Abstract: Axially symmetric magnetic fields are provided about the longitudinal axis of each beam of a multi-beam electron beam device. The magnetic field symmetry is independent of beam voltage, beam current and applied magnetic field strength. A flux equalizer assembly is disposed between the cathodes and the anodes and near the cathodes of a multi-beam electron beam device. The assembly includes a ferromagnetic flux plate completely contained within the magnetic focusing circuit of the device. The flux plate includes apertures for each beam of the multi-beam device. A flux equalization gap or gaps are disposed in the flux plate to provide a perturbation in the magnetic field in the flux plate which counters the asymmetry induced by the off-axis position of the beam. The gaps may be implemented in a number of ways all of which have the effect of producing a locally continuously varying reluctance that locally counters the magnetic field asymmetry.