. The displacement measuring system includes an encoder (BC) and a grid structure. One of the encoder and the grid structure is connected to the moveable object. The grid structure includes a high precision grid portion (HG) and a low precision grid portion (LG). The encoder is arranged to cooperate with the high precision grid portion to determine the position quantity relative to the grid structure with a high precision. The encoder is arranged to cooperate with the low precision grid portion to determine the position quantity relative to the grid structure with a low precision.Type: ApplicationFiled: August 2, 2013Publication date: July 30, 2015Applicant: ASML Netherlands B.V.Inventors: Engelbertus Antonius Fransiscus Van Der Pasch, Ruud Antonius Catharina Maria Beerens, Martinus Agnes Willem Cuijpers, Christiaan Alexander Hoogendam, Fransiscus Mathijs Jacobs, Willem Herman Gertruda Anna Koenen, Erik Roelof Loopstra
-
Patent number: 8368868Abstract: A lithographic apparatus includes a position controller configured to control a position of a patterning device in its planar direction by selectively pressing at least one of the side faces of the patterning device. The position controller includes a gas pressure supply and one or more outflow openings directed towards at least one side face of the patterning device so as to exert pressurized gas on this side face in order to control the position of the patterning device in its planar direction in a contactless manner.Type: GrantFiled: November 30, 2009Date of Patent: February 5, 2013Assignee: ASML Netherlands B.V.Inventors: Johannes Petrus Martinus Bernardus Vermeulen, Marcel Koenraad Marie Baggen, Hans Butler, Henrikus Herman Marie Cox, Jan Van Eijk, Andre Bernardus Jeunink, Nicolaas Rudolf Kemper, Robert-Han Munnig Schmidt, Engelbertus Antonius Fransiscus Van Der Pasch, Marc Wilhelmus Maria Van Der Wijst, Theodorus Petrus Maria Cadee, Fransiscus Mathijs Jacobs, Christiaan Louis Valentin
-
Patent number: 8334983Abstract: A lithographic apparatus is provided with an optical encoder measurement system having an irradiation system to direct an irradiation beam to a first scale. The system has optics to direct a primary diffracted beam diffracted from the first scale upon irradiation by the irradiation beam to a second scale and a detector to detect a secondary diffracted beam after interference and a second diffraction of the primary diffracted irradiation beam on the second scale to measure the position of the first scale with respect to the second scale.Type: GrantFiled: April 28, 2010Date of Patent: December 18, 2012Assignee: ASML Netherlands B.V.Inventors: Ruud Antonius Catharina Maria Beerens, Sjoerd Nicolaas Lambertus Donders, Engelbertus Antonius Fransiscus Van Der Pasch, Johannes Petrus Martinus Bernardus Vermeulen, Fransiscus Mathijs Jacobs
-
Patent number: 8189174Abstract: A lithographic apparatus includes two stages that are each configured to hold a substrate, wherein each stage is provided with a short stroke module to move a table with a substrate and a long stroke module to move the short stroke module of that stage. The lithographic apparatus includes a swap bridge to couple the stages, and wherein, in use, in a first configuration, the stages are moveable with respect to each other, and wherein, in use, in a second configuration, the stages are coupled via the swap bridge to make a joint movement.Type: GrantFiled: November 11, 2009Date of Patent: May 29, 2012Assignee: ASML Netherlands B.V.Inventors: Matthias Kruizinga, Frank Auer, Fransiscus Mathijs Jacobs, Ronnie Herman Anna Hensen
-
