Patents by Inventor Frantisek Matejka

Frantisek Matejka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7435979
    Abstract: The present invention provides for a method of producing an optical device by means of electron beam lithography and including the step of varying the characteristics of the electron beam spot during formation of the device and also an apparatus for producing diffractive optical devices and/or holographic devices by means of electron beam lithography and including an electron beam lithograph, controlling and processing means, means for varying the characteristics of the electron beam spot during formation of the device, and wherein the processing means is arranged for compiling and pre-processing data and for providing optimization and allocation control and to optical devices such as those produced thereby.
    Type: Grant
    Filed: August 16, 2006
    Date of Patent: October 14, 2008
    Assignee: Optaglio Ltd.
    Inventors: Zbynek Ryzi, Kenneth John Drinkwater, Frantisek Matejka
  • Patent number: 7358513
    Abstract: The present invention provides for a method of producing an optical device by means of electron beam lithography and including the step of varying the characteristics of the electron beam spot during formation of the device and also an apparatus for producing diffractive optical devices and/or holographic devices by means of electron beam lithography and including an electron beam lithograph, controlling and processing means, means for varying the characteristics of the electron beam spot during formation of the device, and wherein the processing means is arranged for compiling and pre-processing data and for providing optimization and allocation control and to optical devices such as those produced thereby.
    Type: Grant
    Filed: July 16, 2002
    Date of Patent: April 15, 2008
    Assignee: Optaglio Ltd.
    Inventors: Zbynek Ryzi, Kenneth John Drinkwater, Frantisek Matejka
  • Publication number: 20070284546
    Abstract: The present invention provides for a method of producing an optical device by means of electron beam lithography and including the step of varying the characteristics of the electron beam spot during formation of the device and also an apparatus for producing diffractive optical devices and/or holographic devices by means of electron beam lithography and including an electron beam lithograph, controlling and processing means, means for varying the characteristics of the electron beam spot during formation of the device, and wherein the processing means is arranged for compiling and pre-processing data and for providing optimisation and allocation control and to optical devices such as those produced thereby.
    Type: Application
    Filed: August 16, 2006
    Publication date: December 13, 2007
    Applicant: Optaglio Ltd.
    Inventors: Zbynek Ryzi, Kenneth Drinkwater, Frantisek Matejka
  • Publication number: 20040247874
    Abstract: The present invention provides for a method of producing an optical device by means of electron beam lithography and including the step of varying the characteristics of the electron beam spot during formation of the device and also an apparatus for producing diffractive optical devices and/or holographic devices by means of electron beam lithography and including an electron beam lithograph, controlling and processing means, means for varying the characteristics of the electron beam spot during formation of the device, and wherein the processing means is arranged for compiling and pre-processing data and for providing optimisation and allocation control and to optical devices such as those produced thereby.
    Type: Application
    Filed: July 16, 2004
    Publication date: December 9, 2004
    Inventors: Zbynek Ryzi, Kenneth John Drikwater, Frantisek Matejka