Patents by Inventor Fransiscus Theresia Noel Heusschen

Fransiscus Theresia Noel Heusschen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Patent number: 8289498
    Abstract: A lithographic apparatus includes a projection system configured to project an image onto a substrate, a substrate table configured to support the substrate, a first chamber that at least partially surrounds the projection system, and a second chamber that at least partially surrounds the substrate table and a first frame. The apparatus includes a base frame configured to support the second chamber, and an intermediate frame coupled to the base frame. The intermediate frame is configured to separate the first chamber and the second chamber. The apparatus includes a support coupled to the first frame. The support is configured to support the first chamber through a coupled opening in the intermediate frame and the second chamber.
    Type: Grant
    Filed: June 12, 2009
    Date of Patent: October 16, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Erik Roelof Loopstra, Petrus Rutgerus Bartray, Leon Martin Levasier, Bernardus Antonius Johannes Luttikhuis, Josephus Jacobus Smits, Anthonie Aantjes, Maurice Willem Jozef Etiënne Wijckmans, Johannes Bernardus Ridder, Andre Schreuder, Dennis Jozef Maria Paulussen, Peter Gerardus Jonkers, Hugues Poincelin, Fransiscus Theresia Noel Heusschen
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20100002207
    Abstract: A lithographic apparatus includes a projection system configured to project an image onto a substrate, a substrate table configured to support the substrate, a first chamber that at least partially surrounds the projection system, and a second chamber that at least partially surrounds the substrate table and a first frame. The apparatus includes a base frame configured to support the second chamber, and an intermediate frame coupled to the base frame. The intermediate frame is configured to separate the first chamber and the second chamber. The apparatus includes a support coupled to the first frame. The support is configured to support the first chamber through a coupled opening in the intermediate frame and the second chamber.
    Type: Application
    Filed: June 12, 2009
    Publication date: January 7, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Erik Roelof LOOPSTRA, Petrus Rutgerus Bartray, Leon Martin Levasier, Bernardus Antonius Johannes Luttikhuis, Josephus Jacobus Smits, Anthonie Aantjes, Maurice Willem Jozef Etienne Wijckmans, Johannes Bernardus Ridder, Andre Schreuder, Dennis Jozef Maria Paulussen, Peter Gerardus Jonkers, Hugues Poincelin, Fransiscus Theresia Noel Heusschen