Publication number: 20100297561Abstract: A lithographic apparatus is provided with an optical encoder measurement system having an irradiation system to direct an irradiation beam to a first scale. The system has optics to direct a primary diffracted beam diffracted from the first scale upon irradiation by the irradiation beam to a second scale and a detector to detect a secondary diffracted beam after interference and a second diffraction of the primary diffracted irradiation beam on the second scale to measure the position of the first scale with respect to the second scale.Type: ApplicationFiled: April 28, 2010Publication date: November 25, 2010Applicant: ASML NETHERLANDS B.V.Inventors: Ruud Antonius Catharina Maria BEERENS, Sjoerd Nicolaas Lambertus Donders, Engelbertus Antonius Fransiscus Van Der Pasch, Johannes Petrus Martinus Bernardus Vermeulen, Fransiscus Mathijs Jacobs
-
Publication number: 20100159399Abstract: A lithographic apparatus includes a position controller configured to control a position of a patterning device in its planar direction by selectively pressing at least one of the side faces of the patterning device. The position controller includes a gas pressure supply and one or more outflow openings directed towards at least one side face of the patterning device so as to exert pressurized gas on this side face in order to control the position of the patterning device in its planar direction in a contactless manner.Type: ApplicationFiled: November 30, 2009Publication date: June 24, 2010Applicant: ASML NETHERLANDS B.V.Inventors: Johannes Petrus Martinus Bernardus VERMEULEN, Marcel Koenraad Marie Baggen, Hans Butler, Henrikus Herman Marie Cox, Jan Van Eijk, Andre Bernardus Jeunink, Nicolaas Rudolf Kemper, Robert-Han Munnig Schmidt, Engelbertus Antonius Fransiscus Van Der Pasch, Marc Wilhelmus Maria Van Der Wijst, Theodorus Petrus Maria Cadee, Fransiscus Mathijs Jacobs, Christiaan Louis Valentin
-
Publication number: 20100128241Abstract: A lithographic apparatus includes two stages that are each configured to hold a substrate, wherein each stage is provided with a short stroke module to move a table with a substrate and a long stroke module to move the short stroke module of that stage. The lithographic apparatus includes a swap bridge to couple the stages, and wherein, in use, in a first configuration, the stages are moveable with respect to each other, and wherein, in use, in a second configuration, the stages are coupled via the swap bridge to make a joint movement.Type: ApplicationFiled: November 11, 2009Publication date: May 27, 2010Applicant: ASML NETHERLANDS B.V.Inventors: Matthias KRUIZINGA, Frank Auer, Fransiscus Mathijs Jacobs, Ronnie Herman Anna Hensen
-
Publication number: 20090168037Abstract: An immersion lithographic projection apparatus is disclosed. The apparatus includes a substrate table for holding a substrate and a liquid supply system for supply liquid to the substrate. The apparatus is constructed and arranged to allow the liquid to flow off the substrate and over at least two edges of a top surface of the substrate table. The geometry of the edge may be optimized to reduce a static thickness of a layer of liquid on the top surface.Type: ApplicationFiled: December 1, 2008Publication date: July 2, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Roger Johannes Maria Hubertus Kroonen, Sebastiaan Maria Johannes Cornelissen, Sjoerd Nicolaas Lambertus Donders, Nicolaas Ten Kate, Ronald Van Der Ham, Niek Jacobus Johannes Roset, Fransiscus Mathijs Jacobs, Michel Riepen, Gerardus Arnoldus Hendricus Fanciscus Janssen, Reinder Wietse Roos, Mattijs Hogeland
-
Publication number: 20090168042Abstract: An immersion lithographic projection apparatus is disclosed. The apparatus includes a substrate table for holding a substrate, the substrate table being constructed and arranged to allow liquid to flow off the substrate and over an edge of a top surface of the substrate table, and a gutter for collecting the liquid flow under the edge. Several features for improving liquid retrieval are described.Type: ApplicationFiled: December 1, 2008Publication date: July 2, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Roger Johannes Maria Hubertus Kroonen, Sebastiaan Maria Johannes Cornelissen, Sjoerd Nicolaas Lambertus Donders, Nicolaas Ten Kate, Niek Jacobus Johannes Roset, Fransiscus Mathijs Jacobs, Gerardus Arnoldus Hendricus Franciscus Janssen, Reinder Wietse Roos, Mattijs Hogeland