Patents by Inventor Frederic Lebrun

Frederic Lebrun has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for the preparation of amphiphilic poly(N-vinyl-2-pyrrolidone) block copolymers
    Patent number: 7838600
    Abstract: The instant invention provides a two-step polymerization process for preparing amphiphilic poly(N-vinyl-2-pyrrolidone), (PVP)-block-polyester copolymers and other diblock and triblock copolymers consisting of PVP as one block. The block copolymers of the invention can be used as vehicles for drug delivery.
    Type: Grant
    Filed: September 16, 2008
    Date of Patent: November 23, 2010
    Assignees: Labopharm, Inc., Labopharm Europe Limited, Labopharm (Barbados) Limited
    Inventors: Laibin Luo, David Lessard, Sandra Gori, Maxime Ranger, Yuan Wang, Julie Lafreniere, Jean-Francois Meunier, Genevieve Bibeau, Frederic Lebrun, Lu Wei Liu
  • Process for the preparation of amphiphilic poly(N-vinyl-2-pyrrolidone) block copolymers
    Publication number: 20090012240
    Abstract: The instant invention provides a two-step polymerization process for preparing amphiphilic poly(N-vinyl-2-pyrrolidone), (PVP)-block-polyester copolymers and other diblock and triblock copolymers consisting of PVP as one block. The block copolymers of the invention can be used as vehicles for drug delivery.
    Type: Application
    Filed: September 16, 2008
    Publication date: January 8, 2009
    Inventors: Laibin Luo, David Lessard, Sandra Gori, Maxime Ranger, Yuan Wang, Julie Lafreniere, Jean-Francois Meunier, Genevieve Bibeau, Frederic Lebrun, Lu Wei Liu
  • Process for the preparation of amphiphilic poly(n-vinyl-2-pyrrolidone) block copolymers
    Publication number: 20080027205
    Abstract: The instant invention provides a two-step polymerization process for preparing amphiphilic poly(N-vinyl-2-pyrrolidone), (PVP)-block-polyester copolymers and other diblock and triblock copolymers consisting of PVP as one block. The block copolymers of the invention can be used as vehicles for drug delivery.
    Type: Application
    Filed: August 6, 2007
    Publication date: January 31, 2008
    Inventors: Laibin Luo, David Lessard, Sandra Gori, Maxime Ranger, Yuan Wang, Julie Lafreniere, Jean-Francois Meunier, Genevieve Bibeau, Frederic Lebrun, Lu Liu
  • Process for the preparation of amphiphilic poly (N-vinyl-2-pyrrolidone) block copolymers
    Patent number: 7262253
    Abstract: The instant invention provides a two-step polymerization process for preparing amphiphilic poly(N-vinyl-2-pyrrolidone), (PVP)-block-polyester copolymers and other diblock and triblock copolymers consisting of PVP as one block. The block copolymers of the invention can be used as vehicles for drug delivery.
    Type: Grant
    Filed: December 2, 2003
    Date of Patent: August 28, 2007
    Assignee: Labopharm, Inc.
    Inventors: Laibin Luo, David Lessard, Sandra Gori, Maxime Ranger, Yuan Wang, Julie Lafreniere, Jean-Francois Meunier, Genevieve Bibeau, Frederic Lebrun, Lu Wei Liu
  • Process for the preparation of amphiphilic poly (N-vinyl-2-pyrrolidone) block copolymers
    Publication number: 20050119404
    Abstract: The instant invention provides a two-step polymerization process for preparing amphiphilic poly(N-vinyl-2-pyrrolidone), (PVP)-block-polyester copolymers and other diblock and triblock copolymers consisting of PVP as one block. The block copolymers of the invention can be used as vehicles for drug delivery.
    Type: Application
    Filed: December 2, 2003
    Publication date: June 2, 2005
    Inventors: Laibin Luo, David Lessard, Sandra Gori, Maxime Ranger, Yuan Wang, Julie Lafreniere, Jean-Francois Meunier, Genevieve Bibeau, Frederic Lebrun, Lu Liu
  • Method for planarizing TEOS SiO.sub.2 filled shallow isolation trenches
    Patent number: 5874345
    Abstract: According to the present invention, there is disclosed a method for planarizing TEOS SiO.sub.2 filled shallow isolation trenches according to a planarization main step which is comprised of three processing steps. The starting structure (10) consists of a silicon substrate (11) coated by a patterned Si.sub.3 N.sub.4 layer (12) which delineates shallow trenches (20A, 20B) with a conformal layer (22) of TEOS SiO.sub.2 formed thereon. A planarizing medium, typically two superimposed photoresist layers (24.25) is formed onto the resulting structure to provide a substantially planar surface. At this stage of the fabrication, the structure is standard. Now, this planar surface is translated by a non selective two-steps plasma etching in the TEOS SiO.sub.2 layer (22). Next, should some photoresist material remain onto the structure it would be removed. Finally, a highly selective TEOS SiO.sub.2 /Si.sub.3 N.sub.4 RIE etching step is performed which stops on the Si.sub.3 N.sub.4 layer. The preferred chemistry is C.
    Type: Grant
    Filed: November 18, 1996
    Date of Patent: February 23, 1999
    Assignee: International Business Machines Corporation
    Inventors: Philippe Coronel, Frederic Lebrun, Renzo MacCagnan