Patents by Inventor Fred L. Einspruch

Fred L. Einspruch has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of using optical proximity effects to create electrically blown fuses with sub-critical dimension neck downs
    Patent number: 6436585
    Abstract: A method of making a photolithography mask for use in creating an electrical fuse on a semiconductor structure comprises initially determining a pattern for a desired electrical fuse, with the pattern including a fuse portion of substantially constant width except for a localized narrowed region of the fuse portion at which the electrical fuse is designed to blow. The method then includes providing a photolithography mask substrate and creating on the photolithography mask substrate a fuse mask element adapted to absorb transmission of an energy beam. The fuse mask element has a first mask portion of substantially constant width corresponding to the desired electrical fuse pattern portion of substantially constant width, and a second mask portion corresponding to the localized narrowed region of the fuse portion. The second mask portion comprises either an additional mask element spaced from the first mask portion, a narrowed width portion, or a gap in the first mask portion.
    Type: Grant
    Filed: February 25, 2000
    Date of Patent: August 20, 2002
    Assignees: International Business Machines Corporation, Infineon Technologies North America Corp.
    Inventors: Chandrasekhar Narayan, Axel Brintzinger, Fred L. Einspruch, Henning Haffner, Alan C. Thomas