Abstract: Glass photomasks having a high resolution stain pattern for use in photolithographic processes are made by migrating stain-producing cations into a surface of the glass, and heating the glass containing the stain-producing cations in a pressure vessel containing an inert liquid saturated with hydrogen under pressure at relatively low temperatures to reduce and agglomerate the stain-producing cations to form a high resolution stain pattern.

Abstract: Volatilization of sulfur containing impurities within a float glass forming chamber is suppressed by employing a tin/copper alloy as the molten metal and by removing sulfur impurities from the molten metal by cooling portions thereof to insolubilize the sulfur impurities.

Abstract: Glass photomasks having a high resolution stain pattern for use in photofabrication processes are made by migrating stain-producing ions into the surface of a glass substrate, and reducing and agglomerating the stain-producing ions in the presence of pure hydrogen under pressure at relatively low temperatures to produce a high resolution stain pattern.

Abstract: Glass photomasks having a stained pattern within the glass for use in photolithographic processes are made by exposing and developing a photographic emulsion on a sheet of glass and migrating silver ions from the emulsion into the surface of the glass under the influence of an electric field and moderately elevated temperatures.

Abstract: Glass photomasks having a stained pattern within the glass for use in photolithographic processes are made by dealkalizing surface zones of a glass sheet in a predetermined pattern by means of an electric field and subsequently injecting stain-producing ions, such as silver and/or copper, into the non-dealkalized zones of the glass.

Abstract: Accuracy of producing stained glass photomasks is improved by means of a preliminary heat treatment to adjust the fictive temperature of the glass, thereby improving dimensional stability during subsequent production of a stained pattern in the glass.

Abstract: Glass photomasks having a stained pattern within the glass for use in photolithographic processes are made by exposing and developing a photoresist on a sheet of glass and subsequently migrating stain-producing ions, such as silver and/or copper, into the surface of the glass under the influence of an electric field and moderately elevated temperatures.

Abstract: Glass photomasks having a stained pattern within the glass for use in photolithographic processes are made by injecting stain-producing ions, preferably silver and/or copper ions, into a glass substrate from a film by electron bombardment, which also serves to reduce the injected ions to their elemental state and to agglomerate the atoms to colloidal coloration centers. The stained areas of the glass are patterned by carrying out the electron bombardment through a developed photoresist, or by using a focused electron beam moving along a controlled locus.

Abstract: Glass photomasks having a stained pattern within the glass for use in photolithographic processes are made by exposing and developing a photoresist on a sheet of glass and subsequently migrating stain-producing ions, such as silver and/or copper, into the surface of the glass under the influence of an electric field and moderately elevated temperatures